ARTICLE STORAGE EQUIPMENT IN SEMICONDUCTOR FABRICATION FACILITY AND LOGISTICS SYSTEM INCLUDING SAME

    公开(公告)号:US20230197494A1

    公开(公告)日:2023-06-22

    申请号:US18083635

    申请日:2022-12-19

    Inventor: Sung Ho LEE

    Abstract: Proposed are article storage equipment in a semiconductor fabrication facility, the article storage equipment being capable of power supply with a more simplified configuration, and a logistics system of a semiconductor fabrication facility including the same. Article storage equipment in a semiconductor fabrication facility according to one aspect includes a storage unit installed around a rail that provides a travel route of a transport vehicle and configured to store a transport container in which a wafer is accommodated, a purge unit configured to supply an inert gas into the transport container, a control unit configured to identify the transport container stored in the storage unit and control the purge unit to supply the inert gas into the transport container, and a power supply unit configured to supply a current induced from a power supply cable installed along the rail to the control unit.

    TRANSPORT VEHICLE CLEANING DEVICE AND ARTICLE TRANSPORT EQUIPMENT INCLUDING THE SAME

    公开(公告)号:US20230178402A1

    公开(公告)日:2023-06-08

    申请号:US17990726

    申请日:2022-11-20

    CPC classification number: H01L21/67733 B08B5/023 H01L21/67051

    Abstract: A transport vehicle cleaning device that cleans a transport vehicle incudes a housing including a cleaning space accommodating the transport vehicle for cleaning, a plurality of fans disposed at an upper part of the housing and generating a downward airflow in the cleaning space, a cleaning gas injector disposed at a ceiling of the housing and injecting a cleaning gas towards the transport vehicle in the cleaning space of the housing, an exhaust unit provided at a lower part of the housing and exhausting the cleaning gas supplied to the cleaning space and a foreign matter removed from the transport vehicle from the cleaning space, and a frame cover disposed in the housing and configured to completely cover opposite openings of the frame in the housing to form a closed internal space of the frame separated from the cleaning space.

    SUBSTRATE TREATMENT APPARATUS AND METHOD

    公开(公告)号:US20230071392A1

    公开(公告)日:2023-03-09

    申请号:US17738010

    申请日:2022-05-06

    Abstract: Provided is a substrate treatment apparatus with improved workability. The substrate treatment apparatus includes: a first bath storing a cleaning solution and having a first opening formed in an upper surface thereof; and a first ultrasonic oscillator installed in the first bath and providing ultrasonic waves toward a surface of the cleaning solution exposed by the first opening to form a water film protruding from the surface of the cleaning solution, wherein a substrate is not immersed in the first bath, and a surface of the substrate is placed adjacent to the first opening and cleaned by the water film.

    CROSS RAIL STRUCTURE FOR OHT SYSTEM AND OHT SYSTEM USING THE SAME

    公开(公告)号:US20230192158A1

    公开(公告)日:2023-06-22

    申请号:US18085167

    申请日:2022-12-20

    Inventor: Sung Ho LEE

    CPC classification number: B61J1/06 B66C17/12

    Abstract: The present invention relates to a cross rail structure for an OHT system and an OHT system using the same.
    According to the present invention, there is provided a cross rail structure for an OHT system, that is a point at which two orthogonal rails among rails that are installed in an OHT system and transport vehicles intersect with each other. The cross rail structure includes a pair of auxiliary rails that are installed at substantially the same height as the rail at the point at which the rails intersect with each other, and disposed parallel to each other at a predetermined distance; a movement unit that moves the auxiliary rails up and down; a rotation unit that rotates the auxiliary rail so that the auxiliary rails are disposed in any one of two directions orthogonal to each other; and a distance holding unit that holds a distance between the pair of auxiliary rails without an interference with the vehicle.

    ARTICLE TRANSFER APPARATUS AND ARTICLE TRANSFER METHOD

    公开(公告)号:US20240199340A1

    公开(公告)日:2024-06-20

    申请号:US18529723

    申请日:2023-12-05

    CPC classification number: B65G17/062 B65G21/02 B65G41/007 B65G21/22

    Abstract: Embodiments of the inventive concept provide an article transfer apparatus and an article transfer method which can temporarily load a container, and which can vary its size according to necessity, so an interference with surrounding structures do not occur while varying the size. The inventive concept provides an article transfer apparatus at which an OHT transfers a container. The article transfer apparatus includes: a top support unit fixed to a top space within a semiconductor fab; a bottom support unit positioned spaced apart below the top support unit and on which the container is mounted; a link unit coupled between the top support unit and the bottom support unit and which can be folded; a folding driving unit connecting the top support unit and the link unit, and configured so when not driven a space that the container can be mounted on is formed by the link unit being spread, and when driven the bottom support unit closely contacts the top support unit by folding the link unit, and wherein the folding driving unit is positioned to not go beyond a top portion of the support unit.

    FLOW SUPPLY APPARATUS AND SUPPLY METHOD
    7.
    发明公开

    公开(公告)号:US20230207361A1

    公开(公告)日:2023-06-29

    申请号:US18083179

    申请日:2022-12-16

    CPC classification number: H01L21/67393 H01L21/67775 H01L21/67769

    Abstract: Provided are a flow supply apparatus and supply method. The flow supply apparatus, comprising: a rail; a transport unit disposed on the rail, where an object is loaded; and a gas treatment unit provided on the transport unit and configured to purge the object. The object includes a FOUP with a substrate accommodated therein, and fume is removed from the substrate through the purging.

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