Abstract:
A semiconductor device is provided. The semiconductor device includes a drain region and a source region spaced apart from each other, a semiconductor pattern disposed between the drain region and the source region and comprising a first region and a second region, wherein a thickness of the first region is larger than a thickness of the second region, and the first region is disposed between the drain region and the second region, and a gate electrode intersecting the semiconductor pattern.
Abstract:
A method for operating a memory device includes sensing a temperature of the resistive memory device, setting a level of a set voltage or current for writing to a memory cell based on the temperature, setting a level of a reset voltage for reset writing to the memory cell based on the temperature, and performing a write operation on the memory cell based on the level of the set voltage or current and the level of the reset voltage. The memory device may be a resistive memory device.
Abstract:
A method for operating a memory device includes sensing a change in temperature of the memory device, adjusting a level of a reference current for a read operation, and reading data from memory cells of the memory device based on the adjusted level of the reference current. The level of the reference current is adjusted from a reference value to a first value when the temperature of the memory device increases and is adjusted from the reference value to a second value when the temperature of the memory device decreases. A difference between the reference value and the first value is different from a difference the reference value and the second value.