PLASMA PROCESSING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

    公开(公告)号:US20220172926A1

    公开(公告)日:2022-06-02

    申请号:US17443535

    申请日:2021-07-27

    Abstract: A method for fabricating a semiconductor device includes providing a wafer on a lower electrode inside a plasma processing apparatus. A first power having a first and second frequency is provided to the lower electrode. A second power is provided to an RF induction electrode through the lower electrode. A third power having the second frequency is released outside of a chamber. A plasma process is performed on the wafer while the third power is released. The RF induction electrode is disposed inside an insulating plate surrounding a sidewall of the lower electrode. The RF induction electrode is spaced apart front the lower electrode. The RF induction electrode has an annular shape surrounding the sidewall of the lower electrode. The first power is controlled by a first controller, and the third power is controlled by a second controller different from the first controller.

    Semiconductor devices with alignment keys

    公开(公告)号:US10332842B2

    公开(公告)日:2019-06-25

    申请号:US16026937

    申请日:2018-07-03

    Abstract: A semiconductor device includes an alignment key on a substrate. The alignment key includes a first sub-alignment key pattern with a first conductive pattern, a second conductive pattern, and a capping dielectric pattern that are sequentially stacked on the substrate, an alignment key trench that penetrates at least a portion of the first sub-alignment key pattern, and a lower conductive pattern in the alignment key trench. The alignment key trench includes an upper trench that is provided in the capping dielectric pattern that has a first width, and a lower trench that extends downward from the upper trench and that has a second width less than the first width. The lower conductive pattern includes sidewall conductive patterns that are separately disposed on opposite sidewalls of the lower trench.

    Semiconductor memory device and method of fabricating the same

    公开(公告)号:US11114440B2

    公开(公告)日:2021-09-07

    申请号:US16805066

    申请日:2020-02-28

    Abstract: Provided are a semiconductor memory device and a method of fabricating the same. The semiconductor memory device may include: a first impurity doped region and a second impurity doped region spaced apart from each other in a semiconductor substrate, a bit line electrically connected to the first impurity doped region and crossing over the semiconductor substrate, a storage node contact electrically connected to the second impurity doped region, a first spacer and a second spacer disposed between the bit line and the storage node contact, and an air gap region disposed between the first spacer and the second spacer. The first spacer may cover a sidewall of the bit line, and the second spacer may be adjacent to the storage node contact. A top end of the first spacer may have a height higher than a height of a top end of the second spacer.

    Dishwasher and method for controlling same

    公开(公告)号:US10702122B2

    公开(公告)日:2020-07-07

    申请号:US15108676

    申请日:2014-12-30

    Abstract: Disclosed is a dishwasher comprising: a tub for containing dishes; a nozzle assembly for ejecting washing water; a vane assembly for changing the path of the washing water, while moving from a first position to a second position inside the tub, such that the ejected washing water is directed towards the dishes; and a controller for stopping the vane assembly, changing the movement speed of the vane assembly, or changing the movement direction of the vane assembly while the vane assembly moves from the first position to the second position, wherein the washing water can also be ejected to corner portions of the tub.

    Dish washer and method for controlling same

    公开(公告)号:US10244918B2

    公开(公告)日:2019-04-02

    申请号:US15976996

    申请日:2018-05-11

    Abstract: Provided are a dish washing machine capable of effectively removing garbage which remains at the bottom of a washing tub and a filter and a method of controlling the same. When washing water is sprayed from a nozzle while a vane is positioned at a reference position during a drainage operation, since a deflection angle of the vane is bent back and the washing water is strongly sprayed toward a rear wall of a washing tub, the washing water may form a fast and strong water current over a bottom plate of the washing tub, and the fast and strong water current may remove garbage which remains at a filter while flowing over the bottom of the washing tub. Also, even when an excessive amount of garbage is accumulated at a filter at a top end of a sump and blocks the filter during a washing operation such as preliminary washing, main washing, etc., the filter is automatically washed using a small amount of water, thereby eliminating inconvenience of a user to directly separate and wash the filter. Also, washing performance may be effectively improved by precisely determining whether degradation in washing performance caused by a poor circulation of washing water occurs due to a filter blockage or generation of bubbles.

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