Method and apparatus for controlling material removal from semiconductor substrate using induced current endpointing
    7.
    发明授权
    Method and apparatus for controlling material removal from semiconductor substrate using induced current endpointing 有权
    用于使用感应电流终点来控制从半导体衬底去除材料的方法和装置

    公开(公告)号:US07232526B2

    公开(公告)日:2007-06-19

    申请号:US10868245

    申请日:2004-06-15

    IPC分类号: B44C1/22

    摘要: A method and apparatus for controlling the removal of material from a semiconductor substrate in an integrated circuit fabrication process is disclosed. The method and apparatus utilize a light source or charged particle beam (electron or ion beam) to induce a current in at least one P-N junction formed in the semiconductor substrate. The induced current is monitored during the removal of material and the process is stopped or endpointed in response to the induced current making a predetermined transition.

    摘要翻译: 公开了一种在集成电路制造工艺中控制从半导体衬底去除材料的方法和装置。 该方法和装置利用光源或带电粒子束(电子或离子束)在半导体衬底中形成的至少一个P-N结中感应电流。 在去除材料期间监测感应电流,并且响应于感应电流进行预定的转变而停止或终止该过程。

    Method and apparatus for controlling material removal from a semiconductor substrate using induced current endpointing
    8.
    发明授权
    Method and apparatus for controlling material removal from a semiconductor substrate using induced current endpointing 有权
    用于使用感应电流终点来控制从半导体衬底去除材料的方法和装置

    公开(公告)号:US06780658B2

    公开(公告)日:2004-08-24

    申请号:US10455143

    申请日:2003-06-05

    IPC分类号: H01L2166

    摘要: A method and apparatus for controlling the removal of material from a semiconductor substrate in an integrated circuit fabrication process is disclosed. The method and apparatus utilize a light source or charged particle beam (electron or ion beam) to induce a current in at least one P-N junction formed in the semiconductor substrate. The induced current is monitored during the removal of material and the process is stopped or endpointed in response to the induced current making a predetermined transition.

    摘要翻译: 公开了一种在集成电路制造工艺中控制从半导体衬底去除材料的方法和装置。 该方法和装置利用光源或带电粒子束(电子或离子束)在半导体衬底中形成的至少一个P-N结中感应电流。 在去除材料期间监测感应电流,并且响应于感应电流进行预定的转变而停止或终止该过程。