公开(公告)号：US20160155500A1

公开(公告)日：2016-06-02

申请号：US14830377

申请日：2015-08-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Man CHANG ,  In-gyu BAEK ,  Sang-heon LEE ,  Hyun-sang HWANG

IPC: G11C13/00

CPC classification number: G11C13/0069 ,  G11C11/5678 ,  G11C11/5685 ,  G11C13/0064 ,  G11C2013/0092

Abstract: A method of controlling a resistive memory device includes: accessing a first pulse power specification satisfying a memory cell coefficient associated with at least a first of a plurality of memory cells included in a memory cell array; generating a first pulse power according to the accessed first pulse power specification; and performing a write operation on at least the first of the plurality of memory cells using the generated first pulse power.

Abstract translation: 控制电阻式存储器件的方法包括：访问满足存储单元阵列中包含的多个存储器单元中的至少第一个存储单元系数的第一脉冲功率规范; 根据所访问的第一脉冲功率规格产生第一脉冲功率; 以及使用所生成的第一脉冲功率对所述多个存储单元中的至少所述第一存储单元执行写入操作。

公开(公告)号：US20180374709A1

公开(公告)日：2018-12-27

申请号：US15870227

申请日：2018-01-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Gon-jun KIM ,  Yuri BARSUKOV ,  Vladimir VOLYNETS ,  Dali LIU ,  Sang-jin AN ,  Beom-jin YOO ,  Sang-heon LEE ,  Shamik PATEL

IPC: H01L21/3065 ,  H01L21/02 ,  H01J37/32

CPC classification number: H01L21/3065 ,  H01J37/32009 ,  H01L21/02164 ,  H01L21/02315 ,  H01L21/31116

Abstract: An etching method using a remote plasma source (RPS) and a method of fabricating a semiconductor device, the etching method including generating a plasma by supplying a process gas to at least one RPS and applying power to the at least one RPS; and etching a first material film including SiNx by supplying the plasma and at least one control gas selected from HBr, HCl, HI, NH3, SiH4, CHF3, and CH2F2 to a process chamber.

公开(公告)号：US20150143378A1

公开(公告)日：2015-05-21

申请号：US14261649

申请日：2014-04-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang-heon LEE ,  Soo-jung RYU ,  Yeon-gon CHO

IPC: G06F9/48 ,  G06F9/50

CPC classification number: G06F9/5027 ,  Y02D10/22

Abstract: Provided are a multi-thread processing apparatus and method for sequentially processing threads. The multi-thread processing method includes scheduling, at a processor, one of a plurality of thread groups allocated by a job distributor, determining whether the thread group has been initialized based on an examination an uninitialized flag of the scheduled thread group, generating a thread group descriptor for the scheduled thread group and initializing the thread group based on the determination of whether the thread group has been initialized, and initializing a thread descriptor based on a determination of whether initialization is needed and sequentially executing each thread in the scheduled thread group.

Abstract translation: 提供了一种用于顺序处理线程的多线程处理设备和方法。 多线程处理方法包括在处理器中调度由作业分配器分配的多个线程组中的一个，基于检查所调度的线程组的未初始化标志来确定线程组是否已被初始化，生成线程 基于确定线程组是否被初始化以及基于是否需要初始化并且顺序地执行调度的线程组中的每个线程来初始化线程描述符来初始化线程组。