Methods for forming particles
    1.
    发明授权
    Methods for forming particles 有权
    形成颗粒的方法

    公开(公告)号:US09371226B2

    公开(公告)日:2016-06-21

    申请号:US13019879

    申请日:2011-02-02

    摘要: Single source precursors or pre-copolymers of single source precursors are subjected to microwave radiation to form particles of a I-III-VI2 material. Such particles may be formed in a wurtzite phase and may be converted to a chalcopyrite phase by, for example, exposure to heat. The particles in the wurtzite phase may have a substantially hexagonal shape that enables stacking into ordered layers. The particles in the wurtzite phase may be mixed with particles in the chalcopyrite phase (i.e., chalcopyrite nanoparticles) that may fill voids within the ordered layers of the particles in the wurtzite phase thus produce films with good coverage. In some embodiments, the methods are used to form layers of semiconductor materials comprising a I-III-VI2 material. Devices such as, for example, thin-film solar cells may be fabricated using such methods.

    摘要翻译: 将单源前体或单源前体的预共聚物进行微波辐射以形成I-III-VI2材料的颗粒。 这样的颗粒可以以纤锌矿相形成,并且可以通过例如暴露于热而转变成黄铜矿相。 纤锌矿相中的颗粒可以具有基本上六边形的形状,其能够堆叠成有序层。 纤锌矿相中的颗粒可以与黄铜矿相中的颗粒(即,黄铜矿纳米颗粒)混合,其可以填充纤锌矿相中颗粒的有序层内的空隙,从而产生具有良好覆盖率的膜。 在一些实施例中,所述方法用于形成包含I-III-VI2材料的半导体材料层。 可以使用这样的方法来制造诸如薄膜太阳能电池的装置。

    Methods of forming single source precursors, methods of forming polymeric single source precursors, and single source precursors and intermediate products formed by such methods
    3.
    发明授权
    Methods of forming single source precursors, methods of forming polymeric single source precursors, and single source precursors and intermediate products formed by such methods 有权
    形成单源前体的方法,形成聚合单源前体的方法,以及通过这些方法形成的单源前体和中间产物

    公开(公告)号:US08324414B2

    公开(公告)日:2012-12-04

    申请号:US12646474

    申请日:2009-12-23

    IPC分类号: C07F15/00 C07F9/02 C07F1/00

    CPC分类号: C07F9/5045 C07F19/005

    摘要: Methods of forming single source precursors (SSPs) include forming intermediate products having the empirical formula ½{L2N(μ-X)2M′X2}2, and reacting MER with the intermediate products to form SSPs of the formula L2N(μ-ER)2M′(ER)2, wherein L is a Lewis base, M is a Group IA atom, N is a Group IB atom, M′ is a Group IIIB atom, each E is a Group VIB atom, each X is a Group VIIA atom or a nitrate group, and each R group is an alkyl, aryl, vinyl, (per)fluoro alkyl, (per)fluoro aryl, silane, or carbamato group. Methods of forming polymeric or copolymeric SSPs include reacting at least one of HE1R1E1H and MER with one or more substances having the empirical formula L2N(μ-ER)2M′(ER)2 or L2N(μ-X)2M′(X)2 to form a polymeric or copolymeric SSP. New SSPs and intermediate products are formed by such methods.

    摘要翻译: 形成单源前体(SSPs)的方法包括形成具有经验式½{L2N(μ-X)2M'X2} 2的中间产物,并使MER与中间产物反应形成式L2N(μ-ER)的SSP, 2M'(ER)2,其中L是路易斯碱,M是IA族原子,N是IB族原子,M'是IIIB原子,每个E是VIB族原子,每个X是VIIA族 原子或硝酸根,每个R基团是烷基,芳基,乙烯基,(全)氟烷基,(全)氟芳基,硅烷或氨基甲酰基。 形成聚合物或共聚物SSP的方法包括使HE1R1E1H和MER中的至少一种与一种或多种具有经验式L2N(μ-ER)2M'(ER)2或L2N(μ-X)2M'(X)2 以形成聚合物或共聚物SSP。 通过这种方法形成新的SSP和中间产品。

    METHODS OF FORMING SINGLE SOURCE PRECURSORS, METHODS OF FORMING POLYMERIC SINGLE SOURCE PRECURSORS, AND SINGLE SOURCE PRECURSORS AND INTERMEDIATE PRODUCTS FORMED BY SUCH METHODS
    4.
    发明申请
    METHODS OF FORMING SINGLE SOURCE PRECURSORS, METHODS OF FORMING POLYMERIC SINGLE SOURCE PRECURSORS, AND SINGLE SOURCE PRECURSORS AND INTERMEDIATE PRODUCTS FORMED BY SUCH METHODS 有权
    形成单一来源前体的方法,形成聚合单体源前体的方法,单源资源前体和通过这些方法形成的中间产物

    公开(公告)号:US20110152554A1

    公开(公告)日:2011-06-23

    申请号:US12646474

    申请日:2009-12-23

    IPC分类号: C07F1/08

    CPC分类号: C07F9/5045 C07F19/005

    摘要: Methods of forming single source precursors (SSPs) include forming intermediate products having the empirical formula ½{L2N(μ-X)2M′X2}2, and reacting MER with the intermediate products to form SSPs of the formula L2N(μ-ER)2M′(ER)2, wherein L is a Lewis base, M is a Group IA atom, N is a Group IB atom, M′ is a Group IIIB atom, each E is a Group VIB atom, each X is a Group VIIA atom or a nitrate group, and each R group is an alkyl, aryl, vinyl, (per)fluoro alkyl, (per)fluoro aryl, silane, or carbamato group. Methods of forming polymeric or copolymeric SSPs include reacting at least one of HE1R1E1H and MER with one or more substances having the empirical formula L2N(μ-ER)2M′(ER)2 or L2N(μ-X)2M′(X)2 to form a polymeric or copolymeric SSP. New SSPs and intermediate products are formed by such methods.

    摘要翻译: 形成单源前体(SSPs)的方法包括形成具有经验式½{L2N(μ-X)2M'X2} 2的中间产物,并使MER与中间产物反应形成式L2N(μ-ER)的SSP, 2M'(ER)2,其中L是路易斯碱,M是IA族原子,N是IB族原子,M'是IIIB原子,每个E是VIB族原子,每个X是VIIA族 原子或硝酸根,每个R基团是烷基,芳基,乙烯基,(全)氟烷基,(全)氟芳基,硅烷或氨基甲酰基。 形成聚合物或共聚物SSP的方法包括使HE1R1E1H和MER中的至少一种与一种或多种具有经验式L2N(μ-ER)2M'(ER)2或L2N(μ-X)2M'(X)2 以形成聚合物或共聚物SSP。 通过这种方法形成新的SSP和中间产品。

    Methods of forming semiconductor devices and devices formed using such methods
    6.
    发明授权
    Methods of forming semiconductor devices and devices formed using such methods 有权
    使用这种方法形成半导体器件和器件的方法

    公开(公告)号:US08445388B2

    公开(公告)日:2013-05-21

    申请号:US13099043

    申请日:2011-05-02

    IPC分类号: H01L21/461

    摘要: Single source precursors are subjected to carbon dioxide to form particles of material. The carbon dioxide may be in a supercritical state. Single source precursors also may be subjected to supercritical fluids other than supercritical carbon dioxide to form particles of material. The methods may be used to form nanoparticles. In some embodiments, the methods are used to form chalcopyrite materials. Devices such as, for example, semiconductor devices may be fabricated that include such particles. Methods of forming semiconductor devices include subjecting single source precursors to carbon dioxide to form particles of semiconductor material, and establishing electrical contact between the particles and an electrode.

    摘要翻译: 单源前体经受二氧化碳以形成材料颗粒。 二氧化碳可以处于超临界状态。 单源前体还可以经受超临界二氧化碳以外的超临界流体以形成材料颗粒。 该方法可用于形成纳米颗粒。 在一些实施方案中,所述方法用于形成黄铜矿材料。 可以制造诸如半导体器件的器件,其包括这样的粒子。 形成半导体器件的方法包括使单源前体经二氧化碳形成半导体材料颗粒,并且在颗粒和电极之间建立电接触。

    Methods for forming particles from single source precursors
    7.
    发明授权
    Methods for forming particles from single source precursors 有权
    从单源前体形成颗粒的方法

    公开(公告)号:US08003070B2

    公开(公告)日:2011-08-23

    申请号:US12047956

    申请日:2008-03-13

    IPC分类号: C01B17/00 C01B19/00

    摘要: Single source precursors are subjected to carbon dioxide to form particles of material. The carbon dioxide may be in a supercritical state. Single source precursors also may be subjected to supercritical fluids other than supercritical carbon dioxide to form particles of material. The methods may be used to form nanoparticles. In some embodiments, the methods are used to form chalcopyrite materials. Devices such as, for example, semiconductor devices may be fabricated that include such particles. Methods of forming semiconductor devices include subjecting single source precursors to carbon dioxide to form particles of semiconductor material, and establishing electrical contact between the particles and an electrode.

    摘要翻译: 单源前体经受二氧化碳以形成材料颗粒。 二氧化碳可以处于超临界状态。 单源前体还可以经受超临界二氧化碳以外的超临界流体以形成材料颗粒。 该方法可用于形成纳米颗粒。 在一些实施方案中,所述方法用于形成黄铜矿材料。 可以制造诸如半导体器件的器件,其包括这样的粒子。 形成半导体器件的方法包括使单源前体经二氧化碳形成半导体材料颗粒,并且在颗粒和电极之间建立电接触。

    Hybrid particles and associated methods
    8.
    发明授权
    Hybrid particles and associated methods 有权
    混合粒子和相关方法

    公开(公告)号:US08951446B2

    公开(公告)日:2015-02-10

    申请号:US13365800

    申请日:2012-02-03

    IPC分类号: H01B1/02

    摘要: Hybrid particles that comprise a coating surrounding a chalcopyrite material, the coating comprising a metal, a semiconductive material, or a polymer; a core comprising a chalcopyrite material and a shell comprising a functionalized chalcopyrite material, the shell enveloping the core; or a reaction product of a chalcopyrite material and at least one of a reagent, heat, and radiation. Methods of forming the hybrid particles are also disclosed.

    摘要翻译: 包含围绕黄铜矿材料的涂层的混合颗粒,所述涂层包含金属,半导体材料或聚合物; 包含黄铜矿材料的核心和包含官能化黄铜矿材料的壳体,所述壳体包围所述核心; 或黄铜矿材料与试剂,热和辐射中的至少一种的反应产物。 还公开了形成杂化颗粒的方法。

    METHODS OF FORMING SEMICONDUCTOR DEVICES AND DEVICES FORMED USING SUCH METHODS
    9.
    发明申请
    METHODS OF FORMING SEMICONDUCTOR DEVICES AND DEVICES FORMED USING SUCH METHODS 有权
    形成半导体器件的方法和使用这种方法形成的器件

    公开(公告)号:US20110204320A1

    公开(公告)日:2011-08-25

    申请号:US13099043

    申请日:2011-05-02

    摘要: Single source precursors are subjected to carbon dioxide to form particles of material. The carbon dioxide may be in a supercritical state. Single source precursors also may be subjected to supercritical fluids other than supercritical carbon dioxide to form particles of material. The methods may be used to form nanoparticles. In some embodiments, the methods are used to form chalcopyrite materials. Devices such as, for example, semiconductor devices may be fabricated that include such particles. Methods of forming semiconductor devices include subjecting single source precursors to carbon dioxide to form particles of semiconductor material, and establishing electrical contact between the particles and an electrode.

    摘要翻译: 单源前体经受二氧化碳以形成材料颗粒。 二氧化碳可以处于超临界状态。 单源前体还可以经受超临界二氧化碳以外的超临界流体以形成材料颗粒。 该方法可用于形成纳米颗粒。 在一些实施方案中,所述方法用于形成黄铜矿材料。 可以制造诸如半导体器件的器件,其包括这样的粒子。 形成半导体器件的方法包括使单源前体经二氧化碳形成半导体材料颗粒,并且在颗粒和电极之间建立电接触。

    METHODS FOR REMOVING CONTAMINANT MATTER FROM A POROUS MATERIAL
    10.
    发明申请
    METHODS FOR REMOVING CONTAMINANT MATTER FROM A POROUS MATERIAL 有权
    从多孔材料中去除污染物的方法

    公开(公告)号:US20100206326A1

    公开(公告)日:2010-08-19

    申请号:US12704393

    申请日:2010-02-11

    IPC分类号: B08B7/00

    摘要: Methods of removing contaminant matter from porous materials include applying a polymer material to a contaminated surface, irradiating the contaminated surface to cause redistribution of contaminant matter, and removing at least a portion of the polymer material from the surface. Systems for decontaminating a contaminated structure comprising porous material include a radiation device configured to emit electromagnetic radiation toward a surface of a structure, and at least one spray device configured to apply a capture material onto the surface of the structure. Polymer materials that can be used in such methods and systems include polyphosphazine-based polymer materials having polyphosphazine backbone segments and side chain groups that include selected functional groups. The selected functional groups may include iminos, oximes, carboxylates, sulfonates, β-diketones, phosphine sulfides, phosphates, phosphites, phosphonates, phosphinates, phosphine oxides, monothio phosphinic acids, and dithio phosphinic acids.

    摘要翻译: 从多孔材料去除污染物质的方法包括将聚合物材料施加到污染的表面上,照射被污染的表面以引起污染物质的再分配,以及从表面除去至少一部分聚合物材料。 用于净化包括多孔材料的污染结构的系统包括被配置为朝向结构的表面发射电磁辐射的辐射装置和被配置为将捕获材料施加到结构的表面上的至少一个喷射装置。 可以用于这些方法和体系的聚合物材料包括具有多聚磷腈骨架链段的聚磷腈基聚合物材料和包括选定官能团的侧链基团。 所选择的官能团可以包括亚氨基,肟,羧酸盐,磺酸盐,二酮,硫化膦,磷酸盐,亚磷酸盐,膦酸盐,次膦酸盐,氧化膦,一硫次膦酸和二硫次膦酸。