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公开(公告)号：US07637126B2
公开(公告)日：2009-12-29
申请号：US10582117
申请日：2004-11-30
IPC分类号： C03B37/075
CPC分类号： C03C4/0071 , C03B19/06 , C03B19/063 , C03B19/066 , C03B19/1005 , C03B19/1065 , C03B19/108 , C03B19/1095 , C03B20/00 , C03B2201/07 , C03B2201/075 , C03B2201/34 , C03C1/026 , C03C3/06 , C03C2201/23 , C03C2201/3411 , C03C2201/3435 , C03C2201/3488 , C03C2201/36 , C03C2203/22 , C03C2203/30 , C03C2203/44 , C03C2203/52
摘要： The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiO2 nanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiO2 granulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm3, c) drying and purification of the SiO2 granulate, by heating to a temperature of at least 1000° C. to form doped porous SiO2 grains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiO2 grains in a reducing atmosphere to give the blank made from doped quartz glass.
摘要翻译： 本发明涉及一种用于经济地生产用于由任何形式或尺寸的激光 - 活性石英玻璃制成的部件的坯料的方法。 该方法包括以下方法步骤：a）制备固体含量为至少40wt。 ％，包括SiO 2纳米粉末和掺杂剂，其包括流体中的稀土金属和过渡金属的阳离子，b）通过搅拌分散体制粒，除去水分以形成掺杂的SiO 2颗粒的球形多孔颗粒，其具有 含水量小于35wt。 ％和密度至少为0.95g / cm 3，c）通过加热到至少1000℃的温度来干燥和纯化SiO 2颗粒，以形成OH含量低于10ppm的掺杂多孔SiO 2颗粒，以及 d）在还原气氛中烧结或熔融掺杂的SiO 2晶粒，得到由掺杂的石英玻璃制成的坯料。
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公开(公告)号：US20070145332A1
公开(公告)日：2007-06-28
申请号：US10582117
申请日：2004-11-30
CPC分类号： C03C4/0071 , C03B19/06 , C03B19/063 , C03B19/066 , C03B19/1005 , C03B19/1065 , C03B19/108 , C03B19/1095 , C03B20/00 , C03B2201/07 , C03B2201/075 , C03B2201/34 , C03C1/026 , C03C3/06 , C03C2201/23 , C03C2201/3411 , C03C2201/3435 , C03C2201/3488 , C03C2201/36 , C03C2203/22 , C03C2203/30 , C03C2203/44 , C03C2203/52
摘要： The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiO2 nanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiO2 granulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm3, c) drying and purification of the SiO2 granulate, by heating to a temperature of at least 1000° C. to form doped porous SiO2 grains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiO2 grains in a reducing atmosphere to give the blank made from doped quartz glass.
摘要翻译： 本发明涉及一种用于经济地生产用于由任何形式或尺寸的激光 - 活性石英玻璃制成的部件的坯料的方法。 该方法包括以下方法步骤：a）制备固体含量为至少40wt。 ％，包括SiO 2纳米粉末和掺杂剂，其包括流体中的稀土金属和过渡金属的阳离子，b）通过搅拌分散体制粒，除去水分以形成掺杂的SiO 水分含量小于35重量％的球形多孔粒状颗粒颗粒。 ％，密度至少为0.95g / cm 3，c）通过加热到至少1000℃的温度来干燥和纯化SiO 2颗粒。 以形成OH含量小于10ppm的掺杂多孔SiO 2颗粒，以及d）在还原气氛中烧结或熔合掺杂的SiO 2颗粒，得到坯料 来自掺杂石英玻璃。
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3.发明授权Holder made from quartz glass for the processing of semiconductor wafers and method for production of the holder 有权由石英玻璃制成的用于加工半导体晶片的支架和用于制造支架的方法公开(公告)号：US07749930B2
公开(公告)日：2010-07-06
申请号：US11630405
申请日：2006-03-30
申请人： Juergen Weber , Tobias Pogge , Martin Trommer , Bodo Kuehn , Ulrich Kirst , Waltraud Werdecker
发明人： Juergen Weber , Tobias Pogge , Martin Trommer , Bodo Kuehn , Ulrich Kirst , Waltraud Werdecker
CPC分类号： C03C3/06 , C03B19/06 , C03B19/09 , C03B32/00 , C03B2201/07 , C03B2201/075 , C03B2201/24 , C03B2201/32 , C03C15/00 , C03C19/00 , C03C23/0025 , C03C23/006 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2201/24 , C03C2201/32 , C03C2201/50 , C03C2203/54 , C30B25/12 , C30B31/14 , C30B35/00 , Y02P40/57
摘要： An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.
摘要翻译： 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其虚拟温度低于1250℃，在1200℃的温度下其粘度至少为1013dPa·s。制备这种石英玻璃的经济方法包括以下方法步骤：将SiO 2原料熔化得到 将石英玻璃坯料，SiO 2原料或石英玻璃坯料进行脱水处理，将SiO2原料或石英玻璃坯料加热至1050℃〜1850℃的氮化温度， 含有氨的气氛，将石英玻璃坯料的石英玻璃设定为1250℃以下的假想温度的温度处理，以及格式化的石英玻璃坯料的表面处理 在石英玻璃夹具上。
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4.发明申请Holder Made From Quartz Glass for the Processing of Semiconductor Wafers and Method for Production of the Holder 有权由石英玻璃制成的用于半导体晶片加工的支架及其制造方法公开(公告)号：US20080066497A1
公开(公告)日：2008-03-20
申请号：US11630405
申请日：2006-03-30
申请人： Juergen Weber , Tobias Pogge , Martin Trommer , Bodo Kuehn , Ulrich Kirst , Waltraud Werdecker
发明人： Juergen Weber , Tobias Pogge , Martin Trommer , Bodo Kuehn , Ulrich Kirst , Waltraud Werdecker
CPC分类号： C03C3/06 , C03B19/06 , C03B19/09 , C03B32/00 , C03B2201/07 , C03B2201/075 , C03B2201/24 , C03B2201/32 , C03C15/00 , C03C19/00 , C03C23/0025 , C03C23/006 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2201/24 , C03C2201/32 , C03C2201/50 , C03C2203/54 , C30B25/12 , C30B31/14 , C30B35/00 , Y02P40/57
摘要： An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.
摘要翻译： 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其假想温度低于1250℃，在1200℃的温度下其粘度至少为10-13Pa。制备这种石英玻璃的经济方法包括以下方法步骤 ：将SiO 2原料熔化，得到石英玻璃坯料，将SiO 2原料或石英玻璃坯料进行脱水处理，加热SiO 2 原料或石英玻璃坯料，在含氨气氛中在1050℃至1850℃的范围内的氮化温度，使用石英玻璃的石英玻璃 将玻璃坯料设定为1250℃以下的假想温度，进行表面处理 石英玻璃夹具形成石英玻璃夹具。
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公开(公告)号：US07981824B2
公开(公告)日：2011-07-19
申请号：US11597087
申请日：2005-05-11
申请人： Wolfgang Englisch , Ralf Takke , Bodo Kuehn , Bruno Uebbing , Rainer Koeppler
发明人： Wolfgang Englisch , Ralf Takke , Bodo Kuehn , Bruno Uebbing , Rainer Koeppler
CPC分类号： C03B19/1469 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/42
摘要： The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (
摘要翻译： 本发明涉及一种用于传输波长为15nm和更短的辐射的光学部件的石英玻璃坯料，该坯料由掺杂有钛和/或氟的高纯石英玻璃组成，其特征在于极高的均匀性 。 均匀性涉及以下特征：a）相对于TiO 2含量的平均值，TiO 2分布的局部方差（<0.05％TiO 2，相对于（5μm）的体积元素平均）引起的微不均匀性） ，b）主要功能方向（<5ppb / K）的热膨胀系数＆Dgr;α的绝对最大不均匀性，c）不大于石英玻璃坯料的可用表面的热膨胀系数的径向变化 超过0.4ppb /（K.cm）; d）具有特定进展的2nm / cm 2的主要功能方向的633nm处的最大应力双折射（SDB） 和e）根据（b）在光学表面上平均的＆Dgr;α的具体进展。 所述石英玻璃坯料只能通过将含有硅，钛和/或氟的化合物的火焰水解获得的掺杂石英玻璃作为大体积的棒状起始体形成为均匀的石英玻璃坯料，其中使用几个成形步骤 并均质化。
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公开(公告)号：US20080274869A1
公开(公告)日：2008-11-06
申请号：US11597087
申请日：2005-05-11
申请人： Wolfgang Englisch , Ralf Takke , Bodo Kuehn , Bruno Uebbing , Rainer Koeppler
发明人： Wolfgang Englisch , Ralf Takke , Bodo Kuehn , Bruno Uebbing , Rainer Koeppler
CPC分类号： C03B19/1469 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/42
摘要： The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (
摘要翻译： 本发明涉及一种用于传输波长为15nm和更短的辐射的光学部件的石英玻璃坯料，该坯料由掺杂有钛和/或氟的高纯石英玻璃组成，其特征在于极高的均匀性 。 均匀性涉及以下特征：a）由TiO 2分布（<0.05％TIO 2 2）的局部方差引起的微不均匀性，其平均值在 （5umum）相对于TiO 2含量的平均值），b）主要功能方向上的热膨胀系数Deltaalpha的绝对最大不均匀性（ <5ppb / K），c）在石英玻璃坯料的可用表面上的热膨胀系数的径向变化不大于0.4ppb /（K.cm）; d）具有特定进展的2nm / cm 2的主要功能方向的633nm处的最大应力双折射（SDB） 和e）根据（b）在光学表面上平均的Deltaalpha的特定进展。 所述石英玻璃坯料只能通过将含有硅，钛和/或氟的化合物的火焰水解获得的掺杂石英玻璃作为大体积的棒状起始体形成为均匀的石英玻璃坯料，其中使用几个成形步骤 并均质化。
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7.发明授权Method for making a blank from material, particularly for an optical component for use in microlithography 有权用于从材料制成坯料的方法，特别是用于微光刻中使用的光学部件公开(公告)号：US07954341B2
公开(公告)日：2011-06-07
申请号：US12713097
申请日：2010-02-25
申请人： Bodo Kuehn , Stefan Ochs
发明人： Bodo Kuehn , Stefan Ochs
CPC分类号： C04B35/14 , C03C10/0009 , C04B35/645 , C04B2235/6565 , C04B2235/77 , C04B2235/785 , C04B2235/786 , C04B2235/94 , C04B2235/95 , C04B2235/9661
摘要： The invention is concerned with a material which shows low absorption for UV radiation having a wavelength below 250 nm, low birefringence, high chemical resistance and high radiation resistance and which is therefore particularly usable for making optical components for microlithography. According to the invention the material consists of synthetically produced quartz crystallites which form a polycrystalline structure and have a mean grain size in the range between 500 nm and 30 μm. The method according to the invention for making a blank from the material comprises providing granules consisting of synthetically produced quartz crystals having a mean grain size in the range between 500 nm and 30 μm, and sintering the granules to obtain a blank of polycrystalline quartz.
摘要翻译： 本发明涉及对波长低于250nm，低双折射，高耐化学性和高耐辐射性的UV辐射的吸收低的材料，因此特别可用于制造用于微光刻的光学部件。 根据本发明，该材料由合成产生的石英晶体组成，其形成多晶结构，其平均晶粒尺寸在500nm至30μm的范围内。 根据本发明的用于从该材料制造坯料的方法包括提供由合成产生的平均晶粒尺寸在500nm和30μm之间的石英晶体组成的颗粒，并烧结颗粒以获得多晶石英的坯料。
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8.发明申请Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component 有权用于制造具有增强的耐辐射性的合成石英玻璃的光学部件的制造方法和用于制造该部件的坯料公开(公告)号：US20090004088A1
公开(公告)日：2009-01-01
申请号：US12148338
申请日：2008-04-18
申请人： Bodo Kuehn , Steffen Kaiser , Denis Kassube , Kerstin Merget
发明人： Bodo Kuehn , Steffen Kaiser , Denis Kassube , Kerstin Merget
CPC分类号： C03B25/02 , C03B19/1453 , C03B32/00 , C03B2201/075 , C03B2201/21 , C03C3/06 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/42 , C03C2203/52 , Y02P40/57
摘要： To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C. lower than the high mean value of the fictive temperature according to method step (b).
摘要翻译： 为了优化合成石英玻璃的光学部件，在石英玻璃坯料进行多段退火处理的情况下，关于压实和中心双折射，本发明提出了一种方法，包括以下步骤：（a） 第一处理阶段，其中在1130℃和1240℃之间的较高温度范围内处理石英玻璃坯料，（b）以第一高平均冷却速率将石英玻璃坯料冷却至低于1100℃的淬火温度 在石英玻璃中达到1100℃或更高平均值的假想温度，（c）第二处理阶段，其包括以第二低平均冷却速度冷却石英玻璃坯料 ，其中在950℃至1100℃的较低温度范围内处理石英玻璃坯料，使得石英玻璃中具有低至少50℃的低平均值的假想温度降低 比平均值高 根据方法步骤（b）的假想温度。
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9.发明申请Quartz Glass Component For A Uv Radiation Source And Method For Producing And Testing The Aptitude Of Such A Quartz Glass Component 审中-公开用于Uv辐射源的石英玻璃组件和用于生产和测试这种石英玻璃组分的能力的方法公开(公告)号：US20070272685A1
公开(公告)日：2007-11-29
申请号：US11578393
申请日：2005-04-05
IPC分类号： H01J61/38
CPC分类号： C03B19/01 , C03B19/1453 , C03B32/00 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/23 , C03C3/06
摘要： In a known method, a quartz glass component is produced for a UV radiation source by melting SiO2-containing grain. Starting therefrom, to indicate an inexpensive method by means of which a quartz glass component is obtained that is characterized by high radiation resistance, it is suggested according to the invention that synthetically produced quartz crystals are molten to obtain a pre-product which consists of quartz glass containing hydroxyl groups in a number greater than the number of SiH groups, and that for the elimination of SiH groups the pre-product is subjected to an annealing treatment at a temperature of at least 850° C., whereby the quartz glass component is obtained. In the quartz glass component of the invention, the quartz glass is molten from synthetically produced quartz crystals, and it has a content of SiH groups of less than 5×1017 molecules/cm3.
摘要翻译： 在已知的方法中，通过熔化含SiO 2的晶粒来生产用于UV辐射源的石英玻璃组分。 从其开始，为了表明一种廉价的方法，通过该方法获得了以高耐辐射性为特征的石英玻璃组分，根据本发明提出，将合成的石英晶体熔融以获得由石英组成的预制品 含有数量大于SiH基数的羟基的玻璃，并且为了除去SiH基，将前产物在至少850℃的温度下进行退火处理，由此石英玻璃成分为 获得。 在本发明的石英玻璃组分中，石英玻璃从合成产生的石英晶体熔化，并且其SiH基含量小于5×10 17分子/ cm 3 / >。
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10.发明授权Blank of titanium-doped glass with a high silica content for a mirror substrate for use in EUV lithography and method for the production thereof 有权用于EUV光刻中的用于镜面基板的二氧化硅含量高的钛掺杂玻璃空白及其制造方法公开(公告)号：US08931307B2
公开(公告)日：2015-01-13
申请号：US13499352
申请日：2010-09-28
申请人： Bodo Kuehn
发明人： Bodo Kuehn
CPC分类号： C03B23/20 , C03B19/1453 , C03B32/00 , C03B2201/42 , C03C3/06 , C03C2201/42 , G02B5/10 , G03F7/708 , Y10T428/22 , Y10T428/24612
摘要： On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.
摘要翻译： 基于具有高二氧化硅含量的钛掺杂玻璃的坯料的制造方法（玻璃）的基础是用于具有外表面的EUV光刻用的镜面基板，其目的是设置有 反射涂层，并且当反射镜基板按预期使用时被指定为高负载区域，以便提供可以以低成本生产的空白，并且在均匀性方面满足高要求并且不受起泡和条纹的影响， 提出了包括以下方法步骤的方法：（a）制造尺寸大到足以包围外轮廓的钛掺杂高品质玻璃的前体，（b）从掺钛玻璃制造圆柱形支撑体 ，（c）将所述前体和所述支撑体接合以形成复合体，和（d）加工所述复合体以形成所述反射镜基板坯料，其中，所述制造所述前体的步骤包括 一种均质化方法，其特征在于，通过使含硅化合物的火焰水解使绞合线形成的起始体扭转而形成前体坯料，所述支撑体形成为与前身均匀性较差的整体式玻璃块。
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