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公开(公告)号:US09530812B2
公开(公告)日:2016-12-27
申请号:US15087695
申请日:2016-03-31
Applicant: Sony Corporation
Inventor: Taku Umebayashi , Hiroshi Takahashi , Reijiroh Shohji
IPC: H01L31/00 , H01L29/40 , H01L27/146 , H04N5/225 , H04N5/374
CPC classification number: H01L27/14634 , H01L21/76898 , H01L23/481 , H01L27/14612 , H01L27/14621 , H01L27/14627 , H01L27/14632 , H01L27/14636 , H01L27/1464 , H01L27/14643 , H01L27/14645 , H01L27/14687 , H01L27/1469 , H01L2224/11 , H04N5/225 , H04N5/374
Abstract: A semiconductor device is provided as a back-illuminated solid-state imaging device. The device is manufactured by bonding a first semiconductor wafer with a pixel array in a half-finished product state and a second semiconductor wafer with a logic circuit in a half-finished product state together, making the first semiconductor wafer into a thin film, electrically connecting the pixel array and the logic circuit, making the pixel array and the logic circuit into a finished product state, and dividing the first semiconductor wafer and the second semiconductor being bonded together into microchips.
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公开(公告)号:US09319569B2
公开(公告)日:2016-04-19
申请号:US14834010
申请日:2015-08-24
Applicant: Sony Corporation
Inventor: Taku Umebayashi , Hiroshi Takahashi , Reijiroh Shohji
IPC: H01L21/00 , H01L23/52 , H04N5/225 , H01L27/146 , H04N5/374
CPC classification number: H01L27/14634 , H01L21/76898 , H01L23/481 , H01L27/14612 , H01L27/14621 , H01L27/14627 , H01L27/14632 , H01L27/14636 , H01L27/1464 , H01L27/14643 , H01L27/14645 , H01L27/14687 , H01L27/1469 , H01L2224/11 , H04N5/225 , H04N5/374
Abstract: A semiconductor device is provided as a back-illuminated solid-state imaging device. The device is manufactured by bonding a first semiconductor wafer with a pixel array in a half-finished product state and a second semiconductor wafer with a logic circuit in a half-finished product state together, making the first semiconductor wafer into a thin film, electrically connecting the pixel array and the logic circuit, making the pixel array and the logic circuit into a finished product state, and dividing the first semiconductor wafer and the second semiconductor being bonded together into microchips.
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公开(公告)号:US20200152685A1
公开(公告)日:2020-05-14
申请号:US16746188
申请日:2020-01-17
Applicant: Sony Corporation
Inventor: Taku Umebayashi , Hitoshi Takahashi , Reijiroh Shohji
IPC: H01L27/146 , H04N5/374 , H04N5/225 , H04N5/369 , H01L23/48 , H01L21/768
Abstract: A semiconductor device is provided as a back-illuminated solid-state imaging device. The device is manufactured by bonding a first semiconductor wafer with a pixel array in a half-finished product state and a second semiconductor wafer with a logic circuit in a half-finished product state together, making the first semiconductor wafer into a thin film, electrically connecting the pixel array and the logic circuit, making the pixel array and the logic circuit into a finished product state, and dividing the first semiconductor wafer and the second semiconductor being bonded together into microchips.
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公开(公告)号:US10403670B2
公开(公告)日:2019-09-03
申请号:US15814177
申请日:2017-11-15
Applicant: Sony Corporation
Inventor: Taku Umebayashi , Hiroshi Takahashi , Reijiroh Shohji
IPC: H01L27/146 , H04N5/225 , H04N5/374 , H01L21/768 , H01L23/48 , H04N5/369
Abstract: A semiconductor device is provided as a back-illuminated solid-state imaging device. The device is manufactured by bonding a first semiconductor wafer with a pixel array in a half-finished product state and a second semiconductor wafer with a logic circuit in a half-finished product state together, making the first semiconductor wafer into a thin film, electrically connecting the pixel array and the logic circuit, making the pixel array and the logic circuit into a finished product state, and dividing the first semiconductor wafer and the second semiconductor being bonded together into microchips.
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公开(公告)号:US20170092681A1
公开(公告)日:2017-03-30
申请号:US15374864
申请日:2016-12-09
Applicant: Sony Corporation
Inventor: Taku Umebayashi , Hiroshi Takahashi , Reijiroh Shohji
IPC: H01L27/146
CPC classification number: H01L27/14634 , H01L21/76898 , H01L23/481 , H01L27/14612 , H01L27/14621 , H01L27/14627 , H01L27/14632 , H01L27/14636 , H01L27/1464 , H01L27/14643 , H01L27/14645 , H01L27/14687 , H01L27/1469 , H01L2224/11 , H04N5/225 , H04N5/374
Abstract: A semiconductor device is provided as a back-illuminated solid-state imaging device. The device is manufactured by bonding a first semiconductor wafer with a pixel array in a half-finished product state and a second semiconductor wafer with a logic circuit in a half-finished product state together, making the first semiconductor wafer into a thin film, electrically connecting the pixel array and the logic circuit, making the pixel array and the logic circuit into a finished product state, and dividing the first semiconductor wafer and the second semiconductor being bonded together into microchips.
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公开(公告)号:US09524925B2
公开(公告)日:2016-12-20
申请号:US15097093
申请日:2016-04-12
Applicant: Sony Corporation
Inventor: Satoru Wakiyama , Masaki Okamoto , Yutaka Ooka , Reijiroh Shohji , Yoshifumi Zaizen , Kazunori Nagahata , Masaki Haneda
IPC: H01L23/48 , H01L21/768 , H01L21/306 , H01L21/311 , H01L23/00 , H01L25/00 , H01L25/065 , H01L27/146
CPC classification number: H01L25/0657 , H01L21/30604 , H01L21/31111 , H01L21/31116 , H01L21/76805 , H01L21/76877 , H01L21/76898 , H01L23/481 , H01L24/32 , H01L24/83 , H01L25/50 , H01L27/14632 , H01L27/14634 , H01L27/14636 , H01L27/14687 , H01L27/1469 , H01L2224/32145 , H01L2225/06541 , H01L2225/06544 , H01L2225/06548 , H01L2924/0002 , H01L2924/00
Abstract: There is provided a method for manufacturing a semiconductor device including a first semiconductor base substrate, a second semiconductor base substrate that is bonded onto a first surface side of the first semiconductor base substrate, a through electrode that is formed to penetrate from a second surface side of the first semiconductor base substrate to a wiring layer on the second semiconductor base substrate, and an insulation layer that surrounds a circumference of the through electrode formed inside the first semiconductor base substrate.
Abstract translation: 提供一种制造半导体器件的方法,该半导体器件包括:第一半导体基底基板,接合到第一半导体基底基板的第一表面侧上的第二半导体基底基板,形成为从第二表面侧穿透的通孔 第一半导体基底基板的第二半导体基底基板上的布线层,以及围绕形成在第一半导体基板的内部的贯通电极的周围的绝缘层。
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公开(公告)号:US11764243B2
公开(公告)日:2023-09-19
申请号:US17110145
申请日:2020-12-02
Applicant: Sony Corporation
Inventor: Taku Umebayashi , Hiroshi Takahashi , Reijiroh Shohji
IPC: H01L27/146 , H01L21/768 , H01L23/48 , H04N23/00 , H04N25/76 , H04N25/79
CPC classification number: H01L27/14634 , H01L21/76898 , H01L23/481 , H01L27/1464 , H01L27/1469 , H01L27/14612 , H01L27/14621 , H01L27/14627 , H01L27/14632 , H01L27/14636 , H01L27/14643 , H01L27/14645 , H01L27/14687 , H04N23/00 , H04N25/76 , H04N25/79 , H01L2224/11
Abstract: A semiconductor device is provided as a back-illuminated solid-state imaging device. The device is manufactured by bonding a first semiconductor wafer with a pixel array in a half-finished product state and a second semiconductor wafer with a logic circuit in a half-finished product state together, making the first semiconductor wafer into a thin film, electrically connecting the pixel array and the logic circuit, making the pixel array and the logic circuit into a finished product state, and dividing the first semiconductor wafer and the second semiconductor being bonded together into microchips.
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公开(公告)号:US11721716B2
公开(公告)日:2023-08-08
申请号:US17110145
申请日:2020-12-02
Applicant: Sony Corporation
Inventor: Taku Umebayashi , Hiroshi Takahashi , Reijiroh Shohji
IPC: H01L27/146 , H01L21/768 , H01L23/48 , H04N23/00 , H04N25/76 , H04N25/79
CPC classification number: H01L27/14634 , H01L21/76898 , H01L23/481 , H01L27/1464 , H01L27/1469 , H01L27/14612 , H01L27/14621 , H01L27/14627 , H01L27/14632 , H01L27/14636 , H01L27/14643 , H01L27/14645 , H01L27/14687 , H04N23/00 , H04N25/76 , H04N25/79 , H01L2224/11
Abstract: A semiconductor device is provided as a back-illuminated solid-state imaging device. The device is manufactured by bonding a first semiconductor wafer with a pixel array in a half-finished product state and a second semiconductor wafer with a logic circuit in a half-finished product state together, making the first semiconductor wafer into a thin film, electrically connecting the pixel array and the logic circuit, making the pixel array and the logic circuit into a finished product state, and dividing the first semiconductor wafer and the second semiconductor being bonded together into microchips.
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公开(公告)号:US10950647B2
公开(公告)日:2021-03-16
申请号:US16913075
申请日:2020-06-26
Applicant: Sony Corporation
Inventor: Taku Umebayashi , Hiroshi Takahashi , Reijiroh Shohji
IPC: H01L27/146 , H01L31/14 , H01L21/768 , H01L23/48 , H04N5/369 , H04N5/225 , H04N5/374
Abstract: A semiconductor device is provided as a back-illuminated solid-state imaging device. The device is manufactured by bonding a first semiconductor wafer with a pixel array in a half-finished product state and a second semiconductor wafer with a logic circuit in a half-finished product state together, making the first semiconductor wafer into a thin film, electrically connecting the pixel array and the logic circuit, making the pixel array and the logic circuit into a finished product state, and dividing the first semiconductor wafer and the second semiconductor being bonded together into microchips.
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公开(公告)号:US20190214425A1
公开(公告)日:2019-07-11
申请号:US16358348
申请日:2019-03-19
Applicant: Sony Corporation
Inventor: Taku Umebayashi , Hiroshi Takahashi , Reijiroh Shohji
IPC: H01L27/146 , H04N5/225 , H01L23/48 , H01L21/768 , H04N5/369 , H04N5/374
CPC classification number: H01L27/14634 , H01L21/76898 , H01L23/481 , H01L27/14612 , H01L27/14621 , H01L27/14627 , H01L27/14632 , H01L27/14636 , H01L27/1464 , H01L27/14643 , H01L27/14645 , H01L27/14687 , H01L27/1469 , H01L2224/11 , H04N5/225 , H04N5/374 , H04N5/379
Abstract: A semiconductor device is provided as a back-illuminated solid-state imaging device. The device is manufactured by bonding a first semiconductor wafer with a pixel array in a half-finished product state and a second semiconductor wafer with a logic circuit in a half-finished product state together, making the first semiconductor wafer into a thin film, electrically connecting the pixel array and the logic circuit, making the pixel array and the logic circuit into a finished product state, and dividing the first semiconductor wafer and the second semiconductor being bonded together into microchips.
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