公开(公告)号：US08517518B2

公开(公告)日：2013-08-27

申请号：US13287402

申请日：2011-11-02

申请人： Ryota Kashu ,  Naoto Sasagawa ,  Seiichiro Karita ,  Takatsuna Aoki ,  Shingo Okushima ,  Eisuke Nishitani

发明人： Ryota Kashu ,  Naoto Sasagawa ,  Seiichiro Karita ,  Takatsuna Aoki ,  Shingo Okushima ,  Eisuke Nishitani

IPC分类号： B41J2/05 ,  B41J2/18

CPC分类号： B41J2/18 ,  B41J2/1404 ,  B41J2/14233 ,  B41J2/1433 ,  B41J2/145 ,  B41J2202/12

摘要： A recording apparatus including an ink tank and a recording head having a flow path forming portion that has an ejection orifice plate having plural ink ejection orifices and a liquid chamber provided for each orifice to supply ink to the orifices, and an energy generating element for ejecting ink in the chamber. A surface layer of the flow path forming portion opposes to the outside of the plate. An opening is provided opposing to the orifices in the surface layer. An ink reservoir is provided between the plate and the opening. A circulation flow path communicating with the ink reservoir is provided. The area of the opening is larger than that of the orifice. Both ends of the circulation flow path are respectively connected to inlet and outlet portions connected to the circulation flow path. The inlet and outlet portions and liquid chamber are connected to the ink tank.

公开(公告)号：US20120113197A1

公开(公告)日：2012-05-10

申请号：US13287402

申请日：2011-11-02

申请人： Ryota Kashu ,  Naoto Sasagawa ,  Seiichiro Karita ,  Takatsuna Aoki ,  Shingo Okushima ,  Eisuke Nishitani

发明人： Ryota Kashu ,  Naoto Sasagawa ,  Seiichiro Karita ,  Takatsuna Aoki ,  Shingo Okushima ,  Eisuke Nishitani

IPC分类号： B41J2/18

CPC分类号： B41J2/18 ,  B41J2/1404 ,  B41J2/14233 ,  B41J2/1433 ,  B41J2/145 ,  B41J2202/12

摘要： A recording apparatus including an ink tank and a recording head having a flow path forming portion that has an ejection orifice plate having plural ink ejection orifices and a liquid chamber provided for each orifice to supply ink to the orifices, and an energy generating element for ejecting ink in the chamber. A surface layer of the flow path forming portion opposes to the outside of the plate. An opening is provided opposing to the orifices in the surface layer. An ink reservoir is provided between the plate and the opening. A circulation flow path communicating with the ink reservoir is provided. The area of the opening is larger than that of the orifice. Both ends of the circulation flow path are respectively connected to inlet and outlet portions connected to the circulation flow path. The inlet and outlet portions and liquid chamber are connected to the ink tank.

摘要翻译： 一种记录装置，包括墨盒和具有流路形成部分的记录头，该流路形成部具有具有多个墨喷射口的喷射孔板和为每个喷孔设置的用于向喷嘴供应墨水的液体室，以及用于喷射的能量产生元件 墨水在室内。 流路形成部的表面层与板的外侧相反。 提供与表面层中的孔相对的开口。 在所述板和所述开口之间设置有墨水储存器。 提供与墨水容器连通的循环流路。 开口面积大于孔口面积。 循环流路的两端分别与连接于循环流路的入口部和出口部连接。 入口和出口部分和液体室连接到墨水罐。

公开(公告)号：US09039402B2

公开(公告)日：2015-05-26

申请号：US12566513

申请日：2009-09-24

申请人： Eigo Kawakami ,  Shingo Okushima ,  Hideki Ina ,  Junichi Seki ,  Atsunori Terasaki ,  Motoki Okinaka

发明人： Eigo Kawakami ,  Shingo Okushima ,  Hideki Ina ,  Junichi Seki ,  Atsunori Terasaki ,  Motoki Okinaka

IPC分类号： B29C43/02 ,  B29C43/00 ,  B29C43/14 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B29C59/02 ,  B29C43/58

CPC分类号： B29C43/021 ,  B29C43/003 ,  B29C43/14 ,  B29C43/58 ,  B29C2043/025 ,  B29C2043/142 ,  B29C2043/5833 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： There is provided an imprinting apparatus that transfers a pattern of a mold to a resin on a substrate, the imprinting apparatus including a deposition mechanism configured to deposit the resin onto the substrate; a first driving mechanism configured to change a relative position, on a plane parallel to the surface of the substrate, of the substrate and the mold; a second driving mechanism configured to change the relative position, on a plane parallel to the surface of the substrate, of the substrate and the deposition mechanism; and a control unit configured to control the deposition mechanism and the driving mechanism so as to perform a resin deposition process of depositing the resin onto the substrate and an imprint process of transferring the pattern of the mold to the resin on the substrate in parallel.

摘要翻译： 提供了一种压印装置，其将模具的图案转移到基板上的树脂，所述压印装置包括沉积机构，所述沉积机构被配置为将所述树脂沉积到所述基板上; 第一驱动机构，其构造成在基板的表面平行的平面上改变基板和模具的相对位置; 第二驱动机构，被配置为在与基板的表面平行的平面上改变基板和沉积机构的相对位置; 以及控制单元，被配置为控制沉积机构和驱动机构，以便执行将树脂沉积到基板上的树脂沉积工艺和将模具图案平行地转移到基板上的树脂的压印工艺。

公开(公告)号：US08404169B2

公开(公告)日：2013-03-26

申请号：US12566572

申请日：2009-09-24

申请人： Eigo Kawakami ,  Hideki Ina ,  Junichi Seki ,  Atsunori Terasaki ,  Shingo Okushima ,  Motoki Okinaka

发明人： Eigo Kawakami ,  Hideki Ina ,  Junichi Seki ,  Atsunori Terasaki ,  Shingo Okushima ,  Motoki Okinaka

IPC分类号： B29B11/08 ,  B29C45/76

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

摘要： An imprint apparatus for pressing resin and a mold to each other in a Z-axis direction to form a resin pattern on a shot region includes: a mold chuck; an X-Y stage; a reference mark formed on the stage; a first scope configured to measure a positional deviation in an x-y plane between a mold mark and the reference mark; a second scope configured to measure a position of a substrate mark in the plane not via the mold mark; and a dispenser configured to dispense resin. In the plane, the dispenser center is deviated in position from the mold chuck center by a first distance in a first direction, and the second scope center is deviated in position from the dispenser center by a distance smaller than twice the first distance in the first direction or a second direction opposite thereto.

摘要翻译： 在Z轴方向上按压树脂和模具以在射出区域形成树脂图案的压印装置包括：模具卡盘; X-Y舞台; 在舞台上形成参考标记; 第一范围，被配置为测量模具标记和参考标记之间的x-y平面中的位置偏差; 第二范围，被配置为不经由模具标记来测量所述平面中的基板标记的位置; 以及配置成分配树脂的分配器。 在平面中，分配器中心从第一方向偏离模具卡盘中心第一距离，并且第二范围中心从分配器中心偏离距离小于第一距离的距离的距离 方向或与其相反的第二方向。

公开(公告)号：US07985061B2

公开(公告)日：2011-07-26

申请号：US12726375

申请日：2010-03-18

申请人： Nobuhito Suehira ,  Junichi Seki ,  Shingo Okushima

发明人： Nobuhito Suehira ,  Junichi Seki ,  Shingo Okushima

IPC分类号： B29C43/02

CPC分类号： B29C43/021 ,  B29C33/424 ,  B29C43/003 ,  B29C43/04 ,  B29C43/14 ,  B29C2043/025 ,  B29C2043/142 ,  B29C2043/3634 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint apparatus in which a mold having a processing surface on which a predetermined imprint is formed is provided and an uncured resin material placed on a substrate is filled and cured in a space between the mold and the substrate and is subjected to imprint of the predetermined imprint formed on the processing surface of the mold. The imprint apparatus includes an attitude control mechanism for controlling attitudes of the mold and the substrate so that a first gap between a first end of the mold and the substrate and a second gap between a second end of the mold and the substrate are different from each other, and a measuring mechanism for measuring attitudes and positions of the mold and the substrate. Also provided is a mechanism for imparting a relative movement between the substrate and the mold so that the resin material approaches the first end of the mold and enters through the first gap and fills at least a part of the space between the mold and the substrate.

摘要翻译： 一种压印装置，其中具有形成有预定印记的处理表面的模具，并且将放置在基板上的未固化树脂材料填充并固化在模具和基板之间的空间中，并且经受预定的 形成在模具的加工表面上的印痕。 压印装置包括用于控制模具和基板的态度的姿态控制机构，使得模具的第一端和基板之间的第一间隙和模具的第二端与基板之间的第二间隙各自不同 以及用于测量模具和基板的姿态和位置的测量机构。 还提供了一种用于在基材和模具之间进行相对运动的机构，使得树脂材料接近模具的第一端并通过第一间隙进入并填充模具和基材之间的空间的至少一部分。

公开(公告)号：US20090273124A1

公开(公告)日：2009-11-05

申请号：US12405847

申请日：2009-03-17

申请人： Motoki Okinaka ,  Junichi Seki ,  Atsunori Terasaki ,  Shingo Okushima

发明人： Motoki Okinaka ,  Junichi Seki ,  Atsunori Terasaki ,  Shingo Okushima

IPC分类号： B29C35/08 ,  B29C59/02

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A nanoimprinting method includes: forming at a region for performing a first nanoimprinting process on a substrate, a first patterning region with a first affinity to resin; forming at a region for performing a second nanoimprinting process on the substrate, a second patterning region with a second affinity to resin, the second affinity being lower than the first affinity; applying the resin to the first patterning region and transferring a pattern of a mold to the resin by the first nanoimprinting process; and modifying the second patterning region to a region with affinity to resin that is higher than the second affinity, then applying the resin to the modified region, and performing the second nanoimprinting process to process the second patterning region thereby connecting patterns formed at the first patterning region and the second patterning region to each other.

摘要翻译： 纳米压印方法包括：在用于在衬底上进行第一纳米压印过程的区域上形成第一图案化区域，其对树脂具有第一亲和力; 在用于在所述基板上进行第二纳米压印处理的区域上形成第二图案化区域，所述第二图案形成区域对树脂具有第二亲和力，所述第二亲和力低于所述第一亲和力; 将所述树脂施加到所述第一图案形成区域并通过所述第一纳米压印工艺将模具的图案转移到所述树脂; 并且将所述第二图案形成区域修饰为与所述第二亲和力高于树脂的区域，然后将所述树脂施加到所述改性区域，并进行所述第二纳米压印处理以处理所述第二图案化区域，从而将形成在所述第一图案形成 区域和第二图案形成区域彼此。

公开(公告)号：US08361336B2

公开(公告)日：2013-01-29

申请号：US12282454

申请日：2008-08-01

申请人： Shingo Okushima ,  Junichi Seki ,  Haruhito Ono ,  Nao Nakatsuji ,  Atsunori Terasaki

发明人： Shingo Okushima ,  Junichi Seki ,  Haruhito Ono ,  Nao Nakatsuji ,  Atsunori Terasaki

IPC分类号： B44C1/22

CPC分类号： G03F7/0002 ,  B29C33/424 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprint method for imprinting a pattern of a mold onto a resin material on a substrate. The imprint method includes a step of forming a processed area in which an imprint pattern corresponding to the pattern of the mold is formed, and an outside area formed of a periphery of the processed area, by bringing the mold into contact with the resin material formed on the substrate, so that a portion of the resin material is extruded from the processed area into the outside area, a step of forming a protection layer for protecting the processed area, and a step of removing a layer of the resin material in the outside area, while the imprint pattern formed on a layer of the resin material in the processed area, is protected by the protection layer, so as not to be removed.

摘要翻译： 用于将模具图案压印在基板上的树脂材料上的压印方法。 压印方法包括通过使模具与形成的树脂材料接触来形成其中形成与模具的图案相对应的压印图案的处理区域和由处理区域的周边形成的外部区域的步骤 在基板上，使得一部分树脂材料从处理区域挤出到外部区域中，形成用于保护加工区域的保护层的步骤，以及在外部去除树脂材料层的步骤 区域，而在处理区域中形成在树脂材料层上的印模图案被保护层保护，以便不被去除。

公开(公告)号：US08178026B2

公开(公告)日：2012-05-15

申请号：US12405847

申请日：2009-03-17

申请人： Motoki Okinaka ,  Junichi Seki ,  Atsunori Terasaki ,  Shingo Okushima

发明人： Motoki Okinaka ,  Junichi Seki ,  Atsunori Terasaki ,  Shingo Okushima

IPC分类号： B29C35/08 ,  B29C59/02

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A nanoimprinting method includes: forming at a region for performing a first nanoimprinting process on a substrate, a first patterning region with a first affinity to resin; forming at a region for performing a second nanoimprinting process on the substrate, a second patterning region with a second affinity to resin, the second affinity being lower than the first affinity; applying the resin to the first patterning region and transferring a pattern of a mold to the resin by the first nanoimprinting process; and modifying the second patterning region to a region with affinity to resin that is higher than the second affinity, then applying the resin to the modified region, and performing the second nanoimprinting process to process the second patterning region thereby connecting patterns formed at the first patterning region and the second patterning region to each other.

摘要翻译： 纳米压印方法包括：在用于在衬底上进行第一纳米压印过程的区域上形成第一图案化区域，其对树脂具有第一亲和力; 在用于在所述基板上进行第二纳米压印处理的区域上形成第二图案化区域，所述第二图案形成区域对树脂具有第二亲和力，所述第二亲和力低于所述第一亲和力; 将所述树脂施加到所述第一图案形成区域并通过所述第一纳米压印工艺将模具的图案转移到所述树脂; 并且将所述第二图案形成区域修饰为与所述第二亲和力高于树脂的区域，然后将所述树脂施加到所述改性区域，并进行所述第二纳米压印处理以处理所述第二图案化区域，从而将形成在所述第一图案形成 区域和第二图案形成区域彼此。

公开(公告)号：US07981304B2

公开(公告)日：2011-07-19

申请号：US12388179

申请日：2009-02-18

申请人： Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina ,  Shingo Okushima

发明人： Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina ,  Shingo Okushima

IPC分类号： C03C15/00

CPC分类号： B29C59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F9/7042

摘要： A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmissivities to light in a part of an ultraviolet wavelength range. The second material has a refractive index of not less than 1.7.

摘要翻译： 该模具能够在将待固化的树脂材料设置在模具和待加工构件之间的状态下与要处理的构件高度准确地对准，并且由第一材料和对准构成的基板2010构成 标记2102由与第一材料不同的第二材料形成。 第一材料和第二材料在紫外线波长范围的一部分中具有透光性。 第二种材料的折射率不小于1.7。

公开(公告)号：US07510388B2

公开(公告)日：2009-03-31

申请号：US11468876

申请日：2006-08-31

申请人： Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina ,  Shingo Okushima

发明人： Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina ,  Shingo Okushima

IPC分类号： B29C59/00

CPC分类号： B29C59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F9/7042

摘要： A mold capable of effecting alignment of the mold and the member to be processed with high accuracy even in such a state that a photocurable resin material is disposed between the mold and the member to be processed is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmittivities to light in a part of an ultraviolet wavelength range of the ultraviolet light. The second material has a refractive index of not less than 1.7.

摘要翻译： 即使在光固化树脂材料配置在模具和待加工构件之间的状态下，能够高精度地进行模具和被处理部件的对准的模具由基板2010构成，基板2010由第一材料 以及由不同于第一材料的第二材料形成的对准标记2102。 第一材料和第二材料在紫外线的紫外线波长范围的一部分中具有透光性。 第二种材料的折射率不小于1.7。