公开(公告)号：US20200379353A1

公开(公告)日：2020-12-03

申请号：US16871228

申请日：2020-05-11

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Irvinder KAUR ,  Colin LIU ,  Xisen Hou ,  Kevin Rowell ,  Mingqi LI ,  Cheng-Bai Xu

IPC: G03F7/38 ,  G03F7/40 ,  H01L21/027 ,  H01L21/311 ,  C07C309/28

Abstract: Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I): wherein: Ar1 represents an aromatic group; R1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R1 groups together optionally form a fused ring structure with Ar1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar1, and two or more of R1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.

公开(公告)号：US20210108065A1

公开(公告)日：2021-04-15

申请号：US16653690

申请日：2019-10-15

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Yang SONG ,  Jong Keun PARK ,  Emad AQAD ,  Mingqi LI ,  Colin LIU ,  James W. THACKERAY ,  Peter TREFONAS, III

IPC: C08L33/08 ,  C08L25/14 ,  G03F7/038 ,  G03F7/20

Abstract: A polymer comprising: a first repeating unit comprising a tertiary ester acid labile group; and a second repeating unit of Formula (1): wherein R1 to R5 are as provided herein; R2 and R3 together do not form a ring; each A is independently a halogen, a carboxylic acid or ester, a thiol, a straight chain or branched C1-20 alkyl, a monocyclic or polycyclic C3-20 cycloalkyl, a monocyclic or polycyclic C3-20 fluorocycloalkenyl, a monocyclic or polycyclic C3-20 heterocycloalkyl, a monocyclic or polycyclic C6-20 aryl, or a monocyclic or polycyclic C4-20 heteroaryl, each of which is substituted or unsubstituted; and m is an integer of 0 to 4.