公开(公告)号：US11692283B2

公开(公告)日：2023-07-04

申请号：US17009533

申请日：2020-09-01

Applicant: STMICROELECTRONICS S.r.l.

Inventor： Ruggero Anzalone ,  Nicolo′ Frazzetto ,  Francesco La Via

IPC: C30B25/12 ,  H01L21/687 ,  H01L21/02 ,  C23C16/32 ,  C23C16/458 ,  C30B29/36 ,  H01L21/67 ,  C23C16/46 ,  C30B25/08

CPC classification number: C30B25/12 ,  C23C16/325 ,  C23C16/4583 ,  C30B29/36 ,  C23C16/4585 ,  C23C16/46 ,  C30B25/08 ,  H01L21/0262 ,  H01L21/02529 ,  H01L21/67011 ,  H01L21/6875 ,  H01L21/68785

Abstract: An apparatus for growing semiconductor wafers, in particular of silicon carbide, wherein a chamber houses a collection container and a support or susceptor arranged over the container. The support is formed by a frame surrounding an opening accommodating a plurality of arms and a seat. The frame has a first a second surface, opposite to each other, with the first surface of the frame facing the support. The arms are formed by cantilever bars extending from the frame into the opening, having a maximum height smaller than the frame, and having at the top a resting edge. The resting edges of the arms define a resting surface that is at a lower level than the second surface of the frame. The seat has a bottom formed by the resting surface.

公开(公告)号：US11946158B2

公开(公告)日：2024-04-02

申请号：US18321652

申请日：2023-05-22

Applicant: STMICROELECTRONICS S.r.l.

Inventor： Ruggero Anzalone ,  Nicolo' Frazzetto ,  Francesco La Via

IPC: C30B25/12 ,  C23C16/32 ,  C23C16/458 ,  C30B29/36 ,  H01L21/687 ,  C23C16/46 ,  C30B25/08 ,  H01L21/02 ,  H01L21/67

CPC classification number: C30B25/12 ,  C23C16/325 ,  C23C16/4583 ,  C30B29/36 ,  C23C16/4585 ,  C23C16/46 ,  C30B25/08 ,  H01L21/02529 ,  H01L21/0262 ,  H01L21/67011 ,  H01L21/6875 ,  H01L21/68785

Abstract: An apparatus for growing semiconductor wafers, in particular of silicon carbide, wherein a chamber houses a collection container and a support or susceptor arranged over the container. The support is formed by a frame surrounding an opening accommodating a plurality of arms and a seat. The frame has a first a second surface, opposite to each other, with the first surface of the frame facing the support. The arms are formed by cantilever bars extending from the frame into the opening, having a maximum height smaller than the frame, and having at the top a resting edge. The resting edges of the arms define a resting surface that is at a lower level than the second surface of the frame. The seat has a bottom formed by the resting surface.

公开(公告)号：US20230295836A1

公开(公告)日：2023-09-21

申请号：US18321652

申请日：2023-05-22

Applicant: STMICROELECTRONICS S.r.l.

Inventor： Ruggero ANZALONE ,  Nicolo' FRAZZETTO ,  Francesco La Via

IPC: C30B25/12 ,  C23C16/32 ,  C23C16/458 ,  C30B29/36

CPC classification number: C30B25/12 ,  C23C16/325 ,  C23C16/4583 ,  C30B29/36 ,  H01L21/68785

Abstract: An apparatus for growing semiconductor wafers, in particular of silicon carbide, wherein a chamber houses a collection container and a support or susceptor arranged over the container. The support is formed by a frame surrounding an opening accommodating a plurality of arms and a seat. The frame has a first a second surface, opposite to each other, with the first surface of the frame facing the support. The arms are formed by cantilever bars extending from the frame into the opening, having a maximum height smaller than the frame, and having at the top a resting edge. The resting edges of the arms define a resting surface that is at a lower level than the second surface of the frame. The seat has a bottom formed by the resting surface.