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    REACTION CHAMBER WITH REMOVABLE LINER
    1.
    发明申请
    REACTION CHAMBER WITH REMOVABLE LINER 有权
    具有可拆卸内衬的反应室

    公开(公告)号：US20100247763A1

    公开(公告)日：2010-09-30

    申请号：US12609308

    申请日：2009-10-30

    申请人： Roger R. Coutu ,  Jill S. Becker ,  Douwe J. Monsma

    发明人： Roger R. Coutu ,  Jill S. Becker ,  Douwe J. Monsma

    IPC分类号： C23C16/44 ,  C23C16/00

    CPC分类号： C23C16/45525 ,  C23C16/4401 ,  C23C16/4407 ,  C23C16/4412 ,  C23C16/45504 ,  C23C16/45582

    摘要： A reaction chamber assembly for thin film deposition processes or the like includes an outer wall assembly for enclosing an outer volume and a removable liner installed into the outer volume through an outer aperture for preventing precursors or reactants from coming into contact with internal surfaces of the outer wall assembly and forming thin film layers thereon. The removable liner encloses a reaction chamber and includes substrate support trays or the like for supporting substrates being coated. Thin film layers are formed onto internal surfaces of the removable liner instead of onto surfaces of the outer wall assembly. The removable liner may be disposable or may comprise stainless steel, which can be removed when contaminated, cleaned by abrasive blasting such as bead blasting, and replaced. Two removable liners can be used to periodically swap removable liners and clean one of the liners while the other is in service with minimal disruption to production coating schedules. Other removable cleanable elements such as input and output plenums, door liners and conduits comprising stainless steel can be periodically removed and cleaned by abrasive blasting.

    摘要翻译： 用于薄膜沉积工艺等的反应室组件包括用于封闭外部容积的外壁组件和通过外部孔安装到外部容积中的可移除衬套，用于防止前体或反应物与外部的内表面接触 壁组装和在其上形成薄膜层。 可拆卸的衬垫包围反应室，并且包括用于支撑被涂覆的衬底的衬底支撑托盘等。 薄膜层形成在可拆卸内衬的内表面上，而不是形成在外壁组件的表面上。 可移除衬垫可以是一次性的，或者可以包括不锈钢，其可以在被污染时被去除，通过诸如珠粒喷砂的喷砂处理来清洁并被更换。 两个可拆卸的衬垫可用于周期性地切换可拆卸的衬垫，并清洁其中一个衬垫，而另一个可以使用，而对生产涂层计划的影响最小。 其他可移除的可清洁元件，例如输入和输出增压室，门衬套和包括不锈钢的管道可以通过喷砂周期性地去除和清洁。

    System and method for thin film deposition
    2.
    发明授权
    System and method for thin film deposition 有权
    薄膜沉积的系统和方法

    公开(公告)号：US09328417B2

    公开(公告)日：2016-05-03

    申请号：US12609319

    申请日：2009-10-30

    申请人： Jill S. Becker ,  Roger R. Coutu ,  Douwe J. Monsma

    发明人： Jill S. Becker ,  Roger R. Coutu ,  Douwe J. Monsma

    IPC分类号： C23C16/458 ,  C23C16/44 ,  C23C16/455

    CPC分类号： C23C16/4401 ,  C23C16/45504 ,  C23C16/45546 ,  C23C16/45582

    摘要： A reaction chamber assembly suitable for forming thin film deposition layers onto solid substrates includes a reaction chamber and an input plenum for receiving source material from gas source containers and delivering a flow of source material into the reaction chamber uniformly distributed across a substrate support width. An output plenum connected between the reaction chamber and a vacuum pump uniformly removes an outflow of material from the reaction chamber across the substrate support width. The input plenum is configured to expand a volume of the source material and deliver the source material to the substrate support area with uniform source material flow distribution across the substrate support width. The output plenum is configured to remove the outflow material across the entire substrate support width and to compress the volume of outflow material prior to the outflow material exiting the output plenum. The resulting source material flow over substrates supported in the substrate support area is uniformly distributed across the substrate support width and unidirectional with a uniform flow velocity. The configuration of the reaction chamber assembly reduces pump down times.

    摘要翻译： 适用于在固体基底上形成薄膜沉积层的反应室组件包括反应室和用于从气体源容器接收源材料并且将源材料流输送到均匀分布在基板支撑宽度上的反应室中的输入增压室。 连接在反应室和真空泵之间的输出增压室均匀地去除了跨过基板支撑宽度的材料从反应室流出。 输入增压室被配置为扩大源材料的体积并且将源材料输送到衬底支撑区域，并且在衬底支撑宽度上具有均匀的源材料流分布。 输出增压室构造成在整个衬底支撑宽度上移除流出物料，并在流出物料离开输出增压室之前压缩流出物料的体积。 所产生的源材料流过支撑在基板支撑区域中的基板上，均匀分布在基板支撑宽度上并具有均匀的流动速度的单向。 反应室组件的结构减少了抽空时间。

    Reaction chamber with removable liner
    3.
    发明授权
    Reaction chamber with removable liner 有权
    具有可拆卸衬套的反应室

    公开(公告)号：US09175388B2

    公开(公告)日：2015-11-03

    申请号：US12609308

    申请日：2009-10-30

    申请人： Roger R. Coutu ,  Jill S. Becker ,  Douwe J. Monsma

    发明人： Roger R. Coutu ,  Jill S. Becker ,  Douwe J. Monsma

    IPC分类号： C23C16/00 ,  C23C16/44 ,  C23C16/455

    CPC分类号： C23C16/45525 ,  C23C16/4401 ,  C23C16/4407 ,  C23C16/4412 ,  C23C16/45504 ,  C23C16/45582

    摘要： A reaction chamber assembly for thin film deposition processes or the like includes an outer wall assembly for enclosing an outer volume and a removable liner installed into the outer volume through an outer aperture for preventing precursors or reactants from coming into contact with internal surfaces of the outer wall assembly and forming thin film layers thereon. The removable liner encloses a reaction chamber and includes substrate support trays or the like for supporting substrates being coated. Thin film layers are formed onto internal surfaces of the removable liner instead of onto surfaces of the outer wall assembly. The removable liner may be disposable or may comprise stainless steel, which can be removed when contaminated, cleaned by abrasive blasting such as bead blasting, and replaced. Two removable liners can be used to periodically swap removable liners and clean one of the liners while the other is in service with minimal disruption to production coating schedules. Other removable cleanable elements such as input and output plenums, door liners and conduits comprising stainless steel can be periodically removed and cleaned by abrasive blasting.

    摘要翻译： 用于薄膜沉积工艺等的反应室组件包括用于封闭外部容积的外壁组件和通过外部孔安装到外部容积中的可移除衬套，用于防止前体或反应物与外部的内表面接触 壁组装和在其上形成薄膜层。 可拆卸的衬垫包围反应室，并且包括用于支撑被涂覆的衬底的衬底支撑托盘等。 薄膜层形成在可拆卸内衬的内表面上，而不是形成在外壁组件的表面上。 可移除衬垫可以是一次性的，或者可以包括不锈钢，其可以在被污染时被去除，通过诸如珠粒喷砂的喷砂处理来清洁并被更换。 两个可拆卸的衬垫可用于周期性地切换可拆卸的衬垫，并清洁其中一个衬垫，而另一个可以使用，而对生产涂层计划的影响最小。 其他可移除的可清洁元件，例如输入和输出增压室，门衬套和包括不锈钢的管道可以通过喷砂周期性地去除和清洁。

    PLASMA ATOMIC LAYER DEPOSITION SYSTEM AND METHOD
    4.
    发明申请
    PLASMA ATOMIC LAYER DEPOSITION SYSTEM AND METHOD 审中-公开
    等离子体原子层沉积系统和方法

    公开(公告)号：US20100183825A1

    公开(公告)日：2010-07-22

    申请号：US12647821

    申请日：2009-12-28

    申请人： Jill S. Becker ,  Roger R. Coutu ,  Douwe J. Monsma

    发明人： Jill S. Becker ,  Roger R. Coutu ,  Douwe J. Monsma

    IPC分类号： C23C16/455

    CPC分类号： C23C16/45536 ,  C23C16/4404 ,  C23C16/4412 ,  C23C16/45504 ,  C23C16/45544 ,  C23C16/45555 ,  C23C16/45582 ,  C23C16/458 ,  C23C16/4583

    摘要： An improved gas deposition chamber includes a hollow gas deposition volume formed with a volume expanding top portion and a substantially constant volume cylindrical middle portion. The hollow gas deposition volume may include a volume reducing lower portion. An aerodynamically shaped substrate support chuck is disposed inside gas deposition chamber with a substrate support surface positioned in the constant volume cylindrical middle portion. The volume expanding top portion reduces gas flow velocity between gas input ports and the substrate support surface. The aerodynamic shape of the substrate support chuck reduces drag and helps to promote laminar flow over the substrate support surface. The volume reducing lower portion helps to increase gas flow velocity after the gas has past the substrate support surface. The improved gas deposition chamber is configurable to 200 mm diameter semiconductor wafers using ALD and or PALD coating cycles. An improved coating method includes expanding process gases inside the deposition chamber prior to the process gas reaching surfaces of a substrate being coated. The method further includes compressing the process gases inside the deposition chamber after the process gas has flowed past surfaces of the substrate being coated.

    摘要翻译： 改进的气体沉积室包括形成有体积扩大顶部和基本上恒定体积的圆柱形中间部分的中空气体沉积容积。 中空气体沉积体积可以包括减小体积的下部。 空气动力学形状的基板支撑卡盘设置在气体沉积室内，基板支撑表面位于恒定体积圆柱形中间部分中。 体积扩大的顶部部分减少气体输入端口和基板支撑表面之间的气体流速。 衬底支撑卡盘的空气动力学形状减小了阻力并且有助于促进衬底支撑表面上的层流。 体积减小的下部有助于在气体经过衬底支撑表面之后增加气体流速。 改进的气体沉积室可配置为使用ALD和/或PALD涂层循环的200mm直径的半导体晶片。 改进的涂覆方法包括在处理气体到达被涂覆的基底的表面之前扩展沉积室内的工艺气体。 该方法还包括在处理气体已经流过被涂覆的基底的表面之后压缩沉积室内的处理气体。

    SYSTEM AND METHOD FOR THIN FILM DEPOSITION
    5.
    发明申请
    SYSTEM AND METHOD FOR THIN FILM DEPOSITION 有权
    薄膜沉积的系统和方法

    公开(公告)号：US20100166955A1

    公开(公告)日：2010-07-01

    申请号：US12609319

    申请日：2009-10-30

    申请人： Jill S. Becker ,  Roger R. Coutu ,  Douwe J. Monsma

    发明人： Jill S. Becker ,  Roger R. Coutu ,  Douwe J. Monsma

    IPC分类号： C23C16/458

    CPC分类号： C23C16/4401 ,  C23C16/45504 ,  C23C16/45546 ,  C23C16/45582

    摘要： A reaction chamber assembly suitable for forming thin film deposition layers onto solid substrates includes a reaction chamber and an input plenum for receiving source material from gas source containers and delivering a flow of source material into the reaction chamber uniformly distributed across a substrate support width. An output plenum connected between the reaction chamber and a vacuum pump uniformly removes an outflow of material from the reaction chamber across the substrate support width. The input plenum is configured to expand a volume of the source material and deliver the source material to the substrate support area with uniform source material flow distribution across the substrate support width. The output plenum is configured to remove the outflow material across the entire substrate support width and to compress the volume of outflow material prior to the outflow material exiting the output plenum. The resulting source material flow over substrates supported in the substrate support area is uniformly distributed across the substrate support width and unidirectional with a uniform flow velocity. The configuration of the reaction chamber assembly reduces pump down times.

    摘要翻译： 适用于在固体基底上形成薄膜沉积层的反应室组件包括反应室和用于从气体源容器接收源材料并且将源材料流输送到均匀分布在基板支撑宽度上的反应室中的输入增压室。 连接在反应室和真空泵之间的输出增压室均匀地去除了跨过基板支撑宽度的材料从反应室流出。 输入增压室被配置为扩大源材料的体积并且将源材料输送到衬底支撑区域，并且在衬底支撑宽度上具有均匀的源材料流分布。 输出增压室构造成在整个衬底支撑宽度上移除流出物料，并在流出物料离开输出增压室之前压缩流出物料的体积。 所产生的源材料流过支撑在基板支撑区域中的基板上，均匀分布在基板支撑宽度上并具有均匀的流动速度的单向。 反应室组件的结构减少了抽空时间。