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公开(公告)号：US10181570B2
公开(公告)日：2019-01-15
申请号：US15827809
申请日：2017-11-30
发明人： Jun Hong Park , Jung Soo Lee , Gwang Min Cha , Jeong Min Park
IPC分类号： H01L27/10 , H01L51/10 , H01L27/12 , G02F1/1362 , H01L27/32 , G02F1/1343
摘要： A display device includes a substrate, a semiconductor layer disposed on the substrate, a first insulating layer disposed on the semiconductor layer, a first conductive layer disposed on the first insulating layer and electrically connected to the semiconductor layer via a first contact hole, which is defined through the first insulating layer, a second insulating layer disposed on the first conductive layer, and a second conductive layer disposed on the second insulating layer and electrically connected to the first conductive layer via a second contact hole, which is defined through the second insulating layer, where the first and second contact holes overlap each other, and a residual layer, which includes a portion of the second insulating layer, is disposed in the first contact hole.
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公开(公告)号：US09786694B2
公开(公告)日：2017-10-10
申请号：US15264490
申请日：2016-09-13
发明人： Gwang Min Cha , Su Kyoung Yang , Chan Woo Yang
IPC分类号： H01L27/12 , H01L23/52 , H01L23/532 , H01L29/24 , H01L29/786 , H01L29/66 , H01L29/423 , H01L21/4763 , H01L21/02 , H01L29/45
CPC分类号： H01L27/124 , H01L21/0206 , H01L21/02175 , H01L21/02244 , H01L21/47635 , H01L23/53223 , H01L23/53238 , H01L23/53252 , H01L23/53266 , H01L27/1225 , H01L27/1259 , H01L29/24 , H01L29/42356 , H01L29/45 , H01L29/66969 , H01L29/7869
摘要： A display device and a method of manufacturing the display device are provided. According to an exemplary embodiment, a display device includes: a substrate; a gate electrode disposed on the substrate; a semiconductor pattern disposed on the gate electrode; data wiring disposed on the semiconductor pattern and having a data line, a source electrode, and a drain electrode; a first barrier layer disposed between the data wiring and the semiconductor pattern; and undercuts disposed on at least one side of each segment of the first barrier layer.
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公开(公告)号：US09773823B2
公开(公告)日：2017-09-26
申请号：US14949510
申请日：2015-11-23
发明人： Su-Hyoung Kang , Gwang Min Cha , Chang Oh Jeong
IPC分类号： H01L27/12 , H01L21/768
CPC分类号： H01L27/1288 , H01L21/7688 , H01L27/1218 , H01L27/1248 , H01L27/1259 , H01L27/1266 , H01L51/5253 , H01L51/5256 , H01L51/56 , H01L2227/323 , H01L2227/326 , H01L2251/5338
摘要： A display device and a method of manufacturing the display device are disclosed. In one aspect, the method includes forming a sacrificial layer over a carrier substrate, forming a passivation barrier layer to cover upper and lateral sides of the sacrificial layer and forming a thin film transistor layer over the passivation barrier layer. The method also includes placing a mask over the thin film transistor layer so as to expose an edge portion of the passivation barrier layer, wherein the edge portion does not overlap the mask in the depth dimension of the display device. The method further includes removing the edge portion of the passivation barrier layer so as to form a barrier layer and separating the carrier substrate from the barrier layer via the sacrificial layer.
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4.发明授权公开(公告)号：US09824788B2
公开(公告)日：2017-11-21
申请号：US14659730
申请日：2015-03-17
发明人： Su Hyoung Kang , Sang Woo Sohn , Chang Oh Jeong , Gwang Min Cha
CPC分类号： H01B1/026 , H01L27/3276
摘要： Provided is a metal wire. The metal wire includes a copper layer, and at least one barrier layer. The barrier layer is disposed on at least one of an upper part and a lower part of the copper layer. The barrier layer includes an alloy including copper, nickel, and zinc.
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公开(公告)号：US09627548B2
公开(公告)日：2017-04-18
申请号：US14841559
申请日：2015-08-31
发明人： Hyun Ju Kang , Dong Hee Lee , Gwang Min Cha , Sang Won Shin , Sang Woo Sohn
IPC分类号： H01L29/786 , H01L29/66 , H01L29/423 , H01L29/45 , H01L27/12
CPC分类号： H01L29/66969 , H01L21/47635 , H01L21/76834 , H01L21/76852 , H01L21/76855 , H01L21/76867 , H01L23/53233 , H01L23/53238 , H01L27/1225 , H01L29/41733 , H01L29/42384 , H01L29/45 , H01L29/78618 , H01L29/7869
摘要： A thin film transistor array panel that includes: a substrate; a gate electrode disposed on the substrate; a semiconductor layer disposed on the substrate; a gate insulating layer disposed between the gate electrode and the semiconductor layer; a source electrode disposed on the semiconductor layer and a drain electrode facing the source electrode; a metal oxide layer covering the source electrode and the drain electrode; and a passivation layer covering the source electrode, the drain electrode, and the metal oxide layer, wherein the source electrode and the drain electrode include a first material and a second material which is added to the first material and metal included in the metal oxide layer is formed by diffusing the second material.
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公开(公告)号：US20160315227A1
公开(公告)日：2016-10-27
申请号：US14949510
申请日：2015-11-23
发明人： Su-Hyoung Kang , Gwang Min Cha , Chang Oh Jeong
CPC分类号： H01L27/1288 , H01L21/7688 , H01L27/1218 , H01L27/1248 , H01L27/1259 , H01L27/1266 , H01L51/5253 , H01L51/5256 , H01L51/56 , H01L2227/323 , H01L2227/326 , H01L2251/5338
摘要： A display device and a method of manufacturing the display device are disclosed. In one aspect, the method includes forming a sacrificial layer over a carrier substrate, forming a passivation barrier layer to cover upper and lateral sides of the sacrificial layer and forming a thin film transistor layer over the passivation barrier layer. The method also includes placing a mask over the thin film transistor layer so as to expose an edge portion of the passivation barrier layer, wherein the edge portion does not overlap the mask in the depth dimension of the display device. The method further includes removing the edge portion of the passivation barrier layer so as to form a barrier layer and separating the carrier substrate from the barrier layer via the sacrificial layer.
摘要翻译： 公开了一种显示装置及其制造方法。 在一个方面，该方法包括在载体衬底上形成牺牲层，形成钝化阻挡层以覆盖牺牲层的上侧和外侧，并在钝化阻挡层上形成薄膜晶体管层。 该方法还包括在薄膜晶体管层上放置掩模以暴露钝化阻挡层的边缘部分，其中边缘部分在显示装置的深度尺寸上不与掩模重叠。 该方法还包括去除钝化阻挡层的边缘部分以便形成阻挡层，并通过牺牲层将载体衬底与阻挡层分开。
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