公开(公告)号：US09343361B2

公开(公告)日：2016-05-17

申请号：US14072777

申请日：2013-11-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ho-Jin Lee ,  Tae-Je Cho ,  Dong-Hyeon Jang ,  Ho-Geon Song ,  Se-Young Jeong ,  Un-Byoung Kang ,  Min-Seung Yoon

IPC: H01L21/76 ,  H01L21/326 ,  H01L21/768 ,  H01L23/48 ,  H01L25/065 ,  H01L23/525

CPC classification number: H01L23/49844 ,  H01L21/76831 ,  H01L21/76844 ,  H01L21/76898 ,  H01L23/481 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/49838 ,  H01L23/525 ,  H01L25/0657 ,  H01L2224/02372 ,  H01L2224/05009 ,  H01L2224/13025 ,  H01L2224/16 ,  H01L2224/16145 ,  H01L2224/16227 ,  H01L2224/17181 ,  H01L2225/06513 ,  H01L2225/06544 ,  H01L2924/15311

Abstract: In one embodiment, a semiconductor device includes a semiconductor substrate having a first surface, and a second surface opposite to the first surface. The second surface defines a redistribution trench. The substrate has a via hole extending therethrough. The semiconductor device also includes a through via disposed in the via hole. The through via may include a via hole insulating layer, a barrier layer, sequentially formed on an inner wall of the via hole. The through via may further include a conductive connector adjacent the barrier layer. The semiconductor device additionally includes an insulation layer pattern formed on the second surface of the substrate. The insulation layer pattern defines an opening that exposes a region of a top surface of the through via. The semiconductor devices includes a redistribution layer disposed in the trench and electrically connected to the through via. The insulation layer pattern overlaps a region of the conductive connector.