APPARATUS AND METHOD FOR TREATING SUBSTRATE

    公开(公告)号:US20210013064A1

    公开(公告)日:2021-01-14

    申请号:US16925449

    申请日:2020-07-10

    申请人: SEMES CO., LTD.

    IPC分类号: H01L21/67 H01L21/02 B08B7/00

    摘要: An apparatus for treating a substrate includes a light treatment chamber having an interior space, a support unit that supports the substrate in the interior space, and an irradiation unit that irradiates light to the substrate in the interior space to remove organic matter remaining on the substrate, in which the irradiation unit includes a first light source that irradiates first light to the substrate and a second light source that irradiates, to the substrate, second light having a different wavelength range from the first light.