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公开(公告)号：US11538660B2
公开(公告)日：2022-12-27
申请号：US17242019
申请日：2021-04-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Yoong Chung , Nam Kyun Kim , Naohiko Okunishi , Kyung-Sun Kim , Seung Bo Shim , Sang-Ho Lee , Kang Min Jeon
IPC: H01J37/32 , H01L21/311
Abstract: A plasma processing apparatus includes; a chamber, a lower electrode disposed within the chamber and including a lower surface and an opposing upper surface configured to seat a wafer, an RF rod disposed on the lower surface of the lower electrode and extending in a vertical direction. The RF plate includes a first portion contacting the lower surface of the lower electrode, a second portion protruding from the first portion towards the RF rod, and a third portion extending from the second portion to connect the RF rod. A grounding electrode is spaced apart from the RF plate and at least partially surrounds a side wall of the RF rod and a side wall of the second portion of the RF plate. The grounding electrode includes a first grounding electrode facing each of the side wall of the RF rod and the second portion of the RF plate, and a second grounding electrode at least partially surrounding the first grounding electrode, and configured to horizontally rotate.
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公开(公告)号：US11019130B2
公开(公告)日：2021-05-25
申请号：US16116230
申请日：2018-08-29
Applicant: Samsung Electronics Co., Ltd.
Inventor： Chi-Hong Cho , Dong-Keon Kong , Sang-Ho Lee
Abstract: A method for remotely controlling a home device in a mobile terminal is provided. The method includes receiving a chat message input to the mobile terminal for controlling at least one home device through an instant messenger application installed in the mobile terminal, and sending the chat message to a messenger server. The sent chat message is converted into a control command, which is sent to the home device.
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公开(公告)号：US11018408B2
公开(公告)日：2021-05-25
申请号：US15323918
申请日：2015-07-03
Applicant: Samsung Electronics Co., Ltd.
Inventor： Won-Bin Hong , Kwang-Hyun Baek , Sang-Ho Lee , Joon-Young Choi
Abstract: The present disclosure relates to a pre-5th-Generation (5G) or 5G communication system to be provided for supporting higher data rates Beyond 4th-Generation (4G) communication system such as Long Term Evolution (LTE). An apparatus comprising an antenna includes a board having a stack structure, wherein the board comprises a first layer and a second layer, and at least one radiating unit disposed between the first layer and the second layer. Further, the present invention also includes embodiments different from the above-described embodiment.
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4.发明申请公开(公告)号：US20170164834A1
公开(公告)日：2017-06-15
申请号：US15378969
申请日：2016-12-14
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jae-Hyun PARK , Jun-Ho Koh , Seong-Jun Song , Sang-Ho Lee , Yong-Chan Lee , Jae-Ho Jung
CPC classification number: A61B5/0028 , A61B5/4839 , A61B5/6833 , A61B5/6843 , G16H40/63
Abstract: An electronic device and a method for transmitting health information by the electronic device are provided. The method includes receiving, from a terminal, a first message requesting the health information; measuring a body condition, in response the first message; and transmitting, to the terminal, a second message including the health information by using human body communication, the health information being based on the measured body condition.
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公开(公告)号：US11384433B2
公开(公告)日：2022-07-12
申请号：US17159244
申请日：2021-01-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Minkyu Sung , Sung-Ki Lee , Dougyong Sung , Sang-Ho Lee , Kangmin Jeon
IPC: H01L21/67 , C23C16/455 , H01L21/683 , H01J37/32 , C23C16/509
Abstract: A gas injection module includes a showerhead having first injection holes on a first region of the showerhead and second injection holes on a second region of the showerhead, the second region being outside the first region, a first distribution plate on the showerhead and having first and second upper passages respectively connected to the first and second injection holes, and a flow rate controller on the first and second upper passages of the first distribution plate. The flow rate controller reduces a difference in pressure within the first and second upper passages so that the gas may have similar flow rates within the first and second injection holes.
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Patent Agency Ranking
公开(公告)号：US10934621B2
公开(公告)日：2021-03-02
申请号：US16509946
申请日：2019-07-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Minkyu Sung , Sung-Ki Lee , Dougyong Sung , Sang-Ho Lee , Kangmin Jeon
IPC: C23C16/455 , H01L21/683 , H01J37/32 , C23C16/509
Abstract: A gas injection module includes a showerhead having first injection holes on a first region of the showerhead and second injection holes on a second region of the showerhead, the second region being outside the first region, a first distribution plate on the showerhead and having first and second upper passages respectively connected to the first and second injection holes, and a flow rate controller on the first and second upper passages of the first distribution plate. The flow rate controller reduces a difference in pressure within the first and second upper passages so that the gas may have similar flow rates within the first and second injection holes.
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公开(公告)号：US10091272B2
公开(公告)日：2018-10-02
申请号：US14477261
申请日：2014-09-04
Applicant: Samsung Electronics Co., Ltd.
Inventor： Chi-Hong Cho , Dong-Keon Kong , Sang-Ho Lee
Abstract: A method for remotely controlling a home device in a mobile terminal is provided. The method includes receiving a chat message input to the mobile terminal for controlling at least one home device through an instant messenger application installed in the mobile terminal, and sending the chat message to a messenger server. The sent chat message is converted into a control command, which is sent to the home device.
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公开(公告)号：US10804120B2
公开(公告)日：2020-10-13
申请号：US15652345
申请日：2017-07-18
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Seong-Moon Ha , Min-Kyu Sung , Seung-Hee Cho , Seong-Chul Choi , Kyung-Sun Kim , Sang-Ho Lee
Abstract: A temperature controller of a plasma-processing apparatus including a heating unit and a cooling unit. The heating unit is configured to heat a liner on an inner surface of a plasma chamber in which a plasma is formed. The cooling unit is configured to cool the liner to controls a temperature of an upper electrode in the plasma chamber.
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公开(公告)号：US20170155185A1
公开(公告)日：2017-06-01
申请号：US15323918
申请日：2015-07-03
Applicant: Samsung Electronics Co., Ltd.
Inventor： Won-Bin Hong , Kwang-Hyun Baek , Sang-Ho Lee , Joon-Young Choi
CPC classification number: H01Q1/2283 , H01L2224/16225 , H01Q1/24 , H01Q1/242 , H01Q1/243 , H01Q1/38 , H01Q7/00 , H01Q9/0421 , H01Q9/42 , H01Q15/0086
Abstract: The present disclosure relates to a pre-5th-Generation (5G) or 5G communication system to be provided for supporting higher data rates Beyond 4th-Generation (4G) communication system such as Long Term Evolution (LTE). An apparatus comprising an antenna includes a board having a stack structure, wherein the board comprises a first layer and a second layer, and at least one radiating unit disposed between the first layer and the second layer. Further, the present invention also includes embodiments different from the above-described embodiment.
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10.发明申请公开(公告)号：US20220172926A1
公开(公告)日：2022-06-02
申请号：US17443535
申请日：2021-07-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Dong Wan Kim , Beom Rae Kim , Dong Hyeon Na , Young Jin Noh , Seung Bo Shim , Sang-Ho Lee , Yong Woo Lee , Jun Ho Lee , Dong Hee Han
IPC: H01J37/32
Abstract: A method for fabricating a semiconductor device includes providing a wafer on a lower electrode inside a plasma processing apparatus. A first power having a first and second frequency is provided to the lower electrode. A second power is provided to an RF induction electrode through the lower electrode. A third power having the second frequency is released outside of a chamber. A plasma process is performed on the wafer while the third power is released. The RF induction electrode is disposed inside an insulating plate surrounding a sidewall of the lower electrode. The RF induction electrode is spaced apart front the lower electrode. The RF induction electrode has an annular shape surrounding the sidewall of the lower electrode. The first power is controlled by a first controller, and the third power is controlled by a second controller different from the first controller.
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