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1.发明申请公开(公告)号：US20170200658A1
公开(公告)日：2017-07-13
申请号：US15366964
申请日：2016-12-01
Applicant: Samsung Electronics Co., Ltd.
Inventor： Yusin Yang , Kang-Woong Ko , Sung Yoon Ryu , Gil-Woo Song , Sangkil Lee , Chungsam Jun , HyoungJo Jeon , Masahiro Horie
Abstract: A method of inspecting a substrate includes irradiating light onto a substrate that has experienced a first process, obtaining spectral data of the light reflected from the substrate, detecting a defect region of the substrate from the spectral data, and extracting a first defect site that occurred in or during the first process from the defect region. Extracting the first defect site includes establishing an effective area where the first process affects the substrate, and extracting a superimposed area that is overlapped with the effective area from the defect region. The superimposed area is defined as the first defect site.
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公开(公告)号：US20160153915A1
公开(公告)日：2016-06-02
申请号：US14955635
申请日：2015-12-01
Applicant: Samsung Electronics Co., Ltd.
Inventor： Kang-woong Ko , Sung-yoon Ryu , Young-hoon Sohn , Gil-woo Song , Tae-heung Ahn , Hyoung-jo Jeon , Sang-kyeong Han , Masahiro Horie , Woo-seok Ko , Yu-sin Yang , Sang-kil Lee , Byeong-hwan Jeon
CPC classification number: G01N21/8806 , G01J4/00 , G01J2004/001 , G01N21/21 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/213 , G01N2021/8848
Abstract: A surface inspecting method includes: irradiating an incident light beam of a first polarized state on a target object, the incident light beam comprising parallel light and having a cross-sectional area: measuring a second polarized state of a reflected light beam reflected from the target object; and performing inspection on an entire area of the target object on which the incident light beam is irradiated, based on a variation between the first polarized state and the second polarized state.
Abstract translation: 表面检查方法包括：在目标物体上照射第一偏振态的入射光束，入射光束包括平行光并具有横截面积：测量从目标反射的反射光束的第二偏振状态 目的; 并且基于第一极化状态和第二极化状态之间的变化，对照射入射光的目标物体的整个区域进行检查。
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公开(公告)号：US10001444B2
公开(公告)日：2018-06-19
申请号：US14955635
申请日：2015-12-01
Applicant: Samsung Electronics Co., Ltd.
Inventor： Kang-woong Ko , Sung-yoon Ryu , Young-hoon Sohn , Gil-woo Song , Tae-heung Ahn , Hyoung-jo Jeon , Sang-kyeong Han , Masahiro Horie , Woo-seok Ko , Yu-sin Yang , Sang-kil Lee , Byeong-hwan Jeon
IPC: G01N21/88 , G01J4/00 , G01N21/21 , G01N21/956 , G01N21/95
CPC classification number: G01N21/8806 , G01J4/00 , G01J2004/001 , G01N21/21 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/213 , G01N2021/8848
Abstract: A surface inspecting method includes: irradiating an incident light beam of a first polarized state on a target object, the incident light beam comprising parallel light and having a cross-sectional area: measuring a second polarized state of a reflected light beam reflected from the target object; and performing inspection on an entire area of the target object on which the incident light beam is irradiated, based on a variation between the first polarized state and the second polarized state.
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