公开(公告)号：US07637126B2

公开(公告)日：2009-12-29

申请号：US10582117

申请日：2004-11-30

申请人： Rainer Koeppler ,  Bodo Kuehn ,  Waltraud Werdecker ,  Ulrich Kirst ,  Walter Lehmann

发明人： Rainer Koeppler ,  Bodo Kuehn ,  Waltraud Werdecker ,  Ulrich Kirst ,  Walter Lehmann

IPC分类号： C03B37/075

CPC分类号： C03C4/0071 ,  C03B19/06 ,  C03B19/063 ,  C03B19/066 ,  C03B19/1005 ,  C03B19/1065 ,  C03B19/108 ,  C03B19/1095 ,  C03B20/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/34 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/23 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/3488 ,  C03C2201/36 ,  C03C2203/22 ,  C03C2203/30 ,  C03C2203/44 ,  C03C2203/52

摘要： The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiO2 nanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiO2 granulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm3, c) drying and purification of the SiO2 granulate, by heating to a temperature of at least 1000° C. to form doped porous SiO2 grains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiO2 grains in a reducing atmosphere to give the blank made from doped quartz glass.

摘要翻译： 本发明涉及一种用于经济地生产用于由任何形式或尺寸的激光 - 活性石英玻璃制成的部件的坯料的方法。 该方法包括以下方法步骤：a）制备固体含量为至少40wt。 ％，包括SiO 2纳米粉末和掺杂剂，其包括流体中的稀土金属和过渡金属的阳离子，b）通过搅拌分散体制粒，除去水分以形成掺杂的SiO 2颗粒的球形多孔颗粒，其具有 含水量小于35wt。 ％和密度至少为0.95g / cm 3，c）通过加热到至少1000℃的温度来干燥和纯化SiO 2颗粒，以形成OH含量低于10ppm的掺杂多孔SiO 2颗粒，以及 d）在还原气氛中烧结或熔融掺杂的SiO 2晶粒，得到由掺杂的石英玻璃制成的坯料。

公开(公告)号：US20070145332A1

公开(公告)日：2007-06-28

申请号：US10582117

申请日：2004-11-30

申请人： Rainer Koeppler ,  Bodo Kuehn ,  Waltraud Werdecker ,  Ulrich Kirst ,  Walter Lehmann

发明人： Rainer Koeppler ,  Bodo Kuehn ,  Waltraud Werdecker ,  Ulrich Kirst ,  Walter Lehmann

IPC分类号： C09K11/66 ,  C03B8/00 ,  C03B19/00

CPC分类号： C03C4/0071 ,  C03B19/06 ,  C03B19/063 ,  C03B19/066 ,  C03B19/1005 ,  C03B19/1065 ,  C03B19/108 ,  C03B19/1095 ,  C03B20/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/34 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/23 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/3488 ,  C03C2201/36 ,  C03C2203/22 ,  C03C2203/30 ,  C03C2203/44 ,  C03C2203/52

摘要： The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiO2 nanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiO2 granulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm3, c) drying and purification of the SiO2 granulate, by heating to a temperature of at least 1000° C. to form doped porous SiO2 grains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiO2 grains in a reducing atmosphere to give the blank made from doped quartz glass.

摘要翻译： 本发明涉及一种用于经济地生产用于由任何形式或尺寸的激光 - 活性石英玻璃制成的部件的坯料的方法。 该方法包括以下方法步骤：a）制备固体含量为至少40wt。 ％，包括SiO 2纳米粉末和掺杂剂，其包括流体中的稀土金属和过渡金属的阳离子，b）通过搅拌分散体制粒，除去水分以形成掺杂的SiO 水分含量小于35重量％的球形多孔粒状颗粒颗粒。 ％，密度至少为0.95g / cm 3，c）通过加热到至少1000℃的温度来干燥和纯化SiO 2颗粒。 以形成OH含量小于10ppm的掺杂多孔SiO 2颗粒，以及d）在还原气氛中烧结或熔合掺杂的SiO 2颗粒，得到坯料 来自掺杂石英玻璃。

公开(公告)号：US07749930B2

公开(公告)日：2010-07-06

申请号：US11630405

申请日：2006-03-30

申请人： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

发明人： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

IPC分类号： C03C3/06 ,  C03C3/04 ,  C03C15/00 ,  C03B19/00 ,  C03B21/00 ,  C03B32/00 ,  C03B25/00

CPC分类号： C03C3/06 ,  C03B19/06 ,  C03B19/09 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/24 ,  C03B2201/32 ,  C03C15/00 ,  C03C19/00 ,  C03C23/0025 ,  C03C23/006 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/54 ,  C30B25/12 ,  C30B31/14 ,  C30B35/00 ,  Y02P40/57

摘要： An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.

摘要翻译： 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其虚拟温度低于1250℃，在1200℃的温度下其粘度至少为1013dPa·s。制备这种石英玻璃的经济方法包括以下方法步骤：将SiO 2原料熔化得到 将石英玻璃坯料，SiO 2原料或石英玻璃坯料进行脱水处理，将SiO2原料或石英玻璃坯料加热至1050℃〜1850℃的氮化温度， 含有氨的气氛，将石英玻璃坯料的石英玻璃设定为1250℃以下的假想温度的温度处理，以及格式化的石英玻璃坯料的表面处理 在石英玻璃夹具上。

公开(公告)号：US20080066497A1

公开(公告)日：2008-03-20

申请号：US11630405

申请日：2006-03-30

申请人： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

发明人： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

IPC分类号： C03C3/06 ,  C03B19/14 ,  H01L21/00

CPC分类号： C03C3/06 ,  C03B19/06 ,  C03B19/09 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/24 ,  C03B2201/32 ,  C03C15/00 ,  C03C19/00 ,  C03C23/0025 ,  C03C23/006 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/54 ,  C30B25/12 ,  C30B31/14 ,  C30B35/00 ,  Y02P40/57

摘要： An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.

摘要翻译： 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其假想温度低于1250℃，在1200℃的温度下其粘度至少为10-13Pa。制备这种石英玻璃的经济方法包括以下方法步骤 ：将SiO 2原料熔化，得到石英玻璃坯料，将SiO 2原料或石英玻璃坯料进行脱水处理，加热SiO _{2 原料或石英玻璃坯料，在含氨气氛中在1050℃至1850℃的范围内的氮化温度，使用石英玻璃的石英玻璃 将玻璃坯料设定为1250℃以下的假想温度，进行表面处理 石英玻璃夹具形成石英玻璃夹具。}

公开(公告)号：US20080075949A1

公开(公告)日：2008-03-27

申请号：US11661160

申请日：2005-08-23

申请人： Ulrich Kirst ,  Wolfgang Stang ,  Juergen Weber ,  Waltraud Werdecker ,  Martin Trommer ,  Joerg Becker

发明人： Ulrich Kirst ,  Wolfgang Stang ,  Juergen Weber ,  Waltraud Werdecker ,  Martin Trommer ,  Joerg Becker

IPC分类号： C03C17/02 ,  C03B19/02 ,  C03C17/25

CPC分类号： C03C17/25 ,  C03B19/066 ,  C03C17/02 ,  C03C2217/213 ,  Y10T428/26

摘要： The invention relates to methods for producing a coated component consisting of quartz glass, according to which the component surface is at least partially provided with a SiO2 glass composition that differs from the quartz glass of the base body. The aim of the invention is to provide a novel way of coating a quartz glass component with a SiO2 glass composition that can be produced in a cost-effective, reproducible manner, with any thickness, and can fulfil various functions according to the concrete embodiment thereof. To this end, an amorphous slip containing SiO2 particles is produced and applied to the surface of the base body, forming a slip layer which is dried and then vitrified, forming a SiO2 glass composition. The quartz glass components coated in this way can be advantageously used especially in the production of semiconductors.

摘要翻译： 本发明涉及生产由石英玻璃组成的涂层组分的方法，根据该方法，组分表面至少部分地具有不同于基体的石英玻璃的SiO 2玻璃组合物。 本发明的目的是提供一种用可以以任何厚度的成本有效，可再现的方式生产的SiO 2玻璃组合物涂覆石英玻璃组分的新方法，并且可以实现 根据具体实施例的各种功能。 为此，制备含有SiO 2颗粒的无定形滑移并施加到基体的表面，形成干燥然后玻璃化的滑移层，形成SiO 2 2 / SUB>玻璃组合物。 以这种方式涂覆的石英玻璃组分可以有利地用于半导体的生产。