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14 条记录 (耗时 0.049 秒)

    VAPORIZER
    2.
    发明公开
    VAPORIZER 审中-公开

    公开(公告)号：US20240175548A1

    公开(公告)日：2024-05-30

    申请号：US18518582

    申请日：2023-11-23

    申请人： Ryosuke YAMAMOTO ,  Toshihisa TANAKA ,  Taichi ODA

    发明人： Ryosuke YAMAMOTO ,  Toshihisa TANAKA ,  Taichi ODA

    IPC分类号： F17C9/02

    CPC分类号： F17C9/02 ,  F17C2221/012 ,  F17C2227/0316

    摘要： A vaporizer, through which a liquid heat medium and liquid hydrogen flow, causing the heat medium to vaporize the liquid hydrogen, includes: a spiral tube, spirally wound, in which liquid hydrogen flows; a casing being a hollow long member housing the spiral tube thereinside, the heat medium flowing on an outer surface of the spiral tube; and a spacer being a long member disposed inside a winding inner diameter of the spiral tube.

    MASTER RECORDING APPARATUS AND MASTER RECORDING METHOD
    3.
    发明申请
    MASTER RECORDING APPARATUS AND MASTER RECORDING METHOD 审中-公开
    主记录装置和主记录方法

    公开(公告)号：US20090196148A1

    公开(公告)日：2009-08-06

    申请号：US12362322

    申请日：2009-01-29

    申请人： Keiichiro YUSU ,  Masahiro SAITO ,  Kazuto KURODA ,  Takashi USUI ,  Kazuo WATABE ,  Chosaku NODA ,  Nobuaki KAJI ,  Masaaki MATSUMARU ,  Ryosuke YAMAMOTO

    发明人： Keiichiro YUSU ,  Masahiro SAITO ,  Kazuto KURODA ,  Takashi USUI ,  Kazuo WATABE ,  Chosaku NODA ,  Nobuaki KAJI ,  Masaaki MATSUMARU ,  Ryosuke YAMAMOTO

    IPC分类号： G11B7/135

    CPC分类号： G11B7/261

    摘要： According to one embodiment, the invention provides a master recording apparatus and method which can form a pit having a symmetrical pit shape with excellent reproducibility. An embodiment of the invention is a master recording apparatus where a resist film on a master for an optical disk is irradiated with irradiation light from a semiconductor laser to record information on the resist film, where the resist film is formed as an inorganic resist film, and means for outputting the irradiation light from the semiconductor laser as a short pulse laser with a pulse width between 200 ps and 1 ns is provided.

    摘要翻译： 根据一个实施例，本发明提供一种主记录装置和方法，该主记录装置和方法可以形成具有良好重复性的对称凹坑形状的凹坑。 本发明的一个实施例是一种主记录装置，其中用于光盘的主机上的抗蚀剂膜用来自半导体激光器的照射光照射以将抗蚀剂膜上的信息记录在抗蚀剂膜上，其中形成抗蚀剂膜作为无机抗蚀剂膜， 并且提供用于输出来自半导体激光器的照射光作为脉冲宽度在200ps和1ns之间的短脉冲激光器的装置。

    PATTERN FORMING METHOD
    7.
    发明申请
    PATTERN FORMING METHOD 有权
    图案形成方法

    公开(公告)号：US20120228262A1

    公开(公告)日：2012-09-13

    申请号：US13426166

    申请日：2012-03-21

    申请人： Hiroki TANAKA ,  Ryosuke YAMAMOTO ,  Naoko KIHARA

    发明人： Hiroki TANAKA ,  Ryosuke YAMAMOTO ,  Naoko KIHARA

    IPC分类号： B05D5/00 ,  B05D5/02

    CPC分类号： H01L21/3086 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  G11B5/743 ,  G11B5/82 ,  G11B5/855 ,  H01L21/0271 ,  H01L21/30604 ,  H01L21/3081

    摘要： A pattern forming method includes forming a coating film containing a hydrophilic first homopolymer having a first bonding group and a hydrophobic second homopolymer having a second bonding group capable of bonding with the first bonding group, forming a bond between the first and second bonding group to produce a block copolymer of the first and second homopolymners, and heating the coating film to microphase-separating the copolymer into a hydrophilic domain and a hydrophobic domain. The hydrophilic and hydrophobic domains are arranged alternately. The bond is broken, then selectively dissolving-removing either domain by a solvent to provide a polymer pattern of a remainder domain.

    摘要翻译： 图案形成方法包括形成含有具有第一接合基团的亲水性第一均聚物和具有能够与第一接合基团键合的第二接合基团的疏水性第二均聚物的涂膜，在第一和第二接合基团之间形成键，以产生 第一和第二均聚物的嵌段共聚物，并加热涂膜以将共聚物微相分离成亲水结构域和疏水结构域。 亲水和疏水畴交替排列。 该键断裂，然后通过溶剂选择性溶解除去任一结构域，以提供余下结构域的聚合物图案。

    PATTERN FORMING METHOD
    9.
    发明申请
    PATTERN FORMING METHOD 有权
    图案形成方法

    公开(公告)号：US20150079794A1

    公开(公告)日：2015-03-19

    申请号：US14550637

    申请日：2014-11-21

    申请人： Hiroki TANAKA ,  Ryosuke YAMAMOTO ,  Naoko KIHARA

    发明人： Hiroki TANAKA ,  Ryosuke YAMAMOTO ,  Naoko KIHARA

    IPC分类号： H01L21/308 ,  H01L21/306 ,  H01L21/027

    CPC分类号： H01L21/3086 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  G11B5/743 ,  G11B5/82 ,  G11B5/855 ,  H01L21/0271 ,  H01L21/30604 ,  H01L21/3081

    摘要： A pattern forming method includes forming a coating film containing a hydrophilic first homopolymer having a first bonding group and a hydrophobic second homopolymer having a second bonding group capable of bonding with the first bonding group, forming a bond between the first and second bonding group to produce a block copolymer of the first and second homopolymners, and heating the coating film to microphase-separating the copolymer into a hydrophilic domain and a hydrophobic domain. The hydrophilic and hydrophobic domains are arranged alternately. The bond is broken, then selectively dissolving-removing either domain by a solvent to provide a polymer pattern of a remainder domain.

    摘要翻译： 图案形成方法包括形成含有具有第一接合基团的亲水性第一均聚物和具有能够与第一接合基团键合的第二接合基团的疏水性第二均聚物的涂膜，在第一和第二接合基团之间形成键，以产生 第一和第二均聚物的嵌段共聚物，并加热涂膜以将共聚物微相分离成亲水结构域和疏水结构域。 亲水和疏水畴交替排列。 该键断裂，然后通过溶剂选择性溶解除去任一结构域，以提供余下结构域的聚合物图案。