公开(公告)号：US20050169815A1

公开(公告)日：2005-08-04

申请号：US10988070

申请日：2004-11-12

申请人： Peter van den Brink ,  Martin Smit ,  Gerardus Johannes Gruter ,  Rene de Ruiter ,  Jan van der Waal

发明人： Peter van den Brink ,  Martin Smit ,  Gerardus Johannes Gruter ,  Rene de Ruiter ,  Jan van der Waal

IPC分类号： B01J19/00 ,  B01L99/00 ,  C40B60/14 ,  G01N35/10

CPC分类号： G01N35/1095 ,  B01J19/0046 ,  B01J2219/00283 ,  B01J2219/00286 ,  B01J2219/00308 ,  B01J2219/00369 ,  B01J2219/00389 ,  B01J2219/00418 ,  B01J2219/00423 ,  B01J2219/00481 ,  B01J2219/00495 ,  B01J2219/00585 ,  B01J2219/00707 ,  B01J2219/0072 ,  B01J2219/00745 ,  B01J2219/00747 ,  B01L3/0293 ,  B01L2400/086 ,  C40B60/14

摘要： A system for performing a chemical experiment comprises a reactor vessel having a wall defining a reaction chamber for receiving one or more fluids performing a chemical reaction. An analysis apparatus is located remote from said reactor vessel for analysing samples of said one or more fluids removed from said reaction chamber. Sampling means and transfer means are provided which are adapted for removing samples of said one or more fluids from said reaction chamber and transferring said samples to said analysis apparatus. The sampling and transfer means comprise a sample removal passage in communication with said reaction chamber and a sample transfer passage connected to said sample removal passage and extending to said analysis apparatus. The sample removal passage establishes an open communication between said reaction chamber and said sample transfer passage and the sample removal passage contains a flow restrictor. A pressure drop over said flow restrictor causes the removal of said samples from the reaction chamber.

摘要翻译： 用于执行化学实验的系统包括反应器容器，其具有限定用于接收执行化学反应的一种或多种流体的反应室的壁。 分析装置位于远离所述反应器容器的位置，用于分析从所述反应室移除的所述一种或多种流体的样品。 提供了采样装置和传送装置，其适于从所述反应室中移除所述一种或多种流体的样品并将所述样品转移到所述分析装置。 采样和传送装置包括与所述反应室连通的样品移除通道和连接到所述样品移除通道并延伸到所述分析设备的样品传送通道。 样品移除通道建立在所述反应室和所述样品传送通道之间的开放连通，并且样品移除通道包含限流器。 所述限流器上的压降导致所述样品从反应室中移出。

公开(公告)号：US4339516A

公开(公告)日：1982-07-13

申请号：US872170

申请日：1978-01-25

申请人： Jan van der Waal ,  Gerard Vermeulen

发明人： Jan van der Waal ,  Gerard Vermeulen

IPC分类号： H01J9/14 ,  G03C5/00

CPC分类号： H01J9/142

摘要： A method of manufacturing a pair of associated reproduction masks for manufacturing shadow masks for display tubes. In order to obtain elongate apertures which are enlarged in width on the side of the mask facing the screen, the second reproduction mask is formed by reproducing the first reproduction mask on a photographic plate by means of light rays which have a substantially greater divergence in a plane perpendicular to the long dimension of the apertures than in the plane parallel thereto.

摘要翻译： 一种制造用于制造显示管的阴影掩模的一对关联再现掩模的方法。 为了获得在面对屏幕的一侧的宽度上扩大的细长孔，第二再现掩模是通过在照相板上再现第一再现掩模形成的，所述光线在 垂直于孔的长尺寸的平面比平行于其的平面的平面。

公开(公告)号：US4866466A

公开(公告)日：1989-09-12

申请号：US185565

申请日：1988-04-25

申请人： Jan van der Waal

发明人： Jan van der Waal

IPC分类号： H01J9/227

CPC分类号： H01J9/2273 ,  H01J9/2272

摘要： A method of producing a color picture tube screen particularly for a high definition tube. In producing a high definition screen light from a point source (S) is directed through a segmented lens (18) and a shadow mask (24) onto a layer of photoresist applied to the internal surface of a faceplate panel (12). The segmented lens (18) comprises a rectilinear array of differently inclined facets (F). In order to obtain a substantially uniform illumination of the faceplate panel (12), the segmented lens (18) is wobbled in an oblique direction such that in moving from one extreme position to another, the image of a facet on the panel occupies substantially the previous position of the image of another facet obliquely adjacent the first mentioned facet when at the one extreme position.