公开(公告)号：US12064739B2

公开(公告)日：2024-08-20

申请号：US17867693

申请日：2022-07-19

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Hajime Nishide ,  Takashi Izuta ,  Takatoshi Hayashi ,  Katsuhiro Fukui ,  Koichi Okamoto ,  Kazuhiro Fujita ,  Atsuyasu Miura ,  Kenji Kobayashi ,  Sei Negoro ,  Hiroki Tsujikawa

IPC: B01F15/04 ,  B01F3/04 ,  B01F15/00 ,  B01F23/231 ,  B01F23/237 ,  B01F35/21 ,  B01F35/22 ,  B01F35/82 ,  G05D11/00 ,  G05D21/02 ,  H01L21/306 ,  H01L21/3213 ,  H01L21/67 ,  B01F101/58

CPC classification number: B01F35/82 ,  B01F23/231 ,  B01F23/237611 ,  B01F23/237612 ,  B01F23/23765 ,  B01F35/2132 ,  B01F35/2202 ,  G05D11/00 ,  G05D21/02 ,  H01L21/30608 ,  H01L21/32134 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67075 ,  H01L21/6708 ,  B01F2101/58

Abstract: A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.

公开(公告)号：US11439967B2

公开(公告)日：2022-09-13

申请号：US16114253

申请日：2018-08-28

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Hajime Nishide ,  Takashi Izuta ,  Takatoshi Hayashi ,  Katsuhiro Fukui ,  Koichi Okamoto ,  Kazuhiro Fujita ,  Atsuyasu Miura ,  Kenji Kobayashi ,  Sei Negoro ,  Hiroki Tsujikawa

IPC: B01F15/04 ,  H01L21/67 ,  B01F3/04 ,  B01F15/00 ,  G05D21/02 ,  B01F35/82 ,  H01L21/306 ,  G05D11/00 ,  H01L21/3213 ,  B01F23/231 ,  B01F35/21 ,  B01F35/22 ,  B01F23/237 ,  B01F101/58

Abstract: A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.