SYSTEM COMPRISING ELECTRONIC DEVICE AND BATTERY CHARGING DEVICE, AND OPERATION METHOD THEREFOR

    公开(公告)号:US20220158466A1

    公开(公告)日:2022-05-19

    申请号:US17421419

    申请日:2020-01-21

    IPC分类号: H02J7/00

    摘要: An electronic device, according to one embodiment of the present invention, comprises: a housing; a drive unit for moving the housing; a battery mounting unit formed in the housing so as to enable the placement of batteries, the battery mounting unit comprising a first slot enabling the placement of a first battery, and a second slot enabling the placement of a second battery; a separator device, disposed on the battery mounting unit, for separating the first battery from the first slot or separating the second battery from the second slot; and a processor electrically connected to the drive unit and the separator device, wherein the processor may control the separator device so that same separates the second battery from the second slot when the first battery is placed in the first slot, and separates the first battery from the first slot when the second battery is placed in the second slot. In addition, other various embodiments are possible.

    SEMICONDUCTOR DEVICES
    3.
    发明申请

    公开(公告)号:US20230065281A1

    公开(公告)日:2023-03-02

    申请号:US17751819

    申请日:2022-05-24

    摘要: A semiconductor device including a first insulating structure on a substrate and including a first etch stop layer and a first interlayer insulating layer on the first etch stop layer, a second insulating structure on the first insulating structure and including a second etch stop layer and a second interlayer insulating layer on the second etch stop layer, a conductive line penetrating through the second insulating structure, and extending in a first direction parallel to an upper surface of the substrate, and a plurality of contacts penetrating through the first insulating structure and connected to the conductive line may be provided. The conductive line may include a protrusion extending below the second insulating structure and penetrating through the first interlayer insulating layer to be in contact with the first etch stop layer.