公开(公告)号：US20180025933A1

公开(公告)日：2018-01-25

申请号：US15550205

申请日：2016-02-03

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Kazunori ISHIMURA ,  Kazuto ANDO ,  Kentaro TAKAHASHI ,  Yuhki KINPARA ,  Shinichi MAETA ,  Mamoru KOSAKAI

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6833 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68757

Abstract: An electrostatic chuck part of an electrostatic chuck device has an electrostatic chuck part inner peripheral surface surrounding an opening of a chuck part through-hole, and an electrostatic chuck part outer peripheral surface surrounding the electrostatic chuck part inner peripheral surface. An insulator has an insulator main body in which an insulator through-hole having an opening on the electrostatic chuck part side is formed, an insulator inner end face, and an insulator outer end face which faces the electrostatic chuck part outer peripheral surface. The insulator inner end face and the electrostatic chuck part inner peripheral surface are in contact with each other, or an adhesion layer or a plasma-resistant adhesive layer extends in a gap between the insulator inner end face and the electrostatic chuck part inner peripheral surface. The plasma-resistant adhesive layer is formed between the electrostatic chuck part outer peripheral surface and the insulator outer end face.

公开(公告)号：US20200343125A1

公开(公告)日：2020-10-29

申请号：US16958094

申请日：2018-12-11

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Yuuki KINPARA ,  Ryuuji HAYAHARA ,  Kazunori ISHIMURA ,  Hitoshi KOUNO

IPC: H01L21/683 ,  H02N13/00 ,  H01L21/67 ,  H01L21/687

Abstract: An electrostatic chuck device includes: an electrostatic chuck part having, as a main surface, a mounting surface on which a plate-shaped sample is mounted, and provided with an electrostatic attraction electrode; a base part which is disposed on a side opposite to the mounting surface with respect to the electrostatic chuck part and is configured to cool the electrostatic chuck part; a heater which is disposed in a layered manner between the electrostatic chuck part and the base part or in an interior of the electrostatic chuck part; and an adhesion layer which bonds and integrates the electrostatic chuck part and the base part together, in which the electrostatic chuck part is provided with a first through-hole, the base part is provided with a second through-hole communicating with the first through-hole, the adhesion layer is provided with a third through-hole communicating with the first through-hole and the second through-hole, a tubular insulator is fixed in the second through-hole, and an end of the insulator which is located on the electrostatic chuck part side is separated from the electrostatic chuck part with a space interposed therebetween.

公开(公告)号：US20190019714A1

公开(公告)日：2019-01-17

申请号：US16070478

申请日：2017-01-18

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Mamoru KOSAKAI ,  Yukio MIURA ,  Kazunori ISHIMURA ,  Keisuke MAEDA ,  Hitoshi KOUNO ,  Yuuki KINPARA ,  Shinichi MAETA ,  Tomomi ITO

IPC: H01L21/683 ,  H01L21/67 ,  H02N13/00

Abstract: An electrostatic chuck device includes: an electrostatic chuck part which incorporates an internal electrode for electrostatic attraction and has a placing surface on which a plate-like sample is placed; a base part which cools the electrostatic chuck part; and an adhesion layer which bonds the electrostatic chuck part and the base part to integrate the parts together, in which a first through-hole is provided in the electrostatic chuck part, a second through-hole that communicates with the first through-hole is provided in the base part, a tubular insulator is fixed in the second through-hole, an annular sealing member is sandwiched between the electrostatic chuck part and a distal end surface of the insulator, wherein the distal end surface is located on the electrostatic chuck part side of the insulator, and a tubular insulating wall member is located at the inner side of the sealing member in the radial direction.