FILM PACKAGE AND PACKAGE MODULE INCLUDING THE SAME

    公开(公告)号:US20230369265A1

    公开(公告)日:2023-11-16

    申请号:US18100859

    申请日:2023-01-24

    Inventor: Narae SHIN

    Abstract: A film package includes a base film including peripheral regions on opposite ends of the base film in a width direction and extending in a lengthwise direction, an inner region between the peripheral regions and extending in the lengthwise direction, and sprocket holes provided on the peripheral regions at a regular interval in the lengthwise direction, and a unit film package provided on the base film and defined by a cut line, the unit film package including a mount region on the inner region and a connection region provided in the lengthwise direction from the mount region, the connection region extending from the inner region toward a location between the sprocket holes in the lengthwise direction.

    SEMICONDUCTOR PACKAGE AND PACKAGE MODULE INCLUDING THE SAME

    公开(公告)号:US20240413071A1

    公开(公告)日:2024-12-12

    申请号:US18623666

    申请日:2024-04-01

    Abstract: Provided is a semiconductor package including a film substrate including a sprocket hole, a semiconductor chip on the film substrate, interconnection lines connected to the semiconductor chip, a dummy pattern between the sprocket hole and the semiconductor chip, and a cutting pattern between the semiconductor chip and the dummy pattern, wherein the cutting pattern is spaced apart from the interconnection lines and the dummy pattern in a first direction.

    CHIP-ON-FILM PACKAGE
    4.
    发明公开

    公开(公告)号:US20240321712A1

    公开(公告)日:2024-09-26

    申请号:US18607849

    申请日:2024-03-18

    Inventor: Narae SHIN

    Abstract: A chip-on-film (COF) package including a base film having facing first and second surfaces; a first upper pattern on the first surface and extending in a first direction; second upper patterns on the first surface, the second upper patterns including inner patterns and outer patterns that are spaced apart from each other in the first direction; an upper insulating layer covering the first upper pattern and part of the second upper patterns; lower patterns on the second surface and electrically connecting the inner patterns to the outer patterns; and inner via plugs passing through the base film and electrically connecting the inner patterns of the second upper patterns to the lower patterns, wherein at least one inner pattern is electrically connected to the inner via plug in a region that is not covered by the upper insulating layer.

Patent Agency Ranking