公开(公告)号：US20220206388A1

公开(公告)日：2022-06-30

申请号：US17543568

申请日：2021-12-06

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.

Inventor： Eun-Young LEE ,  Ju-Young Jung ,  Jin-Kyu Im

IPC: G03F7/075 ,  C08F220/32 ,  C08F220/14 ,  C08F220/18

Abstract: The present invention relates to a positive-type photosensitive resin composition and a cured film prepared therefrom. The positive-type photosensitive resin composition, in which an acrylic copolymer and a siloxane copolymer are used together while a bulky monomer is introduced into the acrylic copolymer, facilitates the penetration of a developer and, at the same time, increases the inhibition efficiency of acid groups to produce the effect of improving the sensitivity.

公开(公告)号：US11487200B2

公开(公告)日：2022-11-01

申请号：US16402284

申请日：2019-05-03

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD

Inventor： Jung-Hwa Lee ,  Geun Huh ,  Ju-Young Jung ,  Yeonok Kim

IPC: G03F7/004 ,  G03F7/022 ,  G03F7/38 ,  G03F7/20 ,  C08K5/13 ,  C08L33/08 ,  C08L33/10 ,  C08L83/04

Abstract: The present invention relates to a positive-type photosensitive resin composition and a cured film prepared therefrom. The positive-type photosensitive resin composition comprises an acrylic copolymer having a dissolution rate to a developer in a specific range and a compound containing a phenolic hydroxyl group, so that it is possible to attain a high contrast and a high sensitivity pattern when a cured film is formed. Further, it is possible to further enhance the adhesiveness of a pattern when a half-tone, as well as a full-tone, is formed.

公开(公告)号：US20180253004A1

公开(公告)日：2018-09-06

申请号：US15755580

申请日：2016-08-31

Applicant: Rohm and Haas Electronic Materials Korea Ltd.

Inventor： Jung-Hwa Lee ,  Ju-Young Jung ,  Seung-Ho Kwon ,  Seung-Keun Kim ,  Yu-Jin Chae

IPC: G03F7/033 ,  G03F7/004 ,  H01B3/44

CPC classification number: G03F7/033 ,  G03F7/0048 ,  G03F7/031 ,  H01B3/447

Abstract: Disclosed herein are a photosensitive resin composition and an organic insulating film prepared therefrom. By optimizing the weight average molecular weight of a copolymer, and using a specific solvent in the photosensitive resin composition, a coated film obtained therefrom may have high planarity property and patterns with high resolution. Accordingly, the photosensitive resin composition may be used as a material for an organic insulating film simultaneously functioning as white pixels.

公开(公告)号：US11573490B2

公开(公告)日：2023-02-07

申请号：US16879160

申请日：2020-05-20

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.

Inventor： Ji Ung Kim ,  Geun Huh ,  Ju-Young Jung ,  JinKyu Im ,  Yeonok Kim

IPC: G03F7/023 ,  G03F7/022 ,  G03F7/075 ,  G03F7/027 ,  G03F7/033

Abstract: The present invention relates to a positive-type photosensitive resin composition and a cured film prepared therefrom. The positive-type photosensitive resin composition comprises a nonpolar organic solvent, thereby suppressing the reactivity of the epoxy group in the composition to reduce the production of diol compounds. When a cured film is prepared from the composition, an appropriate level of developability can be maintained to further enhance the pattern adhesiveness, resolution, and sensitivity. Further, since the composition of the present invention has a small difference in the film retention rates at room temperature and low temperatures, the composition may have stable stability over time.

公开(公告)号：US11106133B2

公开(公告)日：2021-08-31

申请号：US16192013

申请日：2018-11-15

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.

Inventor： Yeonok Kim ,  Geun Huh ,  Ju-Young Jung ,  Jung-Hwa Lee ,  Jong Han Yang

IPC: G03F7/039 ,  G03F7/075 ,  G03F7/038 ,  G03F7/023 ,  C08G77/392 ,  C08G77/388 ,  H01L27/12

Abstract: The present invention relates to a positive-type photosensitive resin composition and a cured film prepared therefrom. The positive-type photosensitive resin composition comprises an acrylic resin and a siloxane copolymer containing a sulfonated diazoquinone group at the terminal thereof. Thus, the film retention rate and adhesiveness can be further enhanced, while the sensitivity is maintained.

公开(公告)号：US20180335695A1

公开(公告)日：2018-11-22

申请号：US15777752

申请日：2016-10-04

Applicant: Rohm and Haas Electronic Materials Korea Ltd.

Inventor： Yu-Jin Chae ,  Ju-Young Jung ,  Seung-Ho Kwon ,  Jung-Hwa Lee ,  Seung-Keun Kim

IPC: G03F7/033 ,  G03F7/031 ,  C08F212/08 ,  H01B17/56 ,  H01B3/44

CPC classification number: G03F7/033 ,  G03F7/031 ,  H01B3/44 ,  H01B3/447

Abstract: Disclosed herein are a photosensitive resin composition and an organic insulating film prepared therefrom. By optimizing the weight average molecular weight of an alkali-soluble resin and the amount of each component in the photosensitive resin composition, a coated film obtained therefrom may have high planarity property and patterns with high resolution. Accordingly, the photosensitive resin composition may be used as a material for an organic insulating film simultaneously functioning as white pixels in a liquid crystal display.