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    Method of manufacturing an optical system
    1.
    发明授权
    Method of manufacturing an optical system 有权
    制造光学系统的方法

    公开(公告)号：US07133225B1

    公开(公告)日：2006-11-07

    申请号：US10965909

    申请日：2004-10-18

    申请人： Rolf Freimann ,  Bernhard Fellner ,  Hans-Guenther Sachs ,  Hartmut Brandenburg ,  Bernd Doerband ,  Frank Schillke

    发明人： Rolf Freimann ,  Bernhard Fellner ,  Hans-Guenther Sachs ,  Hartmut Brandenburg ,  Bernd Doerband ,  Frank Schillke

    IPC分类号： G02B7/02 ,  G01B11/00 ,  G01N23/207

    CPC分类号： G02B7/023 ,  G02B7/1821 ,  G03F7/70258 ,  G03F7/70825

    摘要： A method of manufacturing an optical system comprises assembling an optical element on a mounting frame thereof. The mounting frame is disposed on a rotary table having an axis of rotation, and the mounting frame is adjusted such that a predefined axis of symmetry thereof is parallel to the axis of rotation. The optical element is placed on the mounting frame, and an interferometric measurement of a surface of the optical element is performed. The interferometric measurement is analyzed to arrange the optical element relative to the mounting frame such that a predefined axis of the optical element is parallel to the axis of rotation.

    摘要翻译： 制造光学系统的方法包括在其安装框架上组装光学元件。 安装框架设置在具有旋转轴线的旋转工作台上，并且调整安装框架使其预定的对称轴线平行于旋转轴线。 将光学元件放置在安装框架上，并执行光学元件的表面的干涉测量。 分析干涉测量以使光学元件相对于安装框架布置，使得光学元件的预定轴线平行于旋转轴线。

    Method of qualifying a diffraction grating and method of manufacturing an optical element
    2.
    发明申请
    Method of qualifying a diffraction grating and method of manufacturing an optical element 审中-公开
    限定衍射光栅的方法和制造光学元件的方法

    公开(公告)号：US20060274325A1

    公开(公告)日：2006-12-07

    申请号：US11439719

    申请日：2006-05-23

    申请人： Jochen Hetzler ,  Ulrich Andiel ,  Hartmut Brandenburg

    发明人： Jochen Hetzler ,  Ulrich Andiel ,  Hartmut Brandenburg

    IPC分类号： G01B9/02

    CPC分类号： G02B5/1861 ,  G01B9/02039 ,  G01B9/02057 ,  G01B11/2441 ,  G01B2290/70 ,  G02B27/0944 ,  G02B27/42 ,  G02B27/4233

    摘要： A method of qualifying a diffraction grating comprises performing plural measurements by illuminating a region of the grating with a beam of measuring light and detecting an intensity of measuring light diffracted by the grating into a 0th diffraction order. A wavelength of the measuring light or a polarization of the measuring light or an angle of incidence of the measuring light onto the diffraction grating is varied between subsequent measurements. A shape parameter of diffracting elements forming the grating comprises a pitch, height or width of structural features of the diffracting elements. The shape parameter is advantageously used in analyzing interferometric measurements performed on optical surfaces during manufacture of optical elements of a high accuracy.

    摘要翻译： 限定衍射光栅的方法包括通过用测量光束照射光栅的区域并且将由光栅衍射的测量光的强度检测为第0衍射级来执行多个测量。 测量光的波长或测量光的偏振或测量光入射到衍射光栅上的入射角在随后的测量之间变化。 形成光栅的衍射元件的形状参数包括衍射元件的结构特征的节距，高度或宽度。 形状参数有利地用于分析在高精度的光学元件的制造期间在光学表面上执行的干涉测量。