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公开(公告)号：US08887893B2
公开(公告)日：2014-11-18
申请号：US13339426
申请日：2011-12-29
CPC分类号： B25J9/0093 , B23P21/004 , B25J9/0096 , Y10S901/16
摘要： A work system according to embodiments includes a robot and work stations. The robot performs a predetermined work on a workpiece as a work target. The work stations are places where the predetermined work is performed on the workpiece. The robot performs conveying of the workpiece between the work stations.
摘要翻译： 根据实施例的工作系统包括机器人和工作站。 机器人作为工作目标在工件上执行预定的工作。 工作站是在工件上执行预定工作的地方。 机器人在工作站之间执行工件的传送。
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公开(公告)号：US07382435B2
公开(公告)日：2008-06-03
申请号：US11395132
申请日：2006-04-03
申请人： Ryosuke Tsutsumi
发明人： Ryosuke Tsutsumi
IPC分类号： G03B27/42
CPC分类号： G03F9/7019 , G03F7/70516 , G03F7/70725 , G03F9/7011 , G03F9/7026 , G03F9/7034
摘要： An exposure apparatus which irradiates a photosensitive agent applied to a substrate to form a latent image pattern on the photosensitive agent. The exposure apparatus includes a substrate stage which drives the substrate, a focus measurement unit which obliquely irradiates the substrate with measurement light to measure the position of the substrate in the direction of the axis of the exposure beam on the basis of the light reflected by the substrate, and a controller which executes a calibration for correcting, on the basis of the measurement result obtained by the focus measurement unit, a track plane of the substrate stage with reference to the reference plane of the focus measurement unit so as to set the track plane parallel to the reference plane.
摘要翻译： 照射施加到基板上的感光剂以在感光剂上形成潜像图案的曝光装置。 曝光装置包括：驱动基板的基板台;焦点测量单元，其用测量光倾斜地照射基板，以基于由所述基板反射的光在所述曝光束的轴线方向上测量所述基板的位置 基板和控制器，其执行基于由所述焦点测量单元获得的测量结果基于所述焦点测量单元的参考平面校正所述基板台的轨迹平面的校准，以便设置所述轨迹 平面与参考平面平行。
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公开(公告)号：US20080291414A1
公开(公告)日：2008-11-27
申请号：US12121638
申请日：2008-05-15
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F9/7026
摘要： An exposure apparatus includes a stage configured to hold a substrate; a projection optical system configured to project light from an original onto the substrate; a measurement device configured to measure a position of a surface of the substrate in an optical axis direction of the projection optical system; and a controller configured to i) cause the measurement device to measure positions of the surface with respect to a plurality of points on the surface over a plurality of shot areas, ii) obtain a shape of the surface based on the positions of the surface measured with respect to the plurality of points, and iii) cause the stage to be moved based on the obtained shape between an exposure of a first shot area and an exposure of a second shot area, and the measurement device to measure a position of a surface in the second shot area.
摘要翻译： 曝光装置包括：被配置为保持基板的台; 投影光学系统，被配置为将来自原稿的光投射到所述基板上; 测量装置，被配置为测量所述基板的表面在所述投影光学系统的光轴方向上的位置; 以及控制器，被配置为i）使所述测量装置相对于多个拍摄区域上的所述表面上的多个点测量所述表面的位置，ii）基于所测量的表面的位置获得所述表面的形状 并且iii）使得基于所获得的第一拍摄区域的曝光和第二拍摄区域的曝光之间的形状来移动舞台，并且测量装置用于测量表面的位置 在第二拍摄区域。
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公开(公告)号：US09027315B2
公开(公告)日：2015-05-12
申请号：US13356650
申请日：2012-01-24
申请人： Ryosuke Tsutsumi , Kenichi Motonaga
发明人： Ryosuke Tsutsumi , Kenichi Motonaga
CPC分类号： B65B43/305 , B31B50/802 , B65B5/04 , B65B7/20 , B65B43/325 , B65B51/067
摘要： A packing device according to an embodiment includes a supply station, a right end effector, a left end effector, a right arm unit, a left arm unit, and a forming station. A cardboard box in a flat state is placed on the supply station. The cardboard box developed three-dimensionally is placed on the forming station. The right arm unit includes the right end effector provided with a suction unit. The left arm unit includes the left end effector provided with a suction unit. The packing device performs an operation of developing the cardboard box and an operation of moving the cardboard box to the forming station by using the right arm unit and the left arm unit while sucking both side surfaces of the cardboard box placed on the supply station by using the suction units.
摘要翻译： 根据实施例的包装装置包括供应站，右端执行器，左端执行器，右臂单元，左臂单元和成形站。 扁平状态的纸板箱放置在供应站上。 三维地开发的纸箱被放置在成型台上。 右臂单元包括具有抽吸单元的右端执行器。 左臂单元包括设置有抽吸单元的左端执行器。 包装装置通过使用右臂单元和左臂单元同时吸入放置在供应站上的纸板箱的两个侧表面，通过使用包装装置执行显影纸板箱的操作和将纸板箱移动到成形站的操作 抽吸单元。
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公开(公告)号：US07583356B2
公开(公告)日：2009-09-01
申请号：US12121638
申请日：2008-05-15
CPC分类号： G03B27/42 , G03F9/7026
摘要： An exposure apparatus includes a stage configured to hold a substrate; a projection optical system configured to project light from an original onto the substrate; a measurement device configured to measure a position of a surface of the substrate in an optical axis direction of the projection optical system; and a controller configured to i) cause the measurement device to measure positions of the surface with respect to a plurality of points on the surface over a plurality of shot areas, ii) obtain a shape of the surface based on the positions of the surface measured with respect to the plurality of points, and iii) cause the stage to be moved based on the obtained shape between an exposure of a first shot area and an exposure of a second shot area, and the measurement device to measure a position of a surface in the second shot area.
摘要翻译： 曝光装置包括：被配置为保持基板的台; 投影光学系统，被配置为将来自原稿的光投射到所述基板上; 测量装置，被配置为测量所述基板的表面在所述投影光学系统的光轴方向上的位置; 以及控制器，被配置为i）使所述测量装置相对于多个拍摄区域上的所述表面上的多个点测量所述表面的位置，ii）基于所测量的表面的位置获得所述表面的形状 并且iii）使得基于所获得的第一拍摄区域的曝光和第二拍摄区域的曝光之间的形状来移动舞台，并且测量装置用于测量表面的位置 在第二拍摄区域。
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公开(公告)号：US20060221318A1
公开(公告)日：2006-10-05
申请号：US11395132
申请日：2006-04-03
申请人： Ryosuke Tsutsumi
发明人： Ryosuke Tsutsumi
IPC分类号： G03B27/52
CPC分类号： G03F9/7019 , G03F7/70516 , G03F7/70725 , G03F9/7011 , G03F9/7026 , G03F9/7034
摘要： An exposure apparatus which irradiates, with an exposure beam through a projection optical system, a photosensitive agent applied to a substrate to form a latent image pattern on the photosensitive agent is disclosed. The exposure apparatus includes a substrate stage which drives the substrate, a focus measurement unit which obliquely irradiates the substrate with measurement light to measure the position of the substrate in the direction of the axis of the exposure beam on the basis of the light reflected by the substrate, and a controller which executes calibration for correcting, on the basis of the measurement result obtained by the focus measurement unit, the track plane of the substrate stage with reference to the reference plane of the focus measurement unit so as to set the reference plane parallel to the track plane. The substrate stage includes a reference plate and the controller controls, when measurement for correcting the track plane of the substrate stage is to be executed by the focus measurement unit, the position of the substrate stage so as to irradiate the reference plate with the measurement light.
摘要翻译： 公开了一种曝光装置，其通过投影光学系统将曝光光束照射到施加到基板上以在感光剂上形成潜像图案的感光剂。 曝光装置包括：驱动基板的基板台;焦点测量单元，其用测量光倾斜地照射基板，以基于由所述基板反射的光在所述曝光束的轴线方向上测量所述基板的位置 基板和执行校准的控制器，其基于由所述焦点测量单元获得的测量结果，参考所述焦点测量单元的参考平面来校正所述基板台的轨迹平面，以便设置所述基准平面 平行于轨道平面。 基板台包括参考板，并且当通过焦点测量单元执行用于校正基板台的轨道平面的测量时，控制器控制基板台的位置，以便用测量光照射参考板 。
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