Interchangeable disk clamp
    1.
    发明授权
    Interchangeable disk clamp 失效
    可互换盘夹

    公开(公告)号:US08498184B1

    公开(公告)日:2013-07-30

    申请号:US12478642

    申请日:2009-06-04

    IPC分类号: G11B21/08 G11B7/085 G11B17/22

    CPC分类号: G11B17/22

    摘要: A media processing system for processing media having differing properties, the media processing system having a base. The base has a base radial alignment portion, a base vertical alignment portion, and a base retention portion. A set of removable media clamps is included, where each of the set of removable media clamps is adapted for the differing properties of the media, each removable media clamp has a removable media clamp radial alignment portion for engaging the base radial alignment portion and radially aligning the removable media clamp with the base, a removable media clamp vertical alignment portion for engaging the base vertical alignment portion and vertically aligning the removable media clamp with the base, and a media engagement portion for engaging the media. The retention portion is controllable by the media processing system to selectively retain and release a mounted one of the removable media clamps without manual intervention.

    摘要翻译: 一种用于处理具有不同特性的介质的介质处理系统,所述介质处理系统具有基座。 基部具有基部径向对准部,基部垂直对准部和基部保持部。 包括一组可移动介质夹具,其中每组可移动介质夹具适用于介质的不同特性,每个可拆卸介质夹具具有可拆卸的介质夹具径向对准部分,用于接合基部径向对准部分和径向对准 具有基座的可拆卸介质夹具,用于接合基座垂直对准部分并将可移除介质夹具与基座垂直对准的可移除介质夹具垂直对准部分,以及用于接合介质的介质接合部分。 保持部分可由介质处理系统控制,以选择性地保持和释放所安装的一个可移动介质夹具而无需手动干预。

    System and method for measuring object characteristics using phase differences in polarized light reflections
    6.
    发明授权
    System and method for measuring object characteristics using phase differences in polarized light reflections 失效
    使用偏振光反射相位差来测量物体特性的系统和方法

    公开(公告)号:US06956658B2

    公开(公告)日:2005-10-18

    申请号:US10660984

    申请日:2003-09-12

    摘要: A system and method for performing a magnetic imaging, optical profiling, and measuring lubricant thickness and degradation, carbon wear, carbon thickness, and surface roughness of thin film magnetic disks and silicon wafers at angles that are not substantially Brewster's angle of the thin film (carbon) protective overcoat is provided. The system and method involve a focused optical light whose polarization can be switched between P or S polarization is incident at an angle to the surface of the thin film magnetic disk. This generates both reflected and scattered light that may be measured to determine various values and properties related to the surface of the disk, including identifying the Kerr-effect in reflected light for determination of point magnetic properties. In addition, the present invention can mark the position of an identified defect.

    摘要翻译: 用于以基本上不是薄膜的布鲁斯特角的角度执行磁性成像,光学轮廓和测量润滑剂厚度和降解,碳磨损,碳厚度和薄膜磁盘和硅晶片的表面粗糙度的系统和方法( 碳)保护罩。 该系统和方法涉及一种聚焦的光,其偏振可以在P或S之间切换,偏振以一定角度入射到薄膜磁盘的表面。 这产生可以测量的反射和散射光,以确定与盘的表面相关的各种值和性质,包括识别用于确定点磁性的反射光中的克尔效应。 此外,本发明可以标识所识别的缺陷的位置。

    Multi-surface scattered radiation differentiation
    7.
    发明授权
    Multi-surface scattered radiation differentiation 有权
    多面散射辐射分化

    公开(公告)号:US08848181B1

    公开(公告)日:2014-09-30

    申请号:US13861383

    申请日:2013-04-12

    IPC分类号: G01N21/00 G01N21/958

    摘要: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a first and second waveplate, a polarizing beam splitter, a first detector, a focusing lens, a blocker, and a second detector. The radiating source irradiates the first waveplate generating circularly polarized source beam that irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. Reflected radiation from a sample is directed to the second waveplate generating linearly polarized beam that irradiates the polarizing beam splitter which directs a portion of the reflected radiation to the first detector. Scattered radiation from the sample is directed by the focusing lens to the second detector. Contemporaneous measurements by the first and second detectors are compared to differentiate.

    摘要翻译: 光学检查器包括辐射源,时变光束反射器,远心扫描透镜,第一和第二波片,偏振分束器,第一检测器,聚焦透镜,阻挡器和第二检测器。 辐射源照射产生圆偏振源光束的第一波片,其用源光束照射时变光束反射器上的第一位置。 时变光束反射器将源光束引导到远心扫描透镜,然后将远光扫描透镜引导到源样品。 来自样品的反射辐射被引导到产生线偏振光束的第二波片,该线偏振光束照射偏振分束器,其将一部分反射辐射引导到第一检测器。 来自样品的散射辐射由聚焦透镜引导到第二检测器。 将第一和第二检测器的同期测量值进行比较。

    Optical inspector with selective scattered radiation blocker
    8.
    发明授权
    Optical inspector with selective scattered radiation blocker 有权
    具有选择性散射辐射阻挡剂的光学检查员

    公开(公告)号:US08836935B1

    公开(公告)日:2014-09-16

    申请号:US13861382

    申请日:2013-04-12

    IPC分类号: G01N21/00 G01N21/958

    CPC分类号: G01N21/958 G01N2021/8967

    摘要: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a blocker, a focusing lens, an aperture, and a detector. The radiating source irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a transparent sample. A portion of the source beam travels through the transparent sample to another surface. The blocker blocks scattered radiation originating at the other surface. Scattered radiation originating from the transparent sample is not redirected by the blocker and is focused by the focusing lens to a first focal plane. The focused scattered radiation passes through the aperture before irradiating the detector. The detector output an intensity measurement of the scattered radiation that irradiates the detector.

    摘要翻译: 光学检查器包括辐射源,时变光束反射器,远心扫描透镜,阻挡器,聚焦透镜,孔径和检测器。 辐射源用源光束照射时变光束反射器上的第一位置。 时变光束反射器将源光束引导到远心扫描透镜,然后再将源光束引导到透明样品。 源光束的一部分穿过透明样品到另一表面。 阻断剂阻止源于另一个表面的散射辐射。 来自透明样品的散射辐射不被阻断剂重新导向,并被聚焦透镜聚焦到第一焦平面。 聚焦的散射辐射在照射检测器之前穿过孔。 检测器输出照射检测器的散射辐射的强度测量值。

    Wafer Edge Inspection
    9.
    发明申请
    Wafer Edge Inspection 有权
    晶圆边缘检查

    公开(公告)号:US20090059236A1

    公开(公告)日:2009-03-05

    申请号:US11848234

    申请日:2007-08-30

    IPC分类号: G01N21/55 G02F1/29

    摘要: In one embodiment, a surface analyzer system comprises a radiation targeting assembly to target radiation onto an edge surface of a wafer, the radiation targeting assembly comprising a first expanded paraboloid or expanded ellipsoid reflector positioned adjacent the edge surface of the wafer, a reflected radiation collecting assembly that collects radiation reflected from the surface, a signal processing module to generate surface parameter data from the reflected radiation, and a defect detection module to analyze the surface parameter data to detect a defect on the surface.

    摘要翻译: 在一个实施例中,表面分析器系统包括辐射瞄准组件以将辐射瞄准晶片的边缘表​​面,所述辐射瞄准组件包括邻近所述晶片的边缘表​​面定位的第一扩展的抛物面或扩展的椭球反射器,反射的辐射收集 收集从表面反射的辐射的组件,用于从反射辐射产生表面参数数据的信号处理模块,以及用于分析表面参数数据以检测表面上的缺陷的缺陷检测模块。