SUBSTRATE SUPPORTER
    4.
    发明公开
    SUBSTRATE SUPPORTER 审中-公开

    公开(公告)号:US20240321619A1

    公开(公告)日:2024-09-26

    申请号:US18439492

    申请日:2024-02-12

    CPC classification number: H01L21/6833 H01L21/67288 H01L21/02271

    Abstract: The present disclosure relates to substrate supporters and substrate processing apparatuses. An example substrate supporter includes an upper surface on which a substrate is loaded, a base, an outer dam extending along an edge of the base, a contact band connected with the outer dam, extending along the circumferential direction of the base, and onto which the substrate is loaded, and a first contact pattern disposed adjacent to the contact band and extending into an inside of the contact band, the first contact pattern extending along the circumferential direction of the base, where an area of the first contact pattern is larger than an area where the contact band overlaps with the substrate.

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