Patterning via optical-saturable transitions
    1.
    发明授权
    Patterning via optical-saturable transitions 有权
    通过光学饱和转换进行图案化

    公开(公告)号:US09164369B2

    公开(公告)日:2015-10-20

    申请号:US12749960

    申请日:2010-03-30

    IPC分类号: G03F7/20 G03B27/00

    CPC分类号: G03B27/00

    摘要: An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the spectrally selective reversible transitions with an optical node retaining a single molecule in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern.

    摘要翻译: 提供了一种用于纳米图案的光学材料系统,其包括具有光谱选择性可逆和不可逆转变的一个或多个材料系统,其通过将光谱选择性可逆转换中的一个与保留单个分子的配置中的光学节点饱和,并将单个分子暴露于其光谱 不可逆转的过渡形成一种模式。

    PATTERNING VIA OPTICAL-SATURABLE TRANSISIONS
    2.
    发明申请
    PATTERNING VIA OPTICAL-SATURABLE TRANSISIONS 有权
    通过光学可饱和晶片进行绘图

    公开(公告)号:US20100248159A1

    公开(公告)日:2010-09-30

    申请号:US12749960

    申请日:2010-03-30

    IPC分类号: G03F7/20 G03B27/00

    CPC分类号: G03B27/00

    摘要: An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the spectrally selective reversible transitions with an optical node retaining a single molecule in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern.

    摘要翻译: 提供了一种用于纳米图案的光学材料系统,其包括具有光谱选择性可逆和不可逆转变的一个或多个材料系统,其通过将光谱选择性可逆转换中的一个与保留单个分子的配置中的光学节点饱和,并将单个分子暴露于其光谱 不可逆转的过渡形成一种模式。

    Nanoscale imaging via absorption modulation
    3.
    发明授权
    Nanoscale imaging via absorption modulation 有权
    通过吸收调制进行纳米成像

    公开(公告)号:US08143601B2

    公开(公告)日:2012-03-27

    申请号:US12186968

    申请日:2008-08-06

    IPC分类号: G01J1/58

    摘要: An imaging system is provided. The imaging system includes a sample to be scanned by the imaging system. An absorbance modulation layer (AML) is positioned in close proximity to the sample and is physically separate from the sample. One or more sub-wavelength apertures are generated within the AML, whose size is determined by the material properties of the AML and the intensities of the illuminating wavelengths. A light source transmits an optical signal through the one or more sub-wavelength apertures generating optical near-fields that are collected for imaging.

    摘要翻译: 提供成像系统。 成像系统包括要由成像系统扫描的样品。 吸收调制层(AML)位于样品附近,物理上与样品分开。 在AML内产生一个或多个亚波长孔径,其尺寸由AML的材料特性和照明波长的强度决定。 光源通过一个或多个子波长孔径传输光信号,产生用于成像的光学近场。

    MULTIPLE-WAVELENGTH BINARY DIFFRACTIVE LENSES
    5.
    发明申请
    MULTIPLE-WAVELENGTH BINARY DIFFRACTIVE LENSES 有权
    多波长二进制透镜

    公开(公告)号:US20100097703A1

    公开(公告)日:2010-04-22

    申请号:US12253512

    申请日:2008-10-17

    IPC分类号: G02B27/44

    摘要: A dichromatic lens includes a plurality of zones being arranged on a lens structure, each of the zones having a specified radius and varying height. The lens structure focuses propagating light applicable to any intensity distribution for a plurality of wavelengths.

    摘要翻译: 双色透镜包括布置在透镜结构上的多个区域,每个区域具有指定的半径和变化的高度。 透镜结构聚焦适用于多个波长的任何强度分布的传播光。

    SYSTEM AND METHOD FOR CONTRAST ENHANCED ZONE PLATE ARRAY LITHOGRAPHY
    6.
    发明申请
    SYSTEM AND METHOD FOR CONTRAST ENHANCED ZONE PLATE ARRAY LITHOGRAPHY 失效
    对比增强区域板阵列的系统和方法

    公开(公告)号:US20090087797A1

    公开(公告)日:2009-04-02

    申请号:US12337000

    申请日:2008-12-17

    IPC分类号: G03F7/20

    CPC分类号: G03F7/70291 G03F7/091

    摘要: A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.

    摘要翻译: 公开了一种光刻系统,其包括用于将聚焦照明引向记录介质的聚焦元件的阵列,以及设置在记录介质和聚焦元件阵列之间的可逆对比度增强材料。

    System and method for proximity effect correction in imaging systems
    7.
    发明授权
    System and method for proximity effect correction in imaging systems 失效
    成像系统中邻近效应校正的系统和方法

    公开(公告)号:US07148496B2

    公开(公告)日:2006-12-12

    申请号:US10823458

    申请日:2004-04-13

    IPC分类号: H01J37/304

    摘要: A system and method are disclosed for providing error correction in an imaging system. The system includes an error determination unit for determining an amount of error associated with a spot at (x,y) in a binary pattern to be imaged, a determination unit for determining the location of a nearest exposed spot at (xi, yi) for each spot at (x,y), and a dose modification unit for modifying an exposure dose at the nearest exposed spot at (xi, yi) for each spot at (x,y).

    摘要翻译: 公开了一种用于在成像系统中提供纠错的系统和方法。 该系统包括:误差确定单元,用于确定与待成像的二进制图案中的(x,y)处的斑点相关联的误差量;确定单元,用于确定最近的曝光光斑在(x i)处的位置, (x,y)处的每个斑点的剂量修改单元,以及用于修改在(x,y)处最近的曝光点的曝光剂量的剂量修改单元 (x,y)的每个点的平均值。

    Multiple-wavelength binary diffractive lenses
    9.
    发明授权
    Multiple-wavelength binary diffractive lenses 有权
    多波长二元衍射透镜

    公开(公告)号:US08049963B2

    公开(公告)日:2011-11-01

    申请号:US12253512

    申请日:2008-10-17

    IPC分类号: G02B27/44 G02B3/08

    摘要: A dichromatic lens includes a plurality of zones being arranged on a lens structure, each of the zones having a specified radius and varying height. The lens structure focuses propagating light applicable to any intensity distribution for a plurality of wavelengths.

    摘要翻译: 双色透镜包括布置在透镜结构上的多个区域,每个区域具有指定的半径和变化的高度。 透镜结构聚焦适用于多个波长的任何强度分布的传播光。