公开(公告)号：US11946138B2

公开(公告)日：2024-04-02

申请号：US17543807

申请日：2021-12-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaeheung Lee ,  Junseong Park ,  Kanghun Lee ,  Seongwan Kim ,  Hyouncheol Kim

IPC: C23C16/455 ,  C23C16/52 ,  H01L21/67 ,  C23C16/44 ,  F16K1/36 ,  F16K31/126 ,  F16K51/02

CPC classification number: C23C16/45525 ,  C23C16/52 ,  H01L21/67017 ,  H01L21/67253 ,  C23C16/4412 ,  C23C16/45546 ,  F16K1/36 ,  F16K31/126 ,  F16K51/02

Abstract: A vacuum valve includes a valve flange having a first port, a second port, and a valve seat in a space between the first port and the second port, a valve body in the valve flange, the valve body having a contact surface facing the valve seat, and the valve body being moveable to have the contact surface contact the valve seat and to be separated from the valve seat, a disk on the contact surface of the valve body, the disk having an inclined surface inclined toward the second port, and an actuator connected to the valve flange, the actuator being configured to apply a driving force to the valve body to move the contact surface of the valve body into or out of contact with the valve seat.

公开(公告)号：US20240318307A1

公开(公告)日：2024-09-26

申请号：US18611936

申请日：2024-03-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byunghwan Kong ,  Heesun Song ,  Seongwan Kim ,  Heeyeon Kim ,  Seongho Park ,  Hyunho Choi

IPC: C23C16/44

CPC classification number: C23C16/4412 ,  H01L21/67017

Abstract: Provided is a substrate processing device including a first tube configured to load a substrate in an interior space thereof, a second tube configured to include the first tube therein, and a process gas supply line configured to inject process gas to the interior space of the first tube, wherein the first tube has a plurality of exhaust holes penetrating a sidewall of the first tube, the plurality of exhaust holes include a main exhaust hole and a multi-exhaust hole region disposed in a line in the vertical direction, the multi-exhaust hole region includes a plurality of auxiliary exhaust holes, and the height of each of the plurality of auxiliary exhaust holes is less than the height of the main exhaust hole.