公开(公告)号：US20180144995A1

公开(公告)日：2018-05-24

申请号：US15702870

申请日：2017-09-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Young-Duk Kim ,  Byeong-Hwan Jeon ,  Kyung-Sik Kang ,  Kang-Woong Ko ,  Soo-Ryong Kim ,  Tae-Joong Kim ,  Jun-Bum Park ,  Gil-Woo Song ,  Sung-Ho Jang ,  Hyoung-Jo Jeon ,  Jae-Chol Joo

IPC: H01L21/66 ,  H01L21/78 ,  G01B11/06 ,  G01B11/02 ,  G01N21/88 ,  G01N21/95

CPC classification number: H01L22/12 ,  G01B11/022 ,  G01B11/06 ,  G01B11/0633 ,  G01B2210/56 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8845 ,  G01N2021/8848 ,  H01L21/78

Abstract: An optical inspection apparatus includes a broadband light source, a monochromator, an image obtaining apparatus, and an analysis device. The monochromator is configured to convert light from the broadband light source into a plurality of monochromatic beams of different wavelengths and sequentially output the monochromatic beams, where each beam has a preset wavelength width and corresponds to one of a plurality of different wavelength regions. The image obtaining apparatus is configured to allow each monochromatic beam output from the monochromator to be incident to a top surface of an inspection target without using a beam splitter, allow light reflected by the inspection target to travel in a form of light of an infinite light source, and generate 2D images of the inspection target. The analysis device is configured to analyze the 2D images of the inspection target in the plurality of wavelength regions.

公开(公告)号：US09267879B2

公开(公告)日：2016-02-23

申请号：US14291764

申请日：2014-05-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kang-woong Ko ,  Hyoung-Jo Jeon ,  Gil-Woo Song

IPC: G01J4/00 ,  G01N21/01 ,  G01B11/08 ,  G01N21/21

CPC classification number: G01N21/211 ,  G01N2021/213 ,  G01N2021/214

Abstract: An ellipsometer for detecting a surface including a light source irradiating a substrate with light, a polarization unit polarizing the light irradiated from the light source and analyzing the polarized light, a detector measuring a light quantity of the polarized light passing through the polarization unit, and a driver rotating the detector by an azimuth angle as the substrate rotates in a direction of the azimuth angle direction may be provided.

Abstract translation: 一种用于检测包括用光照射衬底的光源的表面的椭偏仪，将从光源照射的光偏振并分析偏振光的偏振单元，测量通过偏振单元的偏振光的光量的检测器，以及 可以提供当基板沿着方位角方向的方向旋转时将检测器旋转方位角的驱动器。

公开(公告)号：US20170200658A1

公开(公告)日：2017-07-13

申请号：US15366964

申请日：2016-12-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yusin Yang ,  Kang-Woong Ko ,  Sung Yoon Ryu ,  Gil-Woo Song ,  Sangkil Lee ,  Chungsam Jun ,  HyoungJo Jeon ,  Masahiro Horie

IPC: H01L21/66 ,  G01N21/27 ,  G01N21/95

Abstract: A method of inspecting a substrate includes irradiating light onto a substrate that has experienced a first process, obtaining spectral data of the light reflected from the substrate, detecting a defect region of the substrate from the spectral data, and extracting a first defect site that occurred in or during the first process from the defect region. Extracting the first defect site includes establishing an effective area where the first process affects the substrate, and extracting a superimposed area that is overlapped with the effective area from the defect region. The superimposed area is defined as the first defect site.