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    Automatic developing device, roller washing method, photosensitive material processing device, and preparation method for processing liquid
    1.
    发明授权
    Automatic developing device, roller washing method, photosensitive material processing device, and preparation method for processing liquid 有权
    自动显影装置，滚筒洗涤方法，感光材料处理装置以及处理液体的制备方法

    公开(公告)号：US07083038B2

    公开(公告)日：2006-08-01

    申请号：US10978734

    申请日：2004-11-02

    申请人： Ryoei Nozawa ,  Shinichi Matsuda ,  Takayuki Iwamoto ,  So Konno

    发明人： Ryoei Nozawa ,  Shinichi Matsuda ,  Takayuki Iwamoto ,  So Konno

    IPC分类号： B65G45/22

    CPC分类号： G03D5/04

    摘要： A roller washing method for a photosensitive material processing device. The processing device processes a photosensitive material with a processing liquid while conveying the photosensitive material with a conveying roller. An idle roller is disposed in contact with a circumferential surface of the conveying roller. The circumferential surface of the conveying roller is washed by rotating the conveying roller while supplying washing water to an area where the conveying roller and the idle roller contact each other.

    摘要翻译： 用于感光材料处理装置的滚筒清洗方法。 处理装置在用输送辊输送感光材料的同时用处理液处理感光材料。 空转辊设置成与输送辊的圆周表面接触。 通过旋转输送辊，同时向输送辊和怠速辊彼此接触的区域提供洗涤水来洗涤输送辊的圆周表面。

    Photosensitive material processing device
    4.
    发明授权
    Photosensitive material processing device 有权

    公开(公告)号：US06554508B1

    公开(公告)日：2003-04-29

    申请号：US10177107

    申请日：2002-06-24

    申请人： Ryoei Nozawa ,  Toshihiro Suya ,  Hideto Yamamoto ,  Takayuki Iwamoto ,  Shinichi Matsuda

    发明人： Ryoei Nozawa ,  Toshihiro Suya ,  Hideto Yamamoto ,  Takayuki Iwamoto ,  Shinichi Matsuda

    IPC分类号： G03D308

    CPC分类号： G03D3/132

    摘要： In a shutter facing an aperture portion in a partition plate in a photosensitive material processing device, a blocking member, formed substantially in a semicircular cylindrical shape, is placed by the rotation of a shaft between blades thereby closing the aperture portion. The opening between the blades is opened by rotating the blocking member integrally with the shaft so that a photosensitive material can pass through. Multi-leveled surfaces are formed on the top surface of a guide plate. Aperture portions for mounting rollers with adaptors are formed in an alternating pattern on the surfaces. A plurality of protruding guide ribs are provided extending across the surfaces. A plurality of brush roller parameters are adjusted so that a winding mark index defined by the parameters falls within a predetermined range. Rollers are washed when a finisher control system is restarted after an unforeseen long stoppage.

    Photosensitive material processing device
    5.
    发明授权
    Photosensitive material processing device 有权
    感光材料加工装置

    公开(公告)号：US06435740B1

    公开(公告)日：2002-08-20

    申请号：US09708726

    申请日：2000-11-09

    申请人： Ryoei Nozawa ,  Toshihiro Suya ,  Hideto Yamamoto ,  Takayuki Iwamoto ,  Shinichi Matsuda

    发明人： Ryoei Nozawa ,  Toshihiro Suya ,  Hideto Yamamoto ,  Takayuki Iwamoto ,  Shinichi Matsuda

    IPC分类号： G03D308

    CPC分类号： G03D3/132

    摘要： In a shutter facing an aperture portion in a partition plate in a photosensitive material processing device, a blocking member, formed substantially in a semicircular cylindrical shape, is placed by the rotation of a shaft between blades thereby closing the aperture portion. The opening between the blades is opened by rotating the blocking member integrally with the shaft so that a photosensitive material can pass through. Multi-leveled surfaces are formed on the top surface of a guide plate. Aperture portions for mounting rollers with adaptors are formed in an alternating pattern on the surfaces. A plurality of protruding guide ribs are provided extending across the surfaces. A plurality of brush roller parameters are adjusted so that a winding mark index defined by the parameters falls within a predetermined range. Rollers are washed when a finisher control system is restarted after an unforeseen long stoppage.

    摘要翻译： 在面向感光材料处理装置的隔板中的开口部分的快门中，通过轴在叶片之间的旋转而放置基本上呈半圆柱形形状的阻挡构件，从而封闭开口部分。 通过使阻挡构件与轴一体地旋转，使得感光材料可以通过，从而打开叶片之间的开口。 在导板的顶面上形成多层平面。 用于安装具有适配器的辊的孔部分以表面上的交替图案形成。 提供了多个突出的引导肋，跨越表面延伸。 调整多个刷辊参数，使得由参数限定的卷绕标记索引落在预定范围内。 在不可预见的长时间停止后重新启动整理器控制系统时，滚筒将被清洗。

    Photosensitive material processing device
    9.
    发明授权
    Photosensitive material processing device 有权

    公开(公告)号：US06547460B2

    公开(公告)日：2003-04-15

    申请号：US10177151

    申请日：2002-06-24

    申请人： Ryoei Nozawa ,  Toshihiro Suya ,  Hideto Yamamoto ,  Takayuki Iwamoto ,  Shinichi Matsuda

    发明人： Ryoei Nozawa ,  Toshihiro Suya ,  Hideto Yamamoto ,  Takayuki Iwamoto ,  Shinichi Matsuda

    IPC分类号： G03D308

    CPC分类号： G03D3/132

    摘要： In a shutter facing an aperture portion in a partition plate in a photosensitive material processing device, a blocking member, formed substantially in a semicircular cylindrical shape, is placed by the rotation of a shaft between blades thereby closing the aperture portion. The opening between the blades is opened by rotating the blocking member integrally with the shaft so that a photosensitive material can pass through. Multi-leveled surfaces are formed on the top surface of a guide plate. Aperture portions for mounting rollers with adaptors are formed in an alternating pattern on the surfaces. A plurality of protruding guide ribs are provided extending across the surfaces. A plurality of brush roller parameters are adjusted so that a winding mark index defined by the parameters falls within a predetermined range. Rollers are washed when a finisher control system is restarted after an unforeseen long stoppage.

    Photosensitive material processing apparatus
    10.
    发明授权
    Photosensitive material processing apparatus 失效
    感光材料加工设备

    公开(公告)号：US06910815B2

    公开(公告)日：2005-06-28

    申请号：US10252364

    申请日：2002-09-24

    申请人： Ryoei Nozawa ,  Shinichi Matsuda ,  So Konno ,  Yasuhiro Endo ,  Hideaki Iijima

    发明人： Ryoei Nozawa ,  Shinichi Matsuda ,  So Konno ,  Yasuhiro Endo ,  Hideaki Iijima

    IPC分类号： G03D3/13 ,  G03D5/00

    CPC分类号： G03D3/132

    摘要： The present invention provides a photosensitive material processing apparatus in which a photosensitive material is processed with a processing solution. Reliable liquid displacement in the vicinity of the surface of a photosensitive material, and uniform temperature adjustment can be performed. Also, damage or a transport deficiency, caused by a corner of the material coming into a through hole when a conveyance path of the photosensitive material is formed can be prevented. When pre-washing processing is carried out prior to development processing using a developer, processing unevenness in which an overcoat layer partially remains can be prevented. An operation of mounting and removing conveyance rollers disposed in a pair is facilitated and a proper nipping force can be imparted between a conveyance roller pair. Mounting of a replenisher case filled with a replenisher is facilitated and a replenisher is kept from remaining in piping or in a replenisher case.

    摘要翻译： 本发明提供一种感光材料处理装置，其中用处理溶液处理感光材料。 可以在感光材料表面附近的可靠的液体位移和均匀的温度调节。 此外，可以防止当形成感光材料的输送路径时进入通孔的材料的角部引起的损坏或运输缺陷。 当在使用显影剂的显影处理之前进行预洗处理时，可以防止外涂层部分残留的处理不均匀。 安装和移除一对布置的输送辊的操作变得容易，并且可以在输送辊对之间施加适当的夹持力。 装有补充液的补充装置的安装方便，并且补充液不会残留在管道或补充液箱中。