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13 条记录 (耗时 0.019 秒)

    Touch calibration system for wafer transfer robot
    1.
    发明授权
    Touch calibration system for wafer transfer robot 有权
    用于晶圆传送机器人的触摸校准系统

    公开(公告)号：US06242879B1

    公开(公告)日：2001-06-05

    申请号：US09524025

    申请日：2000-03-13

    申请人： Paul Sagues ,  Robert T. Wiggers ,  Steven M. Kraft

    发明人： Paul Sagues ,  Robert T. Wiggers ,  Steven M. Kraft

    IPC分类号： G03B1910

    CPC分类号： G03F7/7075 ,  H01L21/67766 ,  H01L21/67778

    摘要： A method and apparatus for automatically calibrating the precise positioning of a wafer handling robot relative to a target structure is disclosed. The apparatus comprises a machine controller connected to robot having an end-effector with three degrees of movement. The controller has a memory with stored rough distance and geometrical data defining the general location of structural features of the target structure. The robot is programmed to move toward the target structure in a series of sequential movements, each movement culminating with the robot end-effector touching a preselected exterior feature of the target structure. Each touching of the end-effector is sensed and provides data for the controller which then calculates the precise location of the target structure. The data accumulated during a series of touching steps by the robot end-effector is utilized by the controller to provide a precise calibrated control program for future operation of the robot.

    摘要翻译： 公开了一种用于自动校准晶片处理机器人相对于目标结构的精确定位的方法和装置。 该装置包括连接到机器人的机器控制器，其具有三个运动程度的末端执行器。 控制器具有存储有粗略距离的存储器和定义目标结构的结构特征的一般位置的几何数据。 机器人被编程为以一系列顺序移动朝着目标结构移动，每个运动最终导致机器人末端执行器接触目标结构的预选的外部特征。 检测到末端执行器的每次触摸并提供控制器的数据，然后控制器计算目标结构的精确位置。 由机器人末端执行器进行的一系列触摸步骤期间累积的数据由控制器利用，为机器人的未来操作提供精确的校准控制程序。

    Chassis assembly with means for mounting within thin wall opening
    2.
    发明授权
    Chassis assembly with means for mounting within thin wall opening 失效
    底盘组件，具有安装在薄壁开口内的装置

    公开(公告)号：US5410373A

    公开(公告)日：1995-04-25

    申请号：US115541

    申请日：1993-09-02

    申请人： Paul Sagues ,  Steven M. Kraft

    发明人： Paul Sagues ,  Steven M. Kraft

    IPC分类号： H04N5/645

    CPC分类号： H04N5/645

    摘要： An electronic chassis is disclosed for supporting components such as a CRT device or flat panel display unit and adapted for installation through an opening in a cabinet without requiring access from within the cabinet to secure the chassis in place. The frontal end of the chassis has flange members on opposite sides which fit against the cabinet surface around its opening. One side of the chassis frontal end has a movable retainer means controlled by one or more drive screws that can be adjusted to grip one side of the cabinet opening. Continued actuation of the drive screws moves the chassis into locking contact with a fixed retainer means on the opposite side of the chassis. A bezel frame member attached to the frontal end of the chassis covers the drive screws but has access holes to facilitate their adjustment, and gaskets are provided on the bezel frame to prevent moisture from entering the chassis or the cabinet opening.

    摘要翻译： 公开了一种用于支撑诸如CRT设备或平板显示单元的部件的电子底盘，并且适于通过机柜中的开口进行安装，而不需要从机柜内进入，以将机架固定就位。 底盘的前端在相对侧上具有法兰构件，该凸缘构件围绕其开口的机壳表面配合。 底盘前端的一侧具有由一个或多个驱动螺钉控制的可移动的保持器装置，该驱动螺杆可被调整以夹紧机壳开口的一侧。 驱动螺钉的继续致动将机架移动到与底盘相对侧的固定保持器装置的锁定接触。 安装在机箱正面的挡板框架部件覆盖驱动螺钉，但有进出孔便于调节，并且垫圈框架上设有垫片，以防止潮气进入底盘或机柜开口。

    PHOTOVOLTAIC SYSTEM WITH MANAGED OUTPUT AND METHOD OF MANAGING VARIABILITY OF OUTPUT FROM A PHOTOVOLTAIC SYSTEM
    3.
    发明申请
    PHOTOVOLTAIC SYSTEM WITH MANAGED OUTPUT AND METHOD OF MANAGING VARIABILITY OF OUTPUT FROM A PHOTOVOLTAIC SYSTEM 有权
    具有管理输出的光伏系统和管理来自光伏系统的输出的可变性的方法

    公开(公告)号：US20130068284A1

    公开(公告)日：2013-03-21

    申请号：US13675178

    申请日：2012-11-13

    申请人： Greg Beardsworth ,  Matt Campbell ,  Steven M. Kraft ,  Jason C. Jones

    发明人： Greg Beardsworth ,  Matt Campbell ,  Steven M. Kraft ,  Jason C. Jones

    IPC分类号： H01L31/052

    CPC分类号： H02S40/00 ,  F24S50/20 ,  H02S50/00 ,  H02S50/10 ,  Y02E10/47 ,  Y02E10/52

    摘要： Photovoltaic systems with managed output and methods for managing variability of output from photovoltaic systems are described. A system includes a plurality of photovoltaic modules configured to receive and convert solar energy. The system also includes a sensor configured to determine an orientation for each of the plurality of photovoltaic modules, the orientations based on a maximum output from the photovoltaic system. The system also includes an orientation system configured to alter the orientation of one or more of the plurality of photovoltaic modules to provide a reduced output from the photovoltaic system, the reduced output less than the maximum output.

    摘要翻译： 描述了具有管理输出的光伏系统和管理光伏系统输出变化的方法。 一种系统包括被配置为接收和转换太阳能的多个光伏模块。 该系统还包括被配置为基于来自光伏系统的最大输出来确定多个光伏模块中的每一个的取向的传感器。 该系统还包括被配置为改变多个光伏模块中的一个或多个的取向的取向系统，以提供来自光伏系统的减小的输出，该输出小于最大输出。

    Method for forming diffusion regions in a silicon substrate
    5.
    发明授权
    Method for forming diffusion regions in a silicon substrate 有权
    在硅衬底中形成扩散区的方法

    公开(公告)号：US09018033B2

    公开(公告)日：2015-04-28

    申请号：US14061422

    申请日：2013-10-23

    申请人： Kahn C. Wu ,  Steven M. Kraft ,  Paul Loscutoff ,  Steven Edward Molesa

    发明人： Kahn C. Wu ,  Steven M. Kraft ,  Paul Loscutoff ,  Steven Edward Molesa

    IPC分类号： H01L21/00 ,  H01L31/18 ,  H01L31/028

    CPC分类号： H01L31/182 ,  H01L31/028 ,  Y02E10/546 ,  Y02P70/521

    摘要： A method of manufacturing solar cells is disclosed. The method comprises depositing an etch-resistant dopant material on a silicon substrate, the etch-resistant dopant material comprising a dopant source, forming a cross-linked matrix in the etch-resistant dopant material using a non-thermal cure of the etch-resistant dopant material, and heating the silicon substrate and the etch-resistant dopant material to a temperature sufficient to cause the dopant source to diffuse into the silicon substrate.

    摘要翻译： 公开了一种制造太阳能电池的方法。 该方法包括在硅衬底上沉积耐蚀刻掺杂剂材料，该耐蚀刻掺杂剂材料包含掺杂剂源，在耐蚀刻掺杂剂材料中使用耐蚀刻的非热固化形成交联基质 并且将硅衬底和耐蚀刻掺杂剂材料加热到足以使掺杂剂源扩散到硅衬底中的温度。

    METHOD FOR FORMING DIFFUSION REGIONS IN A SILICON SUBSTRATE
    8.
    发明申请
    METHOD FOR FORMING DIFFUSION REGIONS IN A SILICON SUBSTRATE 有权
    在硅衬底中形成扩散区的方法

    公开(公告)号：US20140048133A1

    公开(公告)日：2014-02-20

    申请号：US14061422

    申请日：2013-10-23

    申请人： Kahn C. Wu ,  Steven M. Kraft ,  Paul Loscutoff ,  Steven Edward Molesa

    发明人： Kahn C. Wu ,  Steven M. Kraft ,  Paul Loscutoff ,  Steven Edward Molesa

    IPC分类号： H01L31/18 ,  H01L31/028

    CPC分类号： H01L31/182 ,  H01L31/028 ,  Y02E10/546 ,  Y02P70/521

    摘要： A method of manufacturing solar cells is disclosed. The method comprises depositing an etch-resistant dopant material on a silicon substrate, the etch-resistant dopant material comprising a dopant source, forming a cross-linked matrix in the etch-resistant dopant material using a non-thermal cure of the etch-resistant dopant material, and heating the silicon substrate and the etch-resistant dopant material to a temperature sufficient to cause the dopant source to diffuse into the silicon substrate.

    摘要翻译： 公开了一种制造太阳能电池的方法。 该方法包括在硅衬底上沉积耐蚀刻掺杂剂材料，该耐蚀刻掺杂剂材料包含掺杂剂源，在耐蚀刻掺杂剂材料中使用耐蚀刻的非热固化形成交联基质 并且将硅衬底和耐蚀刻掺杂剂材料加热到足以使掺杂剂源扩散到硅衬底中的温度。