公开(公告)号：US20240027906A1

公开(公告)日：2024-01-25

申请号：US18446373

申请日：2023-08-08

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Jinsuop YOUN ,  Misun KIM ,  Hong Jeong YU ,  Bumjin LEE ,  Yonghee KANG ,  Dongjun KIM ,  Byeonggeun SON ,  Jihyeon YIM ,  Mi Jeong CHOI ,  Jonggi KIM ,  Minjee PARK ,  Hojeong PAEK ,  Woo Jung SHIN ,  Young Woong JANG

IPC: G03F7/004 ,  C09K11/02 ,  C09K11/88 ,  G03F7/00 ,  G03F7/033 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/031 ,  G03F7/038 ,  G03F7/027 ,  G03F7/105 ,  C09D11/30

CPC classification number: G03F7/0048 ,  C09K11/025 ,  C09K11/883 ,  G03F7/0007 ,  G03F7/033 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2002 ,  G03F7/38 ,  G03F7/031 ,  G03F7/0047 ,  G03F7/038 ,  G03F7/027 ,  G03F7/105 ,  C09D11/30 ,  B82Y35/00

Abstract: A photosensitive resin composition includes: (A) a binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a quantum dot surface-modified with a compound having a thiol group at one terminal end and an alkoxy group, a cycloalkyl group, a carboxyl group, or a hydroxy group at the other terminal end; and (E) a solvent. A curable composition includes: (A′) a resin; (B′) a quantum dot surface-modified with a compound represented by Chemical Formula 1 or Chemical Formula 2; and (C′) a solvent. A method of manufacturing the surface-modified quantum dot, and a color filter manufactured using the photosensitive resin composition or the curable composition are also disclosed.

公开(公告)号：US20180162989A1

公开(公告)日：2018-06-14

申请号：US15747244

申请日：2016-08-01

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Doori SONG ,  Woo Han KIM ,  Dongju SHIN ,  Hong Jeong YU ,  Jiho LEE

IPC: C08G59/30 ,  C08G59/40 ,  C09D163/00 ,  H01L51/00 ,  H01L51/52

Abstract: Provided are a low temperature curing composition, a cured film obtained by curing the composition, and an electronic device comprising the cured film, wherein the composition comprises:(A) an epoxy group-containing siloxane compound represented by Chemical Formula 1: (R1R2R3SiO1/2)M(R4R5SiO2/2)D1(R6SiO3/2)T1(R7R8SiO2/2)D2(R9SiO3/2)T2   [Chemical Formula 1] (In Chemical Formula 1, each of R1 to R9 is an organic group independently selected from a substituted or unsubstituted monovalent aliphatic hydrocarbon group of C1 to C6, a substituted or unsubstituted monovalent cycloaliphatic hydrocarbon group of C6 to C20, a substituted or unsubstituted monovalent aromatic hydrocarbon group of C6 to C20, and an epoxy-substituted monovalent organic group, at least one of R1 to R6 is an epoxy-substituted monovalent organic group, 0≤M

公开(公告)号：US20190129302A1

公开(公告)日：2019-05-02

申请号：US16155691

申请日：2018-10-09

Applicant: Samsung SDI Co., Ltd.

Inventor： Jinsuop YOUN ,  Misun KIM ,  Hong Jeong YU ,  Bumjin LEE ,  Yonghee KANG ,  Dongjun KIM ,  Byeonggeun SON ,  Jihyeon YIM ,  Mi Jeong CHOI ,  Jonggi KIM ,  Minjee PARK ,  Hojeong PAEK ,  Woo Jung SHIN ,  Young Woong JANG

IPC: G03F7/004 ,  C09K11/02 ,  C09K11/88 ,  G03F7/00 ,  G03F7/033 ,  G03F7/031 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38

Abstract: A photosensitive resin composition includes: (A) a binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a quantum dot surface-modified with a compound having a thiol group at one terminal end and an alkoxy group, a cycloalkyl group, a carboxyl group, or a hydroxy group at the other terminal end; and (E) a solvent. A curable composition includes: (A′) a resin; (B′) a quantum dot surface-modified with a compound represented by Chemical Formula 1 or Chemical Formula 2; and (C′) a solvent. A method of manufacturing the surface-modified quantum dot, and a color filter manufactured using the photosensitive resin composition or the curable composition are also disclosed.