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公开(公告)号：US06573975B2
公开(公告)日：2003-06-03
申请号：US09826214
申请日：2001-04-04
IPC分类号： G03B2768
CPC分类号： G03F7/70066 , G03F7/70091 , G03F7/70358 , G03F7/70558 , G03F7/70625
摘要： Linewidth variations and bias that result from MEF changes and reticle linewidth variations in a printed. substrate are controlled by correcting exposure dose and partial coherence at different spatial locations. In a photolithographic device for projecting an image of a reticle onto a photosensitive substrate, an adjustable slit is used in combination with a partial coherence adjuster to vary at different spatial locations the exposure dose received by the photosensitive substrate and partial coherence of the system. The linewidth variance and horizontal and vertical or orientation bias are calculated or measured at different spatial locations with reference to a reticle, and a corrected exposure dose and partial coherence is determined at the required spatial locations to compensate for the variance in linewidth and bias on the printed substrate. Improved printing of an image is obtained, resulting in the manufacturer of smaller feature size semiconductor devices and higher yields.
摘要翻译： 由MEF引起的线宽变化和偏差以及印刷线路线宽变化。 通过校正不同空间位置的曝光剂量和部分相干性来控制底物。 在用于将掩模版的图像投影到感光基板上的光刻设备中，可调节狭缝与部分相干调节器组合使用，以在不同的空间位置处变化，由感光基底接收的曝光剂量和系统的部分相干性。 线宽方差和水平和垂直或方向偏差在不同的空间位置处参照掩模版计算或测量，并且在所需的空间位置处确定校正的曝光剂量和部分相干性，以补偿线宽和偏差上的偏差 印刷基板。 获得了改进的图像打印，导致了尺寸较小的半导体器件的制造商和更高的产量。
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公开(公告)号：US06922230B2
公开(公告)日：2005-07-26
申请号：US10419101
申请日：2003-04-21
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70066 , G03F7/70091 , G03F7/70358 , G03F7/70558 , G03F7/70625
摘要： Linewidth variations and bias that result from MEF changes and reticle linewidth variations in a printed substrate are controlled by correcting exposure dose and partial coherence at different spatial locations. In a photolithographic device for projecting an image of a reticle onto a photosensitive substrate, an adjustable slit is used in combination with a partial coherence adjuster to vary at different spatial locations the exposure dose received by the photosensitive substrate and partial coherence of the system. The linewidth variance and horizontal and vertical or orientation bias are calculated or measured at different spatial locations with reference to a reticle, and a corrected exposure dose and partial coherence is determined at the required spatial locations to compensate for the variance in linewidth and bias on the printed substrate. Improved printing of an image is obtained, resulting in the manufacture of smaller feature size semiconductor devices and higher yields.
摘要翻译： 通过校正不同空间位置处的曝光剂量和部分相干性来控制由印刷基板中的MEF变化和标线线宽变化引起的线宽变化和偏差。 在用于将掩模版的图像投影到感光基板上的光刻设备中，可调节狭缝与部分相干调节器组合使用，以在不同的空间位置处变化，由感光基底接收的曝光剂量和系统的部分相干性。 线宽方差和水平和垂直或方向偏差在不同的空间位置处参照掩模版计算或测量，并且在所需的空间位置处确定校正的曝光剂量和部分相干性，以补偿线宽和偏差上的偏差 印刷基板。 获得了改进的图像打印，从而制造更小的特征尺寸的半导体器件和更高的产量。
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3.再颁专利Method of using deformable mirror using piezoelectric actuators formed as an integrated circuit 有权使用形成为集成电路的压电致动器使用可变形反射镜的方法公开(公告)号：USRE45511E1
公开(公告)日：2015-05-12
申请号：US12764557
申请日：2010-04-21
申请人： Pradeep K. Govil , Andrew Guzman
发明人： Pradeep K. Govil , Andrew Guzman
CPC分类号： G02B26/0825 , G02B26/0841 , Y10S359/90
摘要： A deformable optical device includes a reflection device having a first reflecting surface and a second surface, an actuator (e.g., an integrated circuit piezoelectric actuator) having a support device and moveable extensions extending therefrom, which are coupled to the second surface, and electrodes coupled to corresponding ones of the extensions. Wavefront aberrations are detected and used to generate a control signal. The extensions are moved based on the control signal. The movement deforms the reflecting surface to correct the aberrations in the wavefront.
摘要翻译： 可变形光学装置包括具有第一反射表面和第二表面的反射装置，具有支撑装置的致动器（例如，集成电路压电致动器）和从其延伸的可移动延伸部，其连接到第二表面，并且电极耦合 到相应的扩展。 检测波前像差并用于产生控制信号。 基于控制信号移动扩展。 该运动使反射表面变形以校正波前的像差。
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4.发明授权
公开(公告)号：US5895737A
公开(公告)日：1999-04-20
申请号：US23407
申请日：1998-02-12
IPC分类号： G02B26/02 , G03F7/20 , H01L21/027 , G03F5/00 , G03F7/00
CPC分类号： G03F7/70066 , G03F7/70358 , G03F7/70558
摘要： Blades pivotally attached together linked to push rods and inserted into an illumination energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The push rods are coupled to a flexure or link pivotally connected to each end of a substantially rectangular blade. The corners of the rectangular blades have a radius providing a smooth transition between blades. A frame holds the push rods in place as the blades are moved into and out of the illumination energy or flux. The push rods may be adjusted by a screw or other equivalent devices or methods. The lateral or sideways forces resulting from the movement of the blades is compensated for by the flexures or links resulting in less stress being placed on the blades. Slots placed at pivot points in the blades may also be used to facilitate movement of the blades. The illumination energy of the rectangular illumination field or slot is adjusted to provide a uniform illumination energy. Also included is a method of adjusting the device to provide a predetermined exposure dose along the length of the illumination field as a function of line width. Different feature types may be imaged separately to optimize control over line width variation.This is particularly advantageous in a scanning lithography system used in the manufacture of semiconductors.
摘要翻译： 叶片可枢转地连接在一起，与推杆连接并插入照明能量或通量。 刀片沿着用于将掩模版成像到感光基底上的矩形照明场或狭缝的长度纵向延伸。 推杆联接到枢转地连接到基本上矩形的叶片的每个端部的挠曲件或连杆。 矩形刀片的角部具有提供刀片之间平滑过渡的半径。 当叶片移入和移出照明能量或通量时，框架将推杆保持在适当的位置。 推杆可以通过螺钉或其他等效的装置或方法来调节。 由叶片的运动产生的侧向或侧向力被弯曲或链接补偿，导致较少的应力被放置在叶片上。 放置在叶片中的枢转点处的插槽也可以用于促进叶片的移动。 调整矩形照明场或狭缝的照明能量以提供均匀的照明能量。 还包括一种调节装置以沿着照明场的长度提供作为线宽的函数的预定曝光剂量的方法。 可以分别对不同的特征类型进行成像，以优化对线宽变化的控制。 这在用于制造半导体的扫描光刻系统中是特别有利的。
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公开(公告)号：US08982317B2
公开(公告)日：2015-03-17
申请号：US12533888
申请日：2009-07-31
CPC分类号： G03B27/52 , G03F7/70758
摘要： In order to effectively transfer heat from inner layers of an actuator coil to an area external to the coil, heat transfer elements, located proximate to the actuator coil, can be used. In an embodiment, a heat transfer apparatus for the actuator coil can include one or more heat transfer elements located proximate to one or more layers or one or more windings of the actuator coil and a cooling surface located proximate to the one or more heat transfer elements and to the actuator coil. In this configuration, the heat transfer apparatus can transfer heat from inner layers of the actuator coil to the cooling surface, which in turn transfers the heat to an area external to the actuator coil.
摘要翻译： 为了有效地将热量从致动器线圈的内层传递到线圈外部的区域，可以使用位于致动器线圈附近的传热元件。 在一个实施例中，用于致动器线圈的传热装置可以包括位于致动器线圈的一个或多个层或一个或多个绕组附近的一个或多个热传递元件，以及位于一个或多个传热元件附近的冷却表面 和致动器线圈。 在这种构造中，传热装置可以将热量从致动器线圈的内层传递到冷却表面，冷却表面又将热量传递到致动器线圈外部的区域。
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公开(公告)号：US08879045B2
公开(公告)日：2014-11-04
申请号：US12963980
申请日：2010-12-09
IPC分类号： G03F7/20
CPC分类号： G03F7/70291 , G03F7/70191 , G03F7/70308
摘要： A method utilizes a dynamically controllable optical element that receives an electrical field, which changes an index of refraction in at least one direction within the optical element. The change in index of refraction imparts a change to a beam of radiation passing through the optical element. The electric field is controlled by a feedback/control signal from a feedback system that includes a detector positioned proximate an image plane in the system. The optical element can be positioned in various places within the system depending on what light characteristics need to be adjusted, for example after an illumination system or after a light patterning system. In this manner, the optical element, under control of the dynamic electric field, can dynamically change its propagation characteristics to dynamically change either a beam of illumination from the illumination system or a patterned beam of radiation from the patterning system, such that they exhibit desired light characteristics.
摘要翻译： 一种方法利用一种动态可控的光学元件，其接收电场，该电场在光学元件内的至少一个方向上改变折射率。 折射率的变化赋予通过光学元件的辐射束的变化。 电场由来自反馈系统的反馈/控制信号控制，该反馈系统包括位于系统内的图像平面附近的检测器。 根据需要调整的光特性，例如在照明系统之后或在光图案化系统之后，光学元件可以位于系统内的各种位置。 以这种方式，光学元件在动态电场的控制下可以动态地改变其传播特性，以动态地改变来自照明系统的照明光束或来自图案化系统的图案化的辐射束，使得它们表现出期望的 光特性。
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公开(公告)号：US20100026974A1
公开(公告)日：2010-02-04
申请号：US12533888
申请日：2009-07-31
CPC分类号： G03B27/52 , G03F7/70758
摘要： In order to effectively transfer heat from inner layers of an actuator coil to an area external to the coil, heat transfer elements, located proximate to the actuator coil, can be used. In an embodiment, a heat transfer apparatus for the actuator coil can include one or more heat transfer elements located proximate to one or more layers or one or more windings of the actuator coil and a cooling surface located proximate to the one or more heat transfer elements and to the actuator coil. In this configuration, the heat transfer apparatus can transfer heat from inner layers of the actuator coil to the cooling surface, which in turn transfers the heat to an area external to the actuator coil.
摘要翻译： 为了有效地将热量从致动器线圈的内层传递到线圈外部的区域，可以使用位于致动器线圈附近的传热元件。 在一个实施例中，用于致动器线圈的传热装置可以包括位于致动器线圈的一个或多个层或一个或多个绕组附近的一个或多个热传递元件，以及位于一个或多个传热元件附近的冷却表面 和致动器线圈。 在这种构造中，传热装置可以将热量从致动器线圈的内层传递到冷却表面，冷却表面又将热量传递到致动器线圈外部的区域。
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8.发明授权Spatial light modulator using an integrated circuit actuator and method of making and using same 有权使用集成电路致动器的空间光调制器及其制造和使用方法公开(公告)号：US07525718B2
公开(公告)日：2009-04-28
申请号：US12132341
申请日：2008-06-03
CPC分类号： G02B26/0858 , Y10S359/90
摘要： A spatial light modulator (SLM) includes an integrated circuit actuator that can be fabricated using photolithography or other similar techniques. The actuator includes actuator elements, which can be made from piezoelectric materials. An electrode array is coupled to opposite walls of each of the actuator elements is an electrode array. Each array of electrodes can have one or more electrode sections. The array of reflective devices forms the SLM.
摘要翻译： 空间光调制器（SLM）包括可以使用光刻或其它类似技术制造的集成电路致动器。 致动器包括可由压电材料制成的致动器元件。 电极阵列连接到电极阵列中每个致动器元件的相对壁。 每个电极阵列可以具有一个或多个电极部分。 反射装置的阵列形成SLM。
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公开(公告)号：US07142353B2
公开(公告)日：2006-11-28
申请号：US10972582
申请日：2004-10-26
IPC分类号： G02F1/00
CPC分类号： G02F1/3551 , G02F1/0018 , G03F7/70141 , G03F7/70258
摘要： A system and method utilize an optical element that receives an electrical field, which changes an index of refraction in at least one direction within the optical element. The change in index of refraction imparts a change to a beam of radiation passing through the optical element. A material used to form the optical element exhibits characteristics, such that wavelengths of the beam of radiation above about 155 nanometers are transmitted through the optical element with little or not absorption or attenuation.
摘要翻译： 系统和方法利用接收电场的光学元件，该电场在光学元件内的至少一个方向上改变折射率。 折射率的变化赋予通过光学元件的辐射束的变化。 用于形成光学元件的材料表现出特性，使得在大约155纳米之上的辐射束的波长几乎没有吸收或衰减地透过光学元件。
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公开(公告)号：US6097474A
公开(公告)日：2000-08-01
申请号：US391928
申请日：1999-09-08
CPC分类号： G03F7/70066 , G03F7/70358 , G03F7/70558
摘要： Blades pivotally attached together linked to push rods and inserted into an illumination field, energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The blades controllably adjust the width of the rectangular illumination field to modify the illumination intensity or energy provided to a photosensitive substrate. The illumination field is scanned across the photosensitive substrate to expose it with the image of a reticle. The blades are dynamically controlled during the scanning exposure to adjust the illumination intensity or energy in a predetermined way. The resulting selective change in exposure dose corrects local area of line width variance. Various errors in pattern reproduction using a photolithographic system are relatively easily corrected. This is particularly advantageous in a scanning lithography system used in the manufacture of semiconductors.
摘要翻译： 叶片可枢转地连接在一起，连接到推杆上并插入照明场，能量或通量。 刀片沿着用于将掩模版成像到感光基底上的矩形照明场或狭缝的长度纵向延伸。 叶片可控制地调整矩形照明场的宽度以改变提供给感光基底的照明强度或能量。 照射场被扫描在感光基片上，以将其与掩模版的图像一起曝光。 在扫描曝光期间动态地控制叶片以预定的方式调节照明强度或能量。 所得到的曝光剂量的选择性变化校正了线宽方差的局部区域。 使用光刻系统的图案再现中的各种错误相对容易地被校正。 这在用于制造半导体的扫描光刻系统中是特别有利的。
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