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公开(公告)号:US20160348160A1
公开(公告)日:2016-12-01
申请号:US15231355
申请日:2016-08-08
申请人: RASIRC, Inc.
CPC分类号: C12Q1/6848 , A61L2/186 , A61L2/208 , A61L2202/24 , C12Q1/6806 , C12Q2527/125
摘要: Methods, systems, and devices for decontaminating materials containing biological or biologically derived materials, such as microorganisms or DNA products, are provided. The methods, systems, and devices may be used for decontaminating or sterilizing materials, such as surfaces, including, but not limited to reducing the number of viable microorganisms on surfaces. The methods, systems, and devices may further be used for rendering DNA non-amplifiable in nucleic acid amplification reactions that synthesize DNA amplification products.
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公开(公告)号:US20190309411A1
公开(公告)日:2019-10-10
申请号:US16393123
申请日:2019-04-24
申请人: RASIRC, Inc.
发明人: Jeffrey J. Spiegelman , Daniel Alvarez, JR. , Jian Yang , Russell J. Holmes , Edward Heinlein , Christopher Ramos , Jeremiah Trammel
IPC分类号: C23C16/02 , C01B21/068 , C01B21/076 , C23C16/34 , C23C16/455
摘要: A method and chemical delivery system are provided for low temperature atomic layer deposition. Thus, methods of forming nitrogen-containing thin films by atomic layer deposition using a substantially water free hydrazine gas and plasma treatment are provided.
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3.
公开(公告)号:US20150068611A1
公开(公告)日:2015-03-12
申请号:US14387872
申请日:2013-03-14
申请人: RASIRC, Inc.
IPC分类号: B01F3/02
CPC分类号: B01F3/02 , B01D53/228 , B01D61/246 , B01D63/02 , B01D2258/0216 , C23C16/4481 , Y10T137/0391 , Y10T137/2931
摘要: A method and chemical delivery system are provided. The method includes providing a vapor phase of a multi-component liquid source. The method further includes contacting a pre-loaded carrier gas with the vapor phase, wherein the pre-loaded carrier gas includes a carrier gas and at least one component of the multi-component liquid source and delivering a gas stream comprising at least one component of the liquid source to a critical process or application, wherein the amount of the component in the carrier gas is sufficient to keep the ratio of components in the multi-component liquid source relatively constant. The chemical delivery system includes a multi-component liquid source having a vapor phase. The system further includes a pre-loaded carrier gas source that is in fluid contact with the vapor phase, wherein the pre-loaded carrier gas includes a carrier gas and at least one component of the liquid source and an apparatus for delivering a gas stream including at least one component of the liquid source, wherein the amount of the component in the pre-loaded carrier gas is sufficient to keep the ratio of components in the multi-component liquid source relatively constant.
摘要翻译: 提供了一种方法和化学物质输送系统。 该方法包括提供多组分液体源的气相。 该方法还包括使预加载的载气与气相接触,其中预负载的载气包括载气和多组分液体源的至少一种组分,并输送气流,该气流包含至少一种组分 将液体源提供给关键的过程或应用,其中载气中的组分的量足以保持多组分液体源中的组分的比例相对恒定。 化学输送系统包括具有气相的多组分液体源。 该系统还包括与气相流体接触的预加载载气源,其中预加载载气包括载气和液体源的至少一个组分,以及用于输送气流的装置,包括 液体源的至少一个组分,其中预负载载气中的组分的量足以保持多组分液体源中组分的比例相对恒定。
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公开(公告)号:US20190070521A1
公开(公告)日:2019-03-07
申请号:US16181174
申请日:2018-11-05
申请人: RASIRC, Inc.
发明人: Daniel Alvarez, JR. , Russell J. Holmes , Jeffrey J. Spiegelman , Edward Heinlein , Christopher Ramos , Jeremiah Trammel
IPC分类号: B01B1/00 , C23C16/448 , C01B15/017 , B01D19/00
摘要: Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.
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公开(公告)号:US20170216738A1
公开(公告)日:2017-08-03
申请号:US15487924
申请日:2017-04-14
申请人: RASIRC, Inc.
发明人: Daniel Alvarez, JR. , Russell J. Holmes , Jeffrey J. Spiegelman , Edward Heinlein , Christopher Ramos , Jeremiah Trammel
IPC分类号: B01B1/00 , C23C16/455
CPC分类号: B01B1/005 , B01D19/0031 , B01D19/0068 , B01D19/0073 , C01B15/017 , C23C16/448
摘要: Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.
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公开(公告)号:US20220298648A1
公开(公告)日:2022-09-22
申请号:US17806040
申请日:2022-06-08
申请人: RASIRC, Inc.
IPC分类号: C23F11/18
摘要: The present disclosure provides techniques for suppression of hydrogen degradation. In some embodiments, a method for decreasing an amount or rate of hydrogen degradation of a material, includes: (a) exposing a material to gaseous hydrogen peroxide; and (b) forming a hydroxyl layer on the surface of the material within a chamber. The hydroxyl layer can decrease an amount or rate of hydrogen degradation of the material when exposed to hydrogen. In some embodiments, a system includes: a chamber; a material within the chamber; an inlet to the chamber; a hydrogen peroxide source coupled to the inlet via a conduit; and an outlet from the chamber for removing species from the chamber. The system can be configured to perform the method for decreasing an amount or rate of hydrogen degradation of a material.
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7.
公开(公告)号:US20190247791A1
公开(公告)日:2019-08-15
申请号:US16394380
申请日:2019-04-25
申请人: RASIRC, Inc.
发明人: Daniel Alvarez, JR. , Russell J. Holmes , Jeffrey J. Spiegelman , Edward Heinlein , Christopher Ramos
IPC分类号: B01D53/86 , B01J23/889 , B01D53/72 , B01J23/94 , B01J23/00 , B01J38/12 , B01J35/02 , B01J23/46 , B01J23/755 , B01J23/72 , B01D53/30
CPC分类号: B01D53/8696 , B01D53/30 , B01D53/72 , B01D53/8621 , B01D53/8668 , B01D53/8671 , B01D2251/602 , B01D2253/1124 , B01D2255/2073 , B01D2255/20753 , B01D2255/20761 , B01D2257/40 , B01J23/002 , B01J23/468 , B01J23/72 , B01J23/755 , B01J23/8892 , B01J23/94 , B01J35/026 , B01J38/12
摘要: Provided herein is a device for removing residual hydrogen peroxide or hydrazine from an effluent gas stream which includes a metal oxide scrubber material configured to react with residual process gases under increased temperatures. Also provided are systems and methods of using the same.
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公开(公告)号:US20170369315A1
公开(公告)日:2017-12-28
申请号:US15520031
申请日:2015-10-22
申请人: RASIRC, Inc.
发明人: Daniel Alvarez, JR. , Russell J. Holmes , Jeffrey Spiegelman , Edward Heinlein , Christopher Ramos
CPC分类号: C01B21/16 , B01D19/0031 , B01D19/0068 , B01D63/06 , B01D2325/42
摘要: A method and chemical delivery system and device are provided. One method includes contacting a non-aqueous hydrazine solution with a carrier gas and/or vacuum and delivering a gas stream comprising hydrazine to a critical process or application. One chemical delivery system and device includes a non-aqueous hydrazine solution having a vapor phase that is in contact with a carrier gas and/or vacuum. One device includes a chamber for containing a liquid comprising at least one volatile process chemical, such as a non-aqueous hydrazine solution, a hydrogen peroxide solution, or another suitable process chemical, and a head space from which the volatile can be drawn using a carrier gas and/or vacuum. Another method useful in the present invention involves drawing a process chemical from a device as a disclosed herein using a carrier or vacuum and delivering the process chemical to a critical process or application.
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9.
公开(公告)号:US20170312687A1
公开(公告)日:2017-11-02
申请号:US15582271
申请日:2017-04-28
申请人: RASIRC, Inc.
发明人: Daniel Alvarez, JR. , Russell J. Holmes , Jeffrey J. Spiegelman , Edward Heinlein , Christopher Ramos
IPC分类号: B01D53/86 , B01J35/00 , B01J23/889 , B01J23/72 , B01J23/46 , B01J21/04 , B01J35/02 , B01J38/12 , B01J23/755
摘要: Provided herein is a device for removing residual hydrogen peroxide or hydrazine from an effluent gas stream which includes a metal oxide scrubber material configured to react with residual process gases under increased temperatures. Also provided are systems and methods of using the same.
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公开(公告)号:US20210395899A1
公开(公告)日:2021-12-23
申请号:US17447016
申请日:2021-09-07
申请人: RASIRC, Inc.
IPC分类号: C23F11/18
摘要: The present disclosure provides techniques for suppression of hydrogen degradation. In some embodiments, a method for decreasing the amount or rate of hydrogen degradation of a material, includes: (a) exposing a material to gaseous hydrogen peroxide; (b) forming a hydroxyl layer on the surface of the material within a chamber; and (c) after forming the hydroxyl layer, exposing the material to hydrogen during a controlled process or application.
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