公开(公告)号：US20240158250A1

公开(公告)日：2024-05-16

申请号：US18550222

申请日：2022-03-10

Applicant: RHODIA OPERATIONS

Inventor： Marie Plissonneau ,  Réka Toth ,  Lauriane D'Alencon ,  Valérie Buissette ,  Mickaël Boudot

IPC: C01F17/235 ,  C09G1/02 ,  C09K3/14

CPC classification number: C01F17/235 ,  C09G1/02 ,  C09K3/1409 ,  C01P2004/04 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/40

Abstract: The invention relates to cerium oxide particles having a roughness index (RI) of at least 5, to a making process thereof and to the use thereof in chemical mechanical polishing applications.

公开(公告)号：US20240247169A1

公开(公告)日：2024-07-25

申请号：US18560852

申请日：2022-05-17

Applicant: RHODIA OPERATIONS

Inventor： Marie Plissonneau ,  Réka Toth ,  Thierry Le Mercier ,  Valérie Buissette ,  Lauriane D'Alencon

IPC: C09G1/02 ,  C09K3/14 ,  H01L21/3105

CPC classification number: C09G1/02 ,  C09K3/1436 ,  H01L21/31053

Abstract: The invention relates to cerium based core-shell particles having a core of cerium oxide optionally doped with at least one metal (M) and a shell consisting of a plurality of nanoparticles of cerium oxide optionally doped with at least one metal (M′), which can be the same or different from metal (M), formed on the surface of the core particle. The invention also relates to dispersions thereof in a liquid medium, to a process for producing the same and to the use of these particles and dispersions in polishing applications such as chemical mechanical polishing.

公开(公告)号：US20230041600A1

公开(公告)日：2023-02-09

申请号：US17780469

申请日：2020-11-25

Applicant: RHODIA OPERATIONS

Inventor： Marie Plissonneau ,  Réka Toth ,  Thierry Le Mercier ,  Valérie Buissette ,  Manabu Yuasa ,  Eisaku Suda

IPC: C01F17/32 ,  C09G1/02

Abstract: The disclosure relates to cerium based particles having a rough surface and their use as a component of a polishing composition, especially for chemical mechanical polishing. The cerium based particles have substantially the shape of polyhedrons which have one or more faces with protrusions thereon, said protrusions being integrally formed with said cerium based particles. The present disclosure also relates to the method of preparation of the cerium based particles.

公开(公告)号：US20240158251A1

公开(公告)日：2024-05-16

申请号：US18550272

申请日：2022-03-10

Applicant: RHODIA OPERATIONS

Inventor： Marie Plissonneau ,  Réka Toth ,  Lauriane D'Alencon ,  Valérie Buissette ,  Mickaël Boudot

IPC: C01F17/235 ,  C01F1/00 ,  C09G1/02

CPC classification number: C01F17/235 ,  C01F1/00 ,  C09G1/02 ,  C01P2004/04 ,  C01P2004/51 ,  C01P2004/62 ,  C01P2006/12

Abstract: The invention relates to cerium oxide particles having a roughness index RI of at least 5, to a making process thereof and to the use thereof in chemical mechanical polishing applications.

公开(公告)号：US20230002639A1

公开(公告)日：2023-01-05

申请号：US17780462

申请日：2020-11-25

Applicant: RHODIA OPERATIONS

Inventor： Marie Plissonneau ,  Réka Toth ,  Thierry Le Mercier ,  Valérie Buissette ,  Lauriane D'Alencon

IPC: C09G1/02 ,  H01L21/321

Abstract: The invention relates to cerium based core-shell particles having a core of cerium oxide optionally doped with at least one metal (M) and a shell consisting of a plurality of nanoparticles of cerium oxide optionally doped with at least one metal (M′), which can be the same or different from metal (M), formed on the surface of the core particle. The invention also relates to dispersions thereof in a liquid medium, to a process for producing the same and to the use of these particles and dispersions in polishing applications such as chemical mechanical polishing.