Electronic device
    5.
    发明授权

    公开(公告)号:US10371969B2

    公开(公告)日:2019-08-06

    申请号:US15671369

    申请日:2017-08-08

    Abstract: An electronic device includes: an anode and a cathode facing each other; a quantum dot emission layer disposed between the anode and the cathode and including a plurality of quantum dots; and a light emitting source, wherein the quantum dot emission layer is configured to receive electrical energy from the anode and the cathode and to emit light having a first wavelength, wherein the quantum dot emission layer and the light emitting source are configured so that the light emitting source provides the quantum emission layer with light having a second wavelength, and the plurality of quantum dots are excited by the light having the second wavelength and emit light having a third wavelength, wherein the anode, the cathode, or a combination thereof is a light transmitting electrode, and the light of the first wavelength and the light of the third wavelength are emitted through the light transmitting electrode.

    Methods of forming semiconductor films and methods of manufacturing transistors including semiconductor films
    6.
    发明授权
    Methods of forming semiconductor films and methods of manufacturing transistors including semiconductor films 有权
    形成半导体膜的方法和制造包括半导体膜的晶体管的方法

    公开(公告)号:US09384973B2

    公开(公告)日:2016-07-05

    申请号:US14293187

    申请日:2014-06-02

    Abstract: Provided are semiconductor films, methods of forming the same, transistors including the semiconductor films, and methods of manufacturing the transistors. Provided are a semiconductor film including zinc (Zn), nitrogen (N), oxygen (O), and fluorine (F), and a method of forming the semiconductor film. Provided are a semiconductor film including zinc, nitrogen, and fluorine, and a method of forming the semiconductor film. Sputtering, ion implantation, plasma treatment, chemical vapor deposition (CVD), or a solution process may be used in order to form the semiconductor films. The sputtering may be performed by using a zinc target and a reactive gas including fluorine. The reactive gas may include nitrogen and fluorine, or nitrogen, oxygen, and fluorine.

    Abstract translation: 提供半导体膜,其形成方法,包括半导体膜的晶体管以及制造晶体管的方法。 提供了包括锌(Zn),氮(N),氧(O)和氟(F))的半导体膜以及形成半导体膜的方法。 提供了包括锌,氮和氟的半导体膜,以及形成半导体膜的方法。 可以使用溅射,离子注入,等离子体处理,化学气相沉积(CVD)或溶液工艺来形成半导体膜。 可以通过使用锌靶和包括氟的反应性气体来进行溅射。 反应性气体可以包括氮和氟,或氮,氧和氟。

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