公开(公告)号：US08387563B2

公开(公告)日：2013-03-05

申请号：US13372729

申请日：2012-02-14

申请人： Rick Endo ,  Jeremy Cheng ,  Indranil De ,  James Tsung ,  Kurt Weiner ,  Maosheng Zhao

发明人： Rick Endo ,  Jeremy Cheng ,  Indranil De ,  James Tsung ,  Kurt Weiner ,  Maosheng Zhao

IPC分类号： H01L21/31 ,  C23C16/458 ,  C23C16/50 ,  B65H1/00

CPC分类号： H01L21/32051 ,  B01J19/0046 ,  B01J2219/0043 ,  B01J2219/00536 ,  B01J2219/00596 ,  B01J2219/00659 ,  B01J2219/00745 ,  B01J2219/00756 ,  C23C14/042 ,  C23C14/50 ,  C23C14/548 ,  C23C16/45544 ,  H01L21/67005 ,  H01L21/6719

摘要： A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.

公开(公告)号：US20090061087A1

公开(公告)日：2009-03-05

申请号：US12028643

申请日：2008-02-08

申请人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

发明人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

IPC分类号： C23C16/00

CPC分类号： H01L21/32051 ,  B01J19/0046 ,  B01J2219/0043 ,  B01J2219/00536 ,  B01J2219/00596 ,  B01J2219/00659 ,  B01J2219/00745 ,  B01J2219/00756 ,  C23C14/042 ,  C23C14/50 ,  C23C14/548 ,  C23C16/45544 ,  H01L21/67005 ,  H01L21/6719

摘要： A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.

公开(公告)号：US08449678B2

公开(公告)日：2013-05-28

申请号：US12028643

申请日：2008-02-08

申请人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

发明人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

IPC分类号： H01L21/31 ,  C23C16/458 ,  C23C16/50 ,  B65H1/00

CPC分类号： H01L21/32051 ,  B01J19/0046 ,  B01J2219/0043 ,  B01J2219/00536 ,  B01J2219/00596 ,  B01J2219/00659 ,  B01J2219/00745 ,  B01J2219/00756 ,  C23C14/042 ,  C23C14/50 ,  C23C14/548 ,  C23C16/45544 ,  H01L21/67005 ,  H01L21/6719

摘要： A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.

公开(公告)号：US08771483B2

公开(公告)日：2014-07-08

申请号：US12027980

申请日：2008-02-07

申请人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

发明人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

IPC分类号： C23C14/00 ,  C23C16/50 ,  C25B11/00 ,  H01L21/306

CPC分类号： H01L21/32051 ,  B01J19/0046 ,  B01J2219/0043 ,  B01J2219/00536 ,  B01J2219/00596 ,  B01J2219/00659 ,  B01J2219/00745 ,  B01J2219/00756 ,  C23C14/042 ,  C23C14/50 ,  C23C14/548 ,  C23C16/45544 ,  H01L21/67005 ,  H01L21/6719

摘要： A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.

摘要翻译： 提供组合处理室。 组合处理室被配置为隔离可旋转的衬底支撑件的径向部分，该可旋转衬底支撑件又被配置为支撑衬底。 在一个实施例中，腔室包括多个聚集过程头。 在一个实施例中，具有设置在基板支撑件和工艺头之间的基板的插入件限定了用于沉积工艺的约束区域。 基板具有能够将沉积材料接近基板的开口。 通过基板的旋转和开口的移动，基板的多个区域是可访问的，以在单个基板上执行组合处理。

公开(公告)号：US20120142197A1

公开(公告)日：2012-06-07

申请号：US13372729

申请日：2012-02-14

申请人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

发明人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

IPC分类号： H01L21/31 ,  C23C16/458 ,  C23C16/50 ,  B65H1/00

CPC分类号： H01L21/32051 ,  B01J19/0046 ,  B01J2219/0043 ,  B01J2219/00536 ,  B01J2219/00596 ,  B01J2219/00659 ,  B01J2219/00745 ,  B01J2219/00756 ,  C23C14/042 ,  C23C14/50 ,  C23C14/548 ,  C23C16/45544 ,  H01L21/67005 ,  H01L21/6719

摘要： A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.

公开(公告)号：US20090061108A1

公开(公告)日：2009-03-05

申请号：US12027980

申请日：2008-02-07

申请人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

发明人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

IPC分类号： B05C13/00 ,  H05H1/24

CPC分类号： H01L21/32051 ,  B01J19/0046 ,  B01J2219/0043 ,  B01J2219/00536 ,  B01J2219/00596 ,  B01J2219/00659 ,  B01J2219/00745 ,  B01J2219/00756 ,  C23C14/042 ,  C23C14/50 ,  C23C14/548 ,  C23C16/45544 ,  H01L21/67005 ,  H01L21/6719

摘要： A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.

摘要翻译： 提供组合处理室。 组合处理室被配置为隔离可旋转的衬底支撑件的径向部分，该可旋转衬底支撑件又被配置为支撑衬底。 在一个实施例中，腔室包括多个聚集过程头。 在一个实施例中，具有设置在基板支撑件和工艺头之间的基板的插入件限定了用于沉积工艺的约束区域。 基板具有能够将沉积材料接近基板的开口。 通过基板的旋转和开口的移动，基板的多个区域是可访问的，以在单个基板上执行组合处理。

公开(公告)号：US08932995B2

公开(公告)日：2015-01-13

申请号：US13333007

申请日：2011-12-21

申请人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

发明人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

IPC分类号： H01L21/265 ,  H01L21/28 ,  C23C16/455 ,  B01J19/00 ,  C23C14/04 ,  C23C14/50 ,  C23C14/54 ,  H01L21/67

CPC分类号： H01L21/32051 ,  B01J19/0046 ,  B01J2219/0043 ,  B01J2219/00536 ,  B01J2219/00596 ,  B01J2219/00659 ,  B01J2219/00745 ,  B01J2219/00756 ,  C23C14/042 ,  C23C14/50 ,  C23C14/548 ,  C23C16/45544 ,  H01L21/67005 ,  H01L21/6719

摘要： A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.

摘要翻译： 提供组合处理室。 组合处理室被配置为隔离可旋转的衬底支撑件的径向部分，该可旋转衬底支撑件又被配置为支撑衬底。 在一个实施例中，腔室包括多个聚集过程头。 在一个实施例中，具有设置在基板支撑件和工艺头之间的基板的插入件限定了用于沉积工艺的约束区域。 基板具有能够将沉积材料接近基板的开口。 通过基板的旋转和开口的移动，基板的多个区域是可访问的，以在单个基板上执行组合处理。

公开(公告)号：US08758581B2

公开(公告)日：2014-06-24

申请号：US12205544

申请日：2008-09-05

申请人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

发明人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

IPC分类号： C23C14/00 ,  C25B11/00 ,  C23C16/50 ,  H01L21/306

CPC分类号： H01L21/32051 ,  B01J19/0046 ,  B01J2219/0043 ,  B01J2219/00536 ,  B01J2219/00596 ,  B01J2219/00659 ,  B01J2219/00745 ,  B01J2219/00756 ,  C23C14/042 ,  C23C14/50 ,  C23C14/548 ,  C23C16/45544 ,  H01L21/67005 ,  H01L21/6719

摘要： A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.

公开(公告)号：US20120149180A1

公开(公告)日：2012-06-14

申请号：US13333007

申请日：2011-12-21

申请人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

发明人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

IPC分类号： H01L21/265 ,  H01L21/28

CPC分类号： H01L21/32051 ,  B01J19/0046 ,  B01J2219/0043 ,  B01J2219/00536 ,  B01J2219/00596 ,  B01J2219/00659 ,  B01J2219/00745 ,  B01J2219/00756 ,  C23C14/042 ,  C23C14/50 ,  C23C14/548 ,  C23C16/45544 ,  H01L21/67005 ,  H01L21/6719

摘要： A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.

摘要翻译： 提供组合处理室。 组合处理室被配置为隔离可旋转的衬底支撑件的径向部分，该可旋转衬底支撑件又被配置为支撑衬底。 在一个实施例中，腔室包括多个聚集过程头。 在一个实施例中，具有设置在基板支撑件和工艺头之间的基板的插入件限定了用于沉积工艺的约束区域。 基板具有能够将沉积材料接近基板的开口。 通过基板的旋转和开口的移动，基板的多个区域是可访问的，以在单个基板上执行组合处理。

公开(公告)号：US20090069924A1

公开(公告)日：2009-03-12

申请号：US12205544

申请日：2008-09-05

申请人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

发明人： Rick Endo ,  Kurt Weiner ,  Indranil De ,  James Tsung ,  Maosheng Zhao ,  Jeremy Cheng

IPC分类号： G06F17/00

CPC分类号： H01L21/32051 ,  B01J19/0046 ,  B01J2219/0043 ,  B01J2219/00536 ,  B01J2219/00596 ,  B01J2219/00659 ,  B01J2219/00745 ,  B01J2219/00756 ,  C23C14/042 ,  C23C14/50 ,  C23C14/548 ,  C23C16/45544 ,  H01L21/67005 ,  H01L21/6719

摘要： A combinatorial processing chamber is provided. The combinatorial processing chamber is configured to isolate a radial portion of a rotatable substrate support, which in turn is configured to support a substrate. The chamber includes a plurality of clusters process heads in one embodiment. An insert having a base plate disposed between the substrate support and the process heads defines a confinement region for a deposition process in one embodiment. The base plate has an opening to enable access of the deposition material to the substrate. Through rotation of the substrate and movement of the opening, multiple regions of the substrate are accessible for performing combinatorial processing on a single substrate.