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公开(公告)号:US07265063B2
公开(公告)日:2007-09-04
申请号:US10971337
申请日:2004-10-22
IPC分类号: H01L27/28 , H01L21/312 , H01L21/47
CPC分类号: H01L21/022 , H01L21/02118 , H01L21/02282 , H01L21/02348 , H01L21/312 , H01L27/1292 , H01L29/4908 , H01L29/66757 , H01L29/66765 , H01L29/7869
摘要: Embodiments of methods, apparatuses, devices, and/or systems for forming a component having dielectric sub-layers are described.
摘要翻译: 描述了用于形成具有电介质子层的部件的方法,装置,装置和/或系统的实施例。
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公开(公告)号:US08143706B2
公开(公告)日:2012-03-27
申请号:US11778201
申请日:2007-07-16
IPC分类号: H01L27/28 , H01L21/312 , H01L21/47
CPC分类号: H01L21/022 , H01L21/02118 , H01L21/02282 , H01L21/02348 , H01L21/312 , H01L27/1292 , H01L29/4908 , H01L29/66757 , H01L29/66765 , H01L29/7869
摘要: Embodiments of methods, apparatuses, devices, and/or systems for forming a component having dielectric sub-layers are described.
摘要翻译: 描述了用于形成具有电介质子层的部件的方法,装置,装置和/或系统的实施例。
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公开(公告)号:US20060086976A1
公开(公告)日:2006-04-27
申请号:US10971337
申请日:2004-10-22
CPC分类号: H01L21/022 , H01L21/02118 , H01L21/02282 , H01L21/02348 , H01L21/312 , H01L27/1292 , H01L29/4908 , H01L29/66757 , H01L29/66765 , H01L29/7869
摘要: Embodiments of methods, apparatuses, devices, and/or systems for forming a component having dielectric sub-layers are described.
摘要翻译: 描述了用于形成具有电介质子层的部件的方法,装置,装置和/或系统的实施例。
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公开(公告)号:US20070284701A1
公开(公告)日:2007-12-13
申请号:US11778201
申请日:2007-07-16
IPC分类号: H01L27/28 , H01L21/312
CPC分类号: H01L21/022 , H01L21/02118 , H01L21/02282 , H01L21/02348 , H01L21/312 , H01L27/1292 , H01L29/4908 , H01L29/66757 , H01L29/66765 , H01L29/7869
摘要: Embodiments of methods, apparatuses, devices, and/or systems for forming a component having dielectric sub-layers are described.
摘要翻译: 描述了用于形成具有电介质子层的部件的方法,装置,装置和/或系统的实施例。
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5.System and a method for manufacturing an electrolyte using electrodeposition 有权
标题翻译: 系统和使用电沉积制造电解质的方法公开(公告)号:US07632590B2
公开(公告)日:2009-12-15
申请号:US10620675
申请日:2003-07-15
CPC分类号: C25D13/04 , C25D9/02 , H01M8/04197 , H01M8/1011 , H01M8/1016 , H01M2300/0082 , H01M2300/0088 , Y02E60/523 , Y02P70/56
摘要: A method for manufacturing an electrolyte includes coupling a substrate to a charged electrode and electrodepositing a polymeric electrolyte on the substrate.
摘要翻译: 一种用于制造电解质的方法包括将基底连接到带电电极并在基底上电沉积聚合物电解质。
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公开(公告)号:US20060094168A1
公开(公告)日:2006-05-04
申请号:US10977068
申请日:2004-10-29
申请人: Randy Hoffman , Peter Mardilovich , David Punsalan
发明人: Randy Hoffman , Peter Mardilovich , David Punsalan
CPC分类号: H01L29/7869 , H01L29/41733 , H01L29/4908 , H01L29/66757 , H01L29/66765 , H01L29/66772
摘要: Embodiments of methods, apparatuses, devices, and/or systems for forming a thin film component are described.
摘要翻译: 描述了用于形成薄膜部件的方法,装置,装置和/或系统的实施例。
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公开(公告)号:US07799624B2
公开(公告)日:2010-09-21
申请号:US12104181
申请日:2008-04-16
申请人: Randy Hoffman , Peter Mardilovich , David Punsalan
发明人: Randy Hoffman , Peter Mardilovich , David Punsalan
IPC分类号: H01L21/84
CPC分类号: H01L29/7869 , H01L29/41733 , H01L29/4908 , H01L29/66757 , H01L29/66765 , H01L29/66772
摘要: Embodiments of methods, apparatuses, devices, and/or systems for forming a thin film component are described.
摘要翻译: 描述了用于形成薄膜部件的方法,装置,装置和/或系统的实施例。
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公开(公告)号:US07374984B2
公开(公告)日:2008-05-20
申请号:US10977068
申请日:2004-10-29
申请人: Randy Hoffman , Peter Mardilovich , David Punsalan
发明人: Randy Hoffman , Peter Mardilovich , David Punsalan
IPC分类号: H01L21/84
CPC分类号: H01L29/7869 , H01L29/41733 , H01L29/4908 , H01L29/66757 , H01L29/66765 , H01L29/66772
摘要: Embodiments of methods, apparatuses, devices, and/or systems for forming a thin film component are described.
摘要翻译: 描述了用于形成薄膜部件的方法,装置,装置和/或系统的实施例。
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公开(公告)号:US20080197414A1
公开(公告)日:2008-08-21
申请号:US12104181
申请日:2008-04-16
申请人: Randy Hoffman , Peter Mardilovich , David Punsalan
发明人: Randy Hoffman , Peter Mardilovich , David Punsalan
IPC分类号: H01L29/786 , H01L21/336
CPC分类号: H01L29/7869 , H01L29/41733 , H01L29/4908 , H01L29/66757 , H01L29/66765 , H01L29/66772
摘要: Embodiments of methods, apparatuses, devices, and/or systems for forming a thin film component are described.
摘要翻译: 描述了用于形成薄膜部件的方法,装置,装置和/或系统的实施例。
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公开(公告)号:US07575979B2
公开(公告)日:2009-08-18
申请号:US10875034
申请日:2004-06-22
申请人: David Punsalan , Peter Mardilovich , Randy Hoffman
发明人: David Punsalan , Peter Mardilovich , Randy Hoffman
IPC分类号: H01L21/336 , H01L21/331
CPC分类号: H01L29/7869 , H01L21/0237 , H01L21/02554 , H01L21/02565 , H01L21/02592 , H01L21/02601 , H01L21/02628 , H01L29/66969
摘要: A method includes forming a fluid including an inorganic semiconductor material, depositing a layer of said fluid on a substrate to form a film, and curing said film to form a porous semiconductor film.
摘要翻译: 一种方法包括形成包括无机半导体材料的流体,在基底上沉积所述流体层以形成膜,并固化所述膜以形成多孔半导体膜。
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