SUBSTRATE AND MANUFACTURING METHOD FOR THE SAME

    公开(公告)号:US20240170330A1

    公开(公告)日:2024-05-23

    申请号:US18206885

    申请日:2023-06-07

    IPC分类号: H01L21/768 H01L23/528

    CPC分类号: H01L21/76894 H01L23/5283

    摘要: A substrate including: an insulation layer; a conductive layer disposed on the insulation layer; and a via hole configured to include a lower hole disposed in a first portion of the insulation layer and an upper hole disposed in a second portion of the insulating layer and connected to the lower hole, wherein a width of the upper hole is greater than that of the lower hole, at least a portion of the upper hole of the insulation layer has a width that is substantially equal to that of the upper hole of the conductive layer, and a first angle formed between a first direction that is parallel to a lower surface of the insulating layer and a sidewall of the lower hole and a second angle formed between the first direction and a sidewall of the upper hole are different from each other.