SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
    2.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
    半导体器件及其制造方法

    公开(公告)号:US20150155377A1

    公开(公告)日:2015-06-04

    申请号:US14320037

    申请日:2014-06-30

    Inventor: Che-heung KIM

    Abstract: A semiconductor device and a method of manufacturing the semiconductor device are provided. The semiconductor device is a half bridged field effect transistor having a monolithic chip, and includes a semiconductor substrate with a 2-dimensional electron gas layer formed therein; a drain electrode formed on the semiconductor substrate; a first gate electrode, an output electrode, a second gate electrode, and a source electrode. The method of manufacturing the semiconductor device uses a method of monolithically forming a stack structure, which implements a half bridge function, on a substrate according to semiconductor processes.

    Abstract translation: 提供半导体器件和制造半导体器件的方法。 半导体器件是具有单片芯片的半桥场效应晶体管,并且包括其中形成有二维电子气层的半导体衬底; 形成在半导体衬底上的漏电极; 第一栅电极,输出电极,第二栅电极和源电极。 半导体器件的制造方法使用根据半导体工艺在衬底上单片地形成实现半桥功能的堆叠结构的方法。

Patent Agency Ranking