SPOOLED ARRANGEMENT AND PROCESS OF PRODUCING A SPOOLED ARRANGEMENT

    公开(公告)号:US20190218661A1

    公开(公告)日:2019-07-18

    申请号:US16249314

    申请日:2019-01-16

    Applicant: SILCOTEK CORP.

    CPC classification number: C23C16/22

    Abstract: A spooled arrangement and a process of producing a spooled arrangement are disclosed. The spooled arrangement includes a substrate, the substrate being metal or metallic. The substrate has an inner surface and an outer surface, the inner surface and the outer surface being in a furled configuration to define the spooled arrangement. The inner surface and the outer surface have a coating, the coating being an amorphous silicon coating, a silicon-oxygen-carbon-containing coating, a silicon-nitrogen-containing coating, a silicon-fluorine-carbon-containing coating, or a combination thereof. The process includes producing the spooled arrangement.

    DE-ICING PROCESS AND PRODUCT
    3.
    发明申请

    公开(公告)号:US20220136110A1

    公开(公告)日:2022-05-05

    申请号:US17511953

    申请日:2021-10-27

    Applicant: SILCOTEK CORP.

    Abstract: De-icing processes and products with coatings enabling de-icing are disclosed. The de-icing process includes mechanically removing ice from a coated article having a chemical vapor deposition coating. The chemical vapor deposition coating includes silicon, carbon, and fluorine. The chemical vapor deposition coating is hydrophobic and oleophobic. The chemical vapor deposition coating remains hydrophobic and oleophobic after the mechanically removing of the ice. The product is a coated article having a chemical vapor deposition coating and ice on the chemical vapor deposition coating. The chemical vapor deposition coating includes silicon, carbon, and fluorine. The chemical vapor deposition coating is hydrophobic and oleophobic. The chemical vapor deposition coating remains hydrophobic and oleophobic in response to mechanically removing of the ice on the chemical vapor deposition coating.

    COLD THERMAL CHEMICAL VAPOR DEPOSITION
    4.
    发明公开

    公开(公告)号:US20240117495A1

    公开(公告)日:2024-04-11

    申请号:US17768249

    申请日:2020-10-13

    Applicant: SILCOTEK CORP.

    CPC classification number: C23C16/52 C23C16/4404 C23C16/45523 C23C16/46

    Abstract: Cold thermal chemical vapor deposition coatings, articles, and processes are disclosed. Specifically, a cold thermal chemical vapor deposition process includes positioning an article, heating a precursor gas to at least a decomposition temperature of the precursor gas to produce a deposition gas, introducing the deposition gas to a coating vessel, and depositing a coating from the deposition gas onto the article within the coating vessel. The article remains at a temperature below the decomposition temperature throughout the introducing and depositing of the deposition gas. The coating on the article has a gradient formed by the depositing of the coating having no flow for a period of time. The coated article includes a thermally-sensitive substrate (the thermally-sensitive substrate capable of being modified by a temperature of 300 degrees Celsius) and a coating the thermally-sensitive substrate.

Patent Agency Ranking