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14 条记录 (耗时 0.013 秒)

    SUPERCRITICAL FLUID PROCESSING DEVICE
    1.
    发明申请
    SUPERCRITICAL FLUID PROCESSING DEVICE 有权
    超临界流体加工装置

    公开(公告)号：US20150330954A1

    公开(公告)日：2015-11-19

    申请号：US14647333

    申请日：2012-11-28

    申请人： SHIMADZU CORPORATION

    发明人： Hiroomi Goto ,  Tsunehiro Inoue ,  Takahiro Mori ,  Hirohisa Abe

    IPC分类号： G01N30/36 ,  G05D16/20

    CPC分类号： G01N30/36 ,  B01D15/40 ,  F16K31/004 ,  G01N30/32 ,  G05D7/0641 ,  G05D16/202

    摘要： A supercritical fluid chromatograph includes a supercritical flow path, a mobile phase supply section for supplying a mobile phase containing liquid carbon dioxide, a sample introduction section, a sample separation section, a detector, and a pressure control valve. A valve post-stage flow path is connected to a fluid outlet of the pressure control valve, and the inside of the valve post-stage flow path is maintained by pressure maintaining means at a pressure by which a mobile phase from the fluid outlet of the pressure control valve is not vaporized.

    摘要翻译： 超临界流体色谱仪包括超临界流路，用于供给含有液体二氧化碳的流动相的流动相供给部，样品引入部，样品分离部，检测器和压力控制阀。 阀后段流动路径连接到压力控制阀的流体出口，并且阀后段流动路径的内部由压力保持装置保持在压力下，来自流体出口的流动相 压力控制阀不蒸发。

    Feedback control apparatus
    4.
    发明授权
    Feedback control apparatus 有权

    公开(公告)号：US10184919B2

    公开(公告)日：2019-01-22

    申请号：US15118517

    申请日：2014-12-11

    申请人： SHIMADZU CORPORATION

    发明人： Hiroomi Goto ,  Tsunehiro Inoue ,  Takahiro Mori

    IPC分类号： G01N30/32 ,  G05D16/20 ,  G05B19/46 ,  G05B11/42 ,  B01D15/40

    摘要： A feedback control apparatus includes: a detector configured to detect an output value based on a controlled object; a P control circuit including a differential amplifier circuit and an analog circuit, the differential amplifier circuit being configured to receive a detection value of the detector and a target value, the analog circuit being configured to output a P control component VP to an output of the differential amplifier circuit; an I control unit configured to output an I control component VI by integrating a deviation of the detection value from the target value by digital processing; and a driver element configured to be driven based on the P control component VP from the P control circuit and the I control component VI from the I control unit to control the controlled object.

    GAS-LIQUID SEPARATOR AND SUPER-CRITICAL FLUID DEVICE
    5.
    发明申请
    GAS-LIQUID SEPARATOR AND SUPER-CRITICAL FLUID DEVICE 审中-公开

    公开(公告)号：US20200057034A1

    公开(公告)日：2020-02-20

    申请号：US16665209

    申请日：2019-10-28

    申请人： SHIMADZU CORPORATION

    发明人： Hiroomi Goto ,  Risa Kajiyama ,  Takahiro Mori

    IPC分类号： G01N30/80 ,  G01N1/40 ,  B01D19/00 ,  G01N30/02

    摘要： A gas-liquid separator according to an embodiment of the present invention separates a mobile phase containing a gas and a liquid into a gas and a liquid. The gas-liquid separator according to the embodiment of the present invention includes an introduction flow channel to which a mobile phase is introduced, and a plurality of discharge flow channels connected to the introduction flow channel. A gas and a liquid are discharged from a discharge port of the discharge flow channel.

    Surface processing progress monitoring system
    6.
    发明授权
    Surface processing progress monitoring system 有权
    表面处理进度监测系统

    公开(公告)号：US09460973B2

    公开(公告)日：2016-10-04

    申请号：US14250100

    申请日：2014-04-10

    申请人： SHIMADZU CORPORATION

    发明人： Rui Kato ,  Yuzo Nagumo ,  Hiroomi Goto

    IPC分类号： G01B11/06 ,  H01L21/66 ,  H01J37/32

    CPC分类号： H01L22/12 ,  G01B11/0633 ,  H01J37/32972

    摘要： A system including an index assigning section estimating the thickness of a thin film based on the intensity of light reflected on a substrate and a theoretical formula expressing a relationship between the thickness of the thin film and the intensity of an interference light when the spectrum is obtained for the first time, and assigning indexes for each candidate value for the layer thickness; a layer thickness wide-range estimating section estimating the layer thickness within the range of the value of a layer thickness wide-range estimation width including the previously estimated value of the layer thickness based on the theoretical formula; a selecting section selecting an index from the indexes; a determining section determining a layer thickness wide-range estimation result; and a layer thickness determining section determining the thickness of the thin film based on the theoretical formula after calculating the layer thickness wide-range estimation result.

    摘要翻译： 一种系统，其包括基于在基板上反射的光的强度来估计薄膜的厚度的指标分配部和表示当获得光谱时的薄膜厚度与干涉光强度之间的关系的理论公式 并且为层厚度的每个候选值分配索引; 层厚度宽范围估计部，基于所述理论公式，估计包含所述层厚度的先前估计值的层厚度宽范围推定宽度的值的范围内的层厚; 选择部，从所述索引中选择索引; 确定层厚度宽范围估计结果的确定部分; 以及层厚度确定部，在计算层厚度宽范围估计结果之后，基于理论公式确定薄膜的厚度。

    Thickness monitoring device, etching depth monitoring device and thickness monitoring method
    7.
    发明授权
    Thickness monitoring device, etching depth monitoring device and thickness monitoring method 有权
    厚度监测装置，蚀刻深度监测装置和厚度监测方法

    公开(公告)号：US09228828B2

    公开(公告)日：2016-01-05

    申请号：US13902061

    申请日：2013-05-24

    申请人： SHIMADZU CORPORATION

    发明人： Hiroomi Goto ,  Yuzo Nagumo ,  Rui Kato

    IPC分类号： G01B11/06

    CPC分类号： G01B11/0675 ,  G01B11/0633

    摘要： A thickness monitoring device capable of performing thickness measurement of an object of measurement in real time even when using a relatively narrow band light source. This etching monitoring device (thickness monitoring device) includes a light source which produces measurement light having a predetermined wavelength bandwidth; an array detector which detects, for each wavelength, interference light of measurement light reflected from mask, whereof the thickness changes over time; and data processing unit which computes the thickness of the mask based on change over time of a plurality of single-wavelength components of the interference light detected by the array detector.

    摘要翻译： 即使在使用相对较窄的带状光源的情况下也能够实时地进行测量对象的厚度测量的厚度监视装置。 该蚀刻监视装置（厚度监视装置）包括产生具有预定波长带宽的测量光的光源; 阵列检测器，对于每个波长，检测从掩模反射的测量光的干涉光，其厚度随时间变化; 以及数据处理单元，其基于由阵列检测器检测到的干涉光的多个单波长分量随时间的变化来计算掩模的厚度。

    PRESSURE CONTROL VALVE AND SUPERCRITICAL FLUID CHROMATOGRAPH
    10.
    发明申请
    PRESSURE CONTROL VALVE AND SUPERCRITICAL FLUID CHROMATOGRAPH 有权
    压力控制阀和超临界流体色谱

    公开(公告)号：US20160209377A1

    公开(公告)日：2016-07-21

    申请号：US14914868

    申请日：2013-09-02

    申请人： SHIMADZU CORPORATION

    发明人： Hiroomi Goto ,  Tsunehiro Inoue ,  Takahiro Mori ,  Hirohisa Abe

    IPC分类号： G01N30/32 ,  G01N30/72 ,  F16K25/00 ,  F16K31/00 ,  F16K7/16 ,  F16K27/02

    CPC分类号： G01N30/32 ,  B01D15/40 ,  F16K7/16 ,  F16K25/005 ,  F16K27/0236 ,  F16K31/004 ,  G01N30/7233 ,  G01N2030/328

    摘要： A pressure control valve includes a pressure control block including a bore hole that is bored perpendicularly from one outer surface, and two internal channel openings of whose end portions are at a bottom surface of the bore hole, a valve body having elasticity and covering the bottom surface of the bore hole, a sealing member for pressing a portion of the valve body against the bottom surface of the bore hole, the portion abutting a peripheral edge portion of a portion of the bottom surface where the openings are provided, and an actuator for driving a portion, of the valve body, abutting the portion where the openings are provided in a direction perpendicular to the bottom surface of the bore hole.

    摘要翻译： 压力控制阀包括压力控制块，该压力控制块包括从一个外表面垂直钻孔的钻孔和其端部位于钻孔的底表面处的两个内部通道开口，具有弹性并覆盖底部的阀体 孔的表面，用于将阀体的一部分压靠在钻孔的底面上的密封构件，与设置有开口的底面的一部分的周缘部邻接的部分，以及用于 驱动所述阀体的与所述钻孔的底面垂直的方向上设置有所述开口部的部分。