公开(公告)号：US09177788B2

公开(公告)日：2015-11-03

申请号：US13773222

申请日：2013-02-21

Applicant: Synos Technology, Inc.

Inventor： Sang In Lee ,  Ilsong Lee ,  Hyo Seok Yang

IPC: H01L21/02 ,  C23C16/30 ,  C23C16/34 ,  C23C16/40 ,  C23C16/455 ,  H01J37/32

CPC classification number: H01L21/322 ,  C23C16/308 ,  C23C16/345 ,  C23C16/402 ,  C23C16/4412 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/45591 ,  C23C16/50 ,  H01J37/32357 ,  H01J37/32623 ,  H01L21/02178 ,  H01L21/02274 ,  H01L21/0228

Abstract: Placing a conductive member between a plasma chamber in a remote plasma reactor and a substrate to shield the substrate from irradiation of undesirable electromagnetic radiation, ions or electrons. The conductive member blocks the electromagnetic radiation, neutralizes ions and absorbs the electrons. Radicals generated in the plasma chambers flows to the substrate despite the placement of the conductive member. In this way, the substrate is exposed to the radicals whereas damages to the substrate due to electromagnetic radiations, ions or electrons are reduced or removed.

Abstract translation: 将导电构件放置在远程等离子体反应器中的等离子体室和基板之间，以屏蔽基板免受不需要的电磁辐射，离子或电子的照射。 导电构件阻挡电磁辐射，中和离子并吸收电子。 在等离子体室中产生的自由基流过衬底，尽管导电构件的放置。 以这种方式，衬底暴露于自由基，同时减少或去除由电磁辐射，离子或电子引起的对衬底的损伤。

公开(公告)号：US09145608B2

公开(公告)日：2015-09-29

申请号：US13849477

申请日：2013-03-23

Applicant: Synos Technology, Inc.

Inventor： Samuel S. Pak ,  Sang In Lee ,  Ilsong Lee ,  Hyo Seok Yang

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/45544 ,  C23C16/4412 ,  C23C16/45551 ,  C23C16/45561 ,  C23C16/45589

Abstract: An injection module assembly (IMA) that moves along a predetermined path to inject gas onto a substrate and discharge excess gas is described. The IMA may be used for processing a substrate that is difficult to move for various reasons such as a large size and weight of the substrate. The IMA is connected to one or more sets of jointed arms with structures to provide one or more paths for injecting the gas or discharging the excess gas. The IMA is moved by a first driving mechanism (e.g., linear motor) and the jointed arms are separately operated by a second driving mechanism (e.g., pulleys and cables) to reduce force or torque caused by the weight of the jointed arms. The movement of the first driving mechanism and the second driving mechanism is synchronized to move the IMA and the jointed arms.

Abstract translation: 描述了沿着预定路径移动以将气体注入基板并排出多余气体的注射模块组件（IMA）。 IMA可以用于处理由于各种原因（例如基板的大尺寸和重量）而难以移动的基板。 IMA连接到具有结构的一组或多组接合臂，以提供用于喷射气体或排出多余气体的一个或多个路径。 IMA由第一驱动机构（例如，线性马达）移动，并且连接的臂由第二驱动机构（例如，滑轮和电缆）分开操作，以减少由连接的臂的重量引起的力或扭矩。 第一驱动机构和第二驱动机构的运动被同步以移动IMA和连接臂。

公开(公告)号：US20130260034A1

公开(公告)日：2013-10-03

申请号：US13849477

申请日：2013-03-23

Applicant: SYNOS TECHNOLOGY, INC.

Inventor： Samuel S. Pak ,  Sang In Lee ,  Ilsong Lee ,  Hyo Seok Yang

IPC: C23C16/455

CPC classification number: C23C16/45544 ,  C23C16/4412 ,  C23C16/45551 ,  C23C16/45561 ,  C23C16/45589

Abstract: An injection module assembly (IMA) that moves along a predetermined path to inject gas onto a substrate and discharge excess gas is described. The IMA may be used for processing a substrate that is difficult to move for various reasons such as a large size and weight of the substrate. The IMA is connected to one or more sets of jointed arms with structures to provide one or more paths for injecting the gas or discharging the excess gas. The IMA is moved by a first driving mechanism (e.g., linear motor) and the jointed arms are separately operated by a second driving mechanism (e.g., pulleys and cables) to reduce force or torque caused by the weight of the jointed arms. The movement of the first driving mechanism and the second driving mechanism is synchronized to move the IMA and the jointed arms.

Abstract translation: 描述了沿着预定路径移动以将气体注入基板并排出多余气体的注射模块组件（IMA）。 IMA可以用于处理由于各种原因（例如基板的大尺寸和重量）而难以移动的基板。 IMA连接到具有结构的一组或多组接合臂，以提供用于喷射气体或排出多余气体的一个或多个路径。 IMA由第一驱动机构（例如，线性马达）移动，并且连接的臂由第二驱动机构（例如，滑轮和电缆）分开操作，以减少由连接的臂的重量引起的力或扭矩。 第一驱动机构和第二驱动机构的运动被同步以移动IMA和连接臂。

公开(公告)号：US20130237065A1

公开(公告)日：2013-09-12

申请号：US13773222

申请日：2013-02-21

Applicant: SYNOS TECHNOLOGY, INC.

Inventor： Sang In Lee ,  Ilsong Lee ,  Hyo Seok Yang

IPC: H01L21/02

CPC classification number: H01L21/322 ,  C23C16/308 ,  C23C16/345 ,  C23C16/402 ,  C23C16/4412 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/45591 ,  C23C16/50 ,  H01J37/32357 ,  H01J37/32623 ,  H01L21/02178 ,  H01L21/02274 ,  H01L21/0228

Abstract: Placing a conductive member between a plasma chamber in a remote plasma reactor and a substrate to shield the substrate from irradiation of undesirable electromagnetic radiation, ions or electrons. The conductive member blocks the electromagnetic radiation, neutralizes ions and absorbs the electrons. Radicals generated in the plasma chambers flows to the substrate despite the placement of the conductive member. In this way, the substrate is exposed to the radicals whereas damages to the substrate due to electromagnetic radiations, ions or electrons are reduced or removed.

Abstract translation: 将导电构件放置在远程等离子体反应器中的等离子体室和基板之间，以屏蔽基板免受不需要的电磁辐射，离子或电子的照射。 导电构件阻挡电磁辐射，中和离子并吸收电子。 在等离子体室中产生的自由基流过衬底，尽管导电构件的放置。 以这种方式，衬底暴露于自由基，同时减少或去除由电磁辐射，离子或电子引起的对衬底的损伤。