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公开(公告)号:US20240015889A1
公开(公告)日:2024-01-11
申请号:US18044789
申请日:2021-09-09
Applicant: RESONAC CORPORATION
Inventor: Kei TOGASAKI , Kenichi IWASHITA , Keishi ONO , Mao NARITA , Kazuyuki MITSUKURA , Masaya TOBA
CPC classification number: H05K1/181 , H05K3/1208 , H05K3/181 , H05K3/022
Abstract: A method for producing a wiring board, including: a step of pretreating the surface of a metal layer exposed into an opening by bringing the surface into contact with a pretreatment liquid at a predetermined pretreatment temperature; and a step of forming a copper plating layer on the metal layer by electrolytic plating. The resist layer and the pretreatment liquid are selected such that a mass change rate of the resist layer when the resist layer before being exposed and developed is immersed in the pretreatment liquid is −2.0% by mass or more. The mass change rate is a value calculated by Expression: Mass change rate (% by mass)={(W1−W0)/W0}×100. W1 is the mass of the resist layer after a laminated body including a resist layer 3 and a copper foil is immersed in the pretreatment liquid at the pretreatment temperature for 30 minutes.
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公开(公告)号:US20240166897A1
公开(公告)日:2024-05-23
申请号:US18549171
申请日:2021-03-09
Applicant: Resonac Corporation
Inventor: Hiroyuki IZUMI , Kei TOGASAKI , Hiroshi YOKOTA
Abstract: A method for producing a coating liquid, the method including: a preparation step of preparing an emulsion containing a polymer-based emulsifier, a binder resin, and a liquid medium, and aerogel particles; and a mixing step of mixing the emulsion and the aerogel particles prepared in the preparation step to agglomerate at least a portion of the aerogel particles, and obtaining a coating liquid containing agglomerates of the aerogel particles, the polymer-based emulsifier, the binder resin, and the liquid medium.
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公开(公告)号:US20240341039A1
公开(公告)日:2024-10-10
申请号:US18294158
申请日:2022-07-29
Applicant: Resonac Corporation
Inventor: Kei TOGASAKI , Kazuyuki MITSUKURA , Masaya TOBA , Kenichi IWASHITA , Keishi ONO , Mao NARITA
CPC classification number: H05K3/10 , C25D3/38 , C25D5/022 , C25D5/605 , C25D7/123 , H05K1/02 , H01L21/4846 , H01L23/49866 , H05K2203/11
Abstract: A method for manufacturing a wiring board, including: forming a resist layer on a seed layer comprising a metal provided on a support body; forming a pattern including an opening to which the seed layer is exposed in the resist layer by light exposure and development of the resist layer, and forming a copper plating layer on the seed layer exposed into the opening by electrolytic plating, in this order. The arithmetic mean roughness Ra of the surface of the seed layer on a side opposite to the support body is 0.05 μm or more and 0.30 μm or less.
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