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公开(公告)号:US20240027906A1
公开(公告)日:2024-01-25
申请号:US18446373
申请日:2023-08-08
Applicant: SAMSUNG SDI CO., LTD.
Inventor: Jinsuop YOUN , Misun KIM , Hong Jeong YU , Bumjin LEE , Yonghee KANG , Dongjun KIM , Byeonggeun SON , Jihyeon YIM , Mi Jeong CHOI , Jonggi KIM , Minjee PARK , Hojeong PAEK , Woo Jung SHIN , Young Woong JANG
IPC: G03F7/004 , C09K11/02 , C09K11/88 , G03F7/00 , G03F7/033 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/031 , G03F7/038 , G03F7/027 , G03F7/105 , C09D11/30
CPC classification number: G03F7/0048 , C09K11/025 , C09K11/883 , G03F7/0007 , G03F7/033 , G03F7/162 , G03F7/168 , G03F7/2002 , G03F7/38 , G03F7/031 , G03F7/0047 , G03F7/038 , G03F7/027 , G03F7/105 , C09D11/30 , B82Y35/00
Abstract: A photosensitive resin composition includes: (A) a binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a quantum dot surface-modified with a compound having a thiol group at one terminal end and an alkoxy group, a cycloalkyl group, a carboxyl group, or a hydroxy group at the other terminal end; and (E) a solvent. A curable composition includes: (A′) a resin; (B′) a quantum dot surface-modified with a compound represented by Chemical Formula 1 or Chemical Formula 2; and (C′) a solvent. A method of manufacturing the surface-modified quantum dot, and a color filter manufactured using the photosensitive resin composition or the curable composition are also disclosed.
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2.
公开(公告)号:US20190278177A1
公开(公告)日:2019-09-12
申请号:US16334207
申请日:2017-11-28
Applicant: Samsung SDI Co., Ltd.
Inventor: Jiyoung JEONG , Bumjin LEE , Yonghee KANG , Misun KIM , Jonggi KIM , Onyou PARK , Hojeong PAEK , Byeonggeun SON , Youn Je RYU , Jinsuop YOUN , Jihyeon YIM , Young Woong JANG , Minkyeol CHUNG , Hyunjoo HAN , Kyunghee HYUNG
IPC: G03F7/032 , G03F7/031 , G03F7/105 , G03F7/033 , G03F7/00 , G03F7/038 , G03F7/039 , C08G63/688 , G02B1/04 , G02B5/20
Abstract: A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer. (In Chemical Formula 1, each substituent is the same as defined in the specification.)
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公开(公告)号:US20190129302A1
公开(公告)日:2019-05-02
申请号:US16155691
申请日:2018-10-09
Applicant: Samsung SDI Co., Ltd.
Inventor: Jinsuop YOUN , Misun KIM , Hong Jeong YU , Bumjin LEE , Yonghee KANG , Dongjun KIM , Byeonggeun SON , Jihyeon YIM , Mi Jeong CHOI , Jonggi KIM , Minjee PARK , Hojeong PAEK , Woo Jung SHIN , Young Woong JANG
IPC: G03F7/004 , C09K11/02 , C09K11/88 , G03F7/00 , G03F7/033 , G03F7/031 , G03F7/16 , G03F7/20 , G03F7/38
Abstract: A photosensitive resin composition includes: (A) a binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a quantum dot surface-modified with a compound having a thiol group at one terminal end and an alkoxy group, a cycloalkyl group, a carboxyl group, or a hydroxy group at the other terminal end; and (E) a solvent. A curable composition includes: (A′) a resin; (B′) a quantum dot surface-modified with a compound represented by Chemical Formula 1 or Chemical Formula 2; and (C′) a solvent. A method of manufacturing the surface-modified quantum dot, and a color filter manufactured using the photosensitive resin composition or the curable composition are also disclosed.
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