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公开(公告)号：US20190129302A1
公开(公告)日：2019-05-02
申请号：US16155691
申请日：2018-10-09
Applicant: Samsung SDI Co., Ltd.
Inventor： Jinsuop YOUN , Misun KIM , Hong Jeong YU , Bumjin LEE , Yonghee KANG , Dongjun KIM , Byeonggeun SON , Jihyeon YIM , Mi Jeong CHOI , Jonggi KIM , Minjee PARK , Hojeong PAEK , Woo Jung SHIN , Young Woong JANG
IPC: G03F7/004 , C09K11/02 , C09K11/88 , G03F7/00 , G03F7/033 , G03F7/031 , G03F7/16 , G03F7/20 , G03F7/38
Abstract: A photosensitive resin composition includes: (A) a binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a quantum dot surface-modified with a compound having a thiol group at one terminal end and an alkoxy group, a cycloalkyl group, a carboxyl group, or a hydroxy group at the other terminal end; and (E) a solvent. A curable composition includes: (A′) a resin; (B′) a quantum dot surface-modified with a compound represented by Chemical Formula 1 or Chemical Formula 2; and (C′) a solvent. A method of manufacturing the surface-modified quantum dot, and a color filter manufactured using the photosensitive resin composition or the curable composition are also disclosed.
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公开(公告)号：US20210286259A1
公开(公告)日：2021-09-16
申请号：US17207501
申请日：2021-03-19
Applicant: SAMSUNG ELECTRONICS CO., LTD. , SAMSUNG SDI CO., LTD.
Inventor： Shang Hyeun PARK , Hojeong PAEK , Eun Joo JANG , Shin Ae JUN
IPC: G03F7/00 , G03F7/033 , G03F7/004 , C09D4/06 , C08F220/14 , C09K11/02 , C09K11/70 , G02B5/20 , G02B5/22
Abstract: A photosensitive composition including a quantum dot dispersion, a reactive compound having at least two thiol groups, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes a carboxylic acid group-containing polymer and a quantum dot dispersed in the carboxylic acid group containing polymer, and wherein the carboxylic acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic moiety and not having a carboxylic acid group.
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公开(公告)号：US20190171100A1
公开(公告)日：2019-06-06
申请号：US16268992
申请日：2019-02-06
Applicant: SAMSUNG ELECTRONICS CO., LTD. , Samsung SDI Co., Ltd.
Inventor： Jonggi KIM , Shang Hyeun PARK , Shin Ae JUN , Hojeong PAEK
Abstract: A photosensitive composition includes a plurality of quantum dots including an organic ligand on the surface thereof; a binder; a photopolymerizable monomer composition; photoinitiator; and a solvent, wherein the photopolymerizable monomer includes a main monomer having 1 to 6 carbon-carbon double bonds, a first accessory monomer having 8 to 20 carbon-carbon double bonds, and a second accessory monomer represented by Chemical Formula A; and a method of preparing the photosensitive composition and a quantum dot-polymer composite pattern prepared therefrom are provided: R1O-(L1)m-L3-A-L4-(L2)n-OR2 Chemical Formula A wherein, A, L1, L2, L3, L4, R1, and R2 are the same as defined herein.
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4.发明申请公开(公告)号：US20190041747A1
公开(公告)日：2019-02-07
申请号：US16074058
申请日：2017-01-24
Applicant: SAMSUNG SDI CO., LTD.
Inventor： Jinsuop YOUN , Misun KIM , Jiyoung JEONG , Obum KWON , Jonggi KIM , Hojeong PAEK , Bumjin LEE , Jihyeon YIM , Hyunjoo HAN
IPC: G03F7/00 , G02B5/20 , G03F7/004 , G03F7/033 , G03F7/027 , C08F20/38 , C08K3/22 , C08K3/30 , C08K3/26 , C08K5/3492
Abstract: Provided are a photosensitive resin composition including (A) a photo-conversion material; (B) a binder resin including an acryl-based repeating unit including one or more thiol groups at the terminal end; (C) a photopolymerization initiator; and (D) a solvent, a photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer.
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公开(公告)号：US20240027906A1
公开(公告)日：2024-01-25
申请号：US18446373
申请日：2023-08-08
Applicant: SAMSUNG SDI CO., LTD.
Inventor： Jinsuop YOUN , Misun KIM , Hong Jeong YU , Bumjin LEE , Yonghee KANG , Dongjun KIM , Byeonggeun SON , Jihyeon YIM , Mi Jeong CHOI , Jonggi KIM , Minjee PARK , Hojeong PAEK , Woo Jung SHIN , Young Woong JANG
IPC: G03F7/004 , C09K11/02 , C09K11/88 , G03F7/00 , G03F7/033 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/031 , G03F7/038 , G03F7/027 , G03F7/105 , C09D11/30
CPC classification number: G03F7/0048 , C09K11/025 , C09K11/883 , G03F7/0007 , G03F7/033 , G03F7/162 , G03F7/168 , G03F7/2002 , G03F7/38 , G03F7/031 , G03F7/0047 , G03F7/038 , G03F7/027 , G03F7/105 , C09D11/30 , B82Y35/00
Abstract: A photosensitive resin composition includes: (A) a binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a quantum dot surface-modified with a compound having a thiol group at one terminal end and an alkoxy group, a cycloalkyl group, a carboxyl group, or a hydroxy group at the other terminal end; and (E) a solvent. A curable composition includes: (A′) a resin; (B′) a quantum dot surface-modified with a compound represented by Chemical Formula 1 or Chemical Formula 2; and (C′) a solvent. A method of manufacturing the surface-modified quantum dot, and a color filter manufactured using the photosensitive resin composition or the curable composition are also disclosed.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20190243242A1
公开(公告)日：2019-08-08
申请号：US16190739
申请日：2018-11-14
Applicant: Samsung SDI Co., Ltd.
Inventor： Hojeong PAEK , Jonggi KIM , Minjee PARK , Woo Jung SHIN , Jinsuop YOUN , Bumjin LEE , Jihyeon YIM , Young Woong JANG
CPC classification number: G03F7/032 , G02B5/20 , G03F7/0007 , G03F7/0042 , G03F7/0275 , G03F7/031
Abstract: A photosensitive resin composition for producing a photosensitive resin film is provided, along with the manufactured photosensitive resin film and a color filter including the photosensitive resin layer. The photosensitive resin composition includes: (A) a quantum dot; (B) a binder resin having a weight average molecular weight of about 2,000 g/mol to about 12,000 g/mol; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent.
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7.发明申请公开(公告)号：US20170176854A1
公开(公告)日：2017-06-22
申请号：US15375601
申请日：2016-12-12
Applicant: SAMSUNG ELECTRONICS CO., LTD. , SAMSUNG SDI CO., LTD.
Inventor： Shang Hyeun PARK , Hojeong PAEK , Jonggi KIM , Nayoun WON , Shin Ae JUN
CPC classification number: G03F7/0043 , G03F7/0047 , G03F7/029 , G03F7/031 , G03F7/033
Abstract: A photosensitive composition including: a plurality of quantum dots, wherein the quantum dot includes an organic ligand bound to a surface of the quantum dot; a photoinitiator; a binder including a carboxylic acid group; a photopolymerizable monomer having a carbon-carbon double bond; and a solvent, wherein the photoinitiator includes a first photoinitiator including an oxime compound and a second photoinitiator including at least one selected from a phosphine oxide compound and an amino ketone compound.
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8.发明申请PHOTOSENSITIVE COMPOSITIONS, PREPARATION METHODS THEREOF, AND QUANTUM DOT POLYMER COMPOSITE PREPARED THEREFROM 审中-公开光敏组合物，其制备方法及其制备的量子聚合物复合材料公开(公告)号：US20170052444A1
公开(公告)日：2017-02-23
申请号：US15241224
申请日：2016-08-19
Applicant: SAMSUNG ELECTRONICS CO., LTD. , SAMSUNG SDI CO., LTD.
Inventor： Shang Hyeun PARK , Hojeong PAEK , Eun Joo JANG , Shin Ae JUN
CPC classification number: G03F7/0007 , B82Y30/00 , B82Y40/00 , C08F220/14 , C09D4/06 , C09K11/02 , C09K11/703 , G02B5/207 , G02B5/223 , G03F7/004 , G03F7/0042 , G03F7/0047 , G03F7/033 , C08F265/06 , C08F220/06
Abstract: A photosensitive composition including a quantum dot dispersion, a reactive compound having at least two thiol groups, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes a carboxylic acid group-containing polymer and a quantum dot dispersed in the carboxylic acid group containing polymer, and wherein the carboxylic acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic moiety and not having a carboxylic acid group.
Abstract translation: 包含量子点分散体，具有至少两个硫醇基的反应性化合物，具有碳 - 碳双键的光聚合单体和光引发剂的感光组合物，其中量子点分散体包含含羧酸基团的聚合物和量子 点分散在含羧酸基的聚合物中，其中含羧酸基的聚合物包括包含具有羧酸基的第一单体和碳 - 碳双键的单体组合的共聚物和具有碳 - 碳双键的第二单体， 碳双键和疏水部分，不具有羧酸基团。
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9.发明申请公开(公告)号：US20190278177A1
公开(公告)日：2019-09-12
申请号：US16334207
申请日：2017-11-28
Applicant: Samsung SDI Co., Ltd.
Inventor： Jiyoung JEONG , Bumjin LEE , Yonghee KANG , Misun KIM , Jonggi KIM , Onyou PARK , Hojeong PAEK , Byeonggeun SON , Youn Je RYU , Jinsuop YOUN , Jihyeon YIM , Young Woong JANG , Minkyeol CHUNG , Hyunjoo HAN , Kyunghee HYUNG
IPC: G03F7/032 , G03F7/031 , G03F7/105 , G03F7/033 , G03F7/00 , G03F7/038 , G03F7/039 , C08G63/688 , G02B1/04 , G02B5/20
Abstract: A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer. (In Chemical Formula 1, each substituent is the same as defined in the specification.)
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10.发明申请公开(公告)号：US20170115562A1
公开(公告)日：2017-04-27
申请号：US15295373
申请日：2016-10-17
Applicant: SAMSUNG ELECTRONICS CO., LTD. , Samsung SDI Co., Ltd.
Inventor： Jonggi KIM , Shang Hyeun PARK , Shin Ae JUN , Hojeong PAEK
CPC classification number: G03F7/0007 , G03F7/0047 , G03F7/027 , G03F7/033
Abstract: A photosensitive composition includes a plurality of quantum dots including an organic ligand on the surface thereof; a binder; a photopolymerizable monomer composition; photoinitiator; and a solvent, wherein the photopolymerizable monomer includes a main monomer having 1 to 6 carbon-carbon double bonds, a first accessory monomer having 8 to 20 carbon-carbon double bonds, and a second accessory monomer represented by Chemical Formula A; and a method of preparing the photosensitive composition and a quantum dot-polymer composite pattern prepared therefrom are provided: R1O-(L1)m-L3-A-L4-(L2)n-OR2 Chemical Formula A wherein, A, L1, L2, L3, L4, R1, and R2 are the same as defined herein.
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