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公开(公告)号：US20160078608A1
公开(公告)日：2016-03-17
申请号：US14692128
申请日：2015-04-21
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Ji-Hoon NA , Byung-Gook KIM , Hyuk-Joo KWON
IPC: G06T7/00
CPC classification number: G06T7/001 , G06T2207/30148
Abstract: A reticle inspection apparatus includes a reticle, an image generator to generate images of a surface of the reticle, and an image processor to compare first and second images generated by the image generator. The first image is generated when a pellicle is not on the reticle and the second image is generated when the pellicle is on the reticle.
Abstract translation: 标线检查装置包括掩模版，图像发生器，用于生成掩模版的表面的图像;以及图像处理器，用于比较由图像发生器产生的第一和第二图像。 当防护薄膜组件不在掩模版上时产生第一图像，并且当防护薄膜组件在掩模版上时产生第二图像。
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公开(公告)号：US20150010852A1
公开(公告)日：2015-01-08
申请号：US14217976
申请日：2014-03-18
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jong-Keun OH , Hyung-Ho KO , Byung-Gook KIM , Jae-Hyuck CHOI , Jun-Youl CHOI
IPC: G03F1/48
Abstract: A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern, wherein a top of the protective layer pattern is exposed.
Abstract translation: 光掩模包括透明基板，形成在基板上的掩模图案以及覆盖掩模图案的侧壁的保护层图案，其中保护层图案的顶部被暴露。
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公开(公告)号：US20200150539A1
公开(公告)日：2020-05-14
申请号：US16445969
申请日：2019-06-19
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jong-Keun OH , Kyoung-Noh KIM , Man-Kyu KANG , Byung-Gook KIM
Abstract: A chemical supply structure includes a bar-shaped body having a plurality of chemical reservoirs in which a plurality of chemicals is individually stored such that the body partially crosses an underlying substrate, a bar-shaped nozzle protruded from a bottom surface of the body and injecting injection chemicals onto the substrate, a plurality of the chemicals being mixed into the injection chemicals, and a hydrophobic unit arranged on the bottom surface of the body and on a side surface of the nozzle such that a mixed solution mixed with the injection chemicals is prevented from adhering to the bottom surface and the side surface by controlling a contact angle of the mixed solution with respect to the bottom surface and the side surface.
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Patent Agency Ranking
公开(公告)号：US20170371573A1
公开(公告)日：2017-12-28
申请号：US15583256
申请日：2017-05-01
Applicant: Samsung Electronics Co., Ltd.
Inventor： Chansol KIM , Byung-Gook KIM , Jisoo KIM , Jin-Hwan PARK , Pilsung KANG , Kyung Ho KIM , Chaewon YU , Sojeong LEE , Bongjun CHOI , Taeseok HWANG
CPC classification number: G06F3/0622 , G06F3/0619 , G06F3/0644 , G06F3/065 , G06F3/0679 , G06F12/1441 , G06F21/44
Abstract: A method of operating a host controlling a storage medium includes receiving initial authentication information; setting a portion of a storage space of the storage medium as a protection area; transmitting the received initial authentication information and protection area information with respect to the protection area to the storage medium; and discarding the initial authentication information in the host.
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5.发明申请METHOD OF MANUFACTURING PELLICLE ASSEMBLY AND METHOD OF PHOTOMASK ASSEMBLY INCLUDING THE SAME 审中-公开制造薄膜组件的方法和包括其的光电组件的方法公开(公告)号：US20160355001A1
公开(公告)日：2016-12-08
申请号：US15014054
申请日：2016-02-03
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： MUN JA KIM , Byung-Gook KIM , HWAN CHUL JEON , Ji-Beom YOO , Dong-Wook SHIN , Taesung KIM , Sooyoung KIM
CPC classification number: B32B37/025 , B32B37/0038 , B32B37/12 , B32B37/14 , B32B38/10 , B32B2038/166 , B32B2305/026 , B32B2457/08 , G03F1/62 , H01L21/00
Abstract: A method of manufacturing a pellicle assembly, the method including attaching a carbon-containing thin film onto a transfer membrane in a wet atmosphere; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame.
Abstract translation: 一种制造防护薄膜组件的方法，所述方法包括在湿气氛中将含碳薄膜附着在转移膜上; 在含碳薄膜附着在转印膜上的同时，将干燥气氛中的含碳薄膜附着在防尘薄膜组件框架上; 并且在含碳薄膜附着到防护薄膜框架上的同时将转移膜与含碳薄膜分离。
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公开(公告)号：US20160342079A1
公开(公告)日：2016-11-24
申请号：US15225918
申请日：2016-08-02
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jong-Keun OH , Hyung-Ho KO , Byung-Gook KIM , Jae-Hyuck CHOI , Jun-Youl CHOI
IPC: G03F1/48
Abstract: A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern, wherein a top of the protective layer pattern is exposed.
Abstract translation: 光掩模包括透明基板，形成在基板上的掩模图案以及覆盖掩模图案的侧壁的保护层图案，其中保护层图案的顶部被暴露。
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公开(公告)号：US20160201201A1
公开(公告)日：2016-07-14
申请号：US14969645
申请日：2015-12-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Mun-Ja KIM , Tae-Sung KIM , Ji-Beom YOO , Byung-Gook KIM , Soo-Young KIM , Dong-Wook SHIN , Jae-Hyuck CHOI
IPC: C23F1/14
CPC classification number: G03F1/62 , C01B32/182 , C01B32/194 , C01B32/20 , C23C16/01 , C23C16/26 , C23C16/56 , C23F1/00 , C23F1/02 , C23F1/14 , G03F1/64
Abstract: A method of manufacturing a pellicle includes forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst, forming a protective pattern on a second surface of the substrate, immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame, and replacing the etchant solution with a solvent.
Abstract translation: 防护薄膜组件的制造方法包括：从基板作为催化剂的化学反应在基板的第一面上形成膜，在基板的第二面上形成保护图案，将基板浸渍在蚀刻液中， 使得通过保护图案曝光的基板的一部分被去除以形成框架，并用溶剂替换蚀刻剂溶液。
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8.发明申请METHOD FOR GROUPING REGION OF INTEREST OF MASK PATTERN AND MEASURING CRITICAL DIMENSION OF MASK PATTERN USING THE SAME 有权用于分类掩模区域的方法和使用其掩蔽图案的尺寸关键尺寸公开(公告)号：US20160077517A1
公开(公告)日：2016-03-17
申请号：US14710872
申请日：2015-05-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hyung-Joo LEE , Won-Joo PARK , Seuk-Hwan CHOI , Byung-Gook KIM , Dong-Hoon CHUNG
IPC: G05B19/4097 , G06T7/00
CPC classification number: G06T7/0004 , G05B2219/45027 , G06T2207/10061 , G06T2207/30148
Abstract: A method for measuring a critical dimension of a mask pattern, including generating a mask pattern using an optically proximity-corrected (OPC) mask design including at least one block; measuring a first critical dimension of a target-region of interest (target-ROI) including neighboring blocks having a same critical dimension (CD), in the mask pattern; determining a group region of interest including the target-ROI and at least one neighboring block adjacent to the target-ROI; measuring second CDs of the neighboring blocks of the group region of interest; and correcting a measuring value of the first CD using a measuring value of the second CDs.
Abstract translation: 一种用于测量掩模图案的临界尺寸的方法，包括使用包括至少一个块的光学邻近校正（OPC）掩模设计来生成掩模图案; 在掩模图案中测量包括具有相同临界尺寸（CD）的相邻块的感兴趣目标区域（目标 - ROI）的第一临界尺度; 确定包括所述目标ROI的关注组群以及与所述目标ROI相邻的至少一个相邻块; 测量感兴趣的组区域的相邻块的第二CD; 以及使用所述第二CD的测量值来校正所述第一CD的测量值。
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